Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.

Bubble-Pen Lithography

Abstract: Current lithography techniques, which employ photon, electron, or ion beams to induce chemical or physical reactions for micro/nano-fabrication, have remained challenging in patterning chemically synthesized colloidal particles, which are emerging as building blocks for functional devices. Herein, we develop a new technique - bubble-pen lithography (BPL) - to pattern colloidal particles on substrates using optically controlled microbubbles. Briefly, a single laser beam generates a microbubble at the interface of colloidal suspension and a plasmonic substrate via plasmon-enhanced photothermal effects. The microbubble captures and immobilizes the colloidal particles on the substrate through coordinated actions of Marangoni convection, surface tension, gas pressure, and substrate adhesion. Through directing the laser beam to move the microbubble, we create arbitrary single-particle patterns and particle assemblies with different resolutions and architectures. Furthermore, we have applied BPL to pattern CdSe/ZnS quantum dots on plasmonic substrates and polystyrene (PS) microparticles on two-dimensional (2D) atomic-layer materials. With the low-power operation, arbitrary patterning and applicability to general colloidal particles, BPL will find a wide range of applications in microelectronics, nanophotonics, and nanomedicine.

Lithographic image size reduction

Abstract: Disclosed is a process for reducing lithographic image size for integrated circuit manufacture. A mask (14) of photosensitive material having an opening (20) of a minimum size (A) dictated by the limits of lithography is formed on a substrate (10). Reduction in the image size is achieved by establishing sidewalls (24) to the interior vertical surfaces of the opening by depositing a conformal layer (22), followed by anisotropic etching. The dimension (C) of the new opening is reduced by the combined thickness of the two opposite insulator sidewalls. In a specific direct application of the disclosed process, a photomask/stencil having a pattern of openings of a minimum size smaller than possible by lithography, per se, is formed.

Using colloidal lithography to fabricate and optimize sub-wavelength pyramidal and honeycomb structures in solar cells

Abstract: The external quantum efficiency of solar cells can be improved by using texturing pyramid- and honeycomb-like structures with minimum reflection. In this study, we investigated the reflection properties of texturing structures through rigorous coupled-wave analysis and the three-dimensional finite-difference time domains (FDTD) method to analyze close-packed texturing structures. We also demonstrate a simple method-combining sub-wavelength-scale monolayer and bilayer polystyrene spheres with a one-step reactive ion etching process-to fabricate optimized pyramid- and honeycomb-shaped antireflection structures, respectively. Thus, sub-wavelength pyramidal and honeycomb-like structures displaying low reflectance were obtained readily without the need for any lithography equipment.

Bilayer Al wire-grids as broadband and high-performance polarizers

Abstract: We have fabricated, characterized and theoretically analyzed the performance of bilayer (or stacked) metallic wire-grids. The samples with 100 nm period were fabricated with extreme-ultraviolet interference lithography. Transmission efficiency over 50% and extinction ratios higher than 40 dB were measured in the visible range with these devices. Simulations using a finite-difference time-domain algorithm are in agreement with the experimental results and show that the transmission spectra are governed by Fabry-Perot interference and near-field coupling between the two layers of the structure. The simple fabrication method involves only a single lithographic step without any etching and guarantees precise alignment and separation of the two wire-grids with respect to each other.

Patterning colloidal films via evaporative lithography.

Abstract: We investigate evaporative lithography as a route for patterning colloidal films. Films are dried beneath a mask that induces periodic variations between regions of free and hindered evaporation. Direct imaging reveals that particles segregate laterally within the film, as fluid and entrained particles migrate towards regions of higher evaporative flux. The films exhibit remarkable pattern formation that can be regulated by tuning the initial suspension composition, separation distance between the mask and underlying film, and mask geometry.