Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
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TL;DR: This focus review provides an overview of the principle of colloidal lithography, and surveys the recent developments as well as outlining the future challenges.
Abstract: Nanochemical printmaking: Colloidal lithography paves a powerful nanochemical way for patterning on planar substrates and microparticles. The feature size can easily be scaled down to 100 nm by reducing the diameter of the microspheres and the feature shape diversified by the crystalline structure of a colloidal crystal mask, the mask etching time, the incidence angle of the vapor beam, and the mask registry (the azimuth angle of the vapor beam). Colloidal lithography relies on using colloidal crystals as masks for etching and deposition, and allows fabrication of various nanostructures on planar and non-planar substrates with low-cost, high-throughput-processing, large fabrication area, and a broad choice of materials. The feature size can easily shrink by decreasing the microsphere diameter in the colloidal mask. The feature shape can be diversified by varying the crystal structure of the colloidal mask, etching the mask, altering the incidence angle of the vapor beam, and stepwise manipulation of the mask registry. This nanochemical patterning strategy paves a complementary way to conventional top-down lithography. This focus review provides an overview of the principle of colloidal lithography, and surveys the recent developments as well as outlining the future challenges.
167 citations
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TL;DR: In this article, a large-area, 100mm in diameter, aluminum nanowire grids with 40nm line/78nm space were fabricated with full-wafer immersion interference lithography.
Abstract: Large-area, 100mm in diameter, aluminum nanowire grids with 40nm line/78nm space were fabricated with full-wafer immersion interference lithography. The aluminum nanowire grids with a 59nm half-pitch work as a highly efficient optical polarizer for deep ultraviolet wavelength down to ∼250nm. In addition, an extremely high contrast from 10 000:1 to 50 000:1 was achieved across the whole visible and near-infrared wavelength range, along with good transmittance (85%–90%). The broadband large-area high-performance polarizer operating down to deep ultraviolet wavelength opens up applications including semiconductor lithography and metrology applications.
166 citations
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TL;DR: In this paper, a maskless nanostructure fabrication by laser interference lithography (LIL) using Lloyd's mirror interferometer is investigated, where the edge quality is improved by anti-reflective coating (ARC) between the substrate and the photoresist to minimize the interference of vertical standing waves.
166 citations
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TL;DR: In this paper, the fabrication and characterization of nanoscale silicon field effect transistors using nano-print lithography was reported. And the successful fabrication of the semiconductor nanodevices represents a step forward to make nano-imprint microscopy a viable technique for the mass production of semiconductor devices.
Abstract: We report the fabrication and characterization of nanoscale silicon field effect transistors using nanoimprint lithography. With this lithographic technique and dry etching, we have patterned a variety of nanoscale transistor features in silicon, including 100 nm wire channels, 250-nm-diam quantum dots, and ring structures with 100 nm ring width, over a 2×2 cm lithography field with good uniformity. Compared with devices fabricated by the conventional electron-beam lithography, we did not observe any degradation in the device characteristics. The successful fabrication of the semiconductor nanodevices represents a step forward to make nanoimprint lithography a viable technique for the mass production of semiconductor devices.
166 citations
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TL;DR: A blazing technique using electron-beam lithography to achieve higher efficiency of gratings and Fresnel lenses is described, and the experimental results showed high-efficiency performance and nearly diffraction-limited focusing.
Abstract: A blazing technique using electron-beam lithography to achieve higher efficiency of gratings and Fresnel lenses is described. Transmission-type blazed gratings have been formed in polymethyl methacrylate films. As a result of measurement, we found that their diffraction efficiency of the first order in these gratings amounts to as much as 60 to 70% at 0.633 microm. Fresnel lenses of 1-mm diameter and 5-mm focal length, which have a sawtooth relief profile, have been also fabricated, and the experimental results showed high-efficiency performance (about 50%) and nearly diffraction-limited focusing.
166 citations