Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
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TL;DR: In this paper, a resistless proximal probe-based lithography technique was proposed to enable the direct patterning of complex and submicron-sized structures of various materials.
Abstract: We describe a resistless proximal probe-based lithography technique, which enables the direct patterning of complex and submicron-sized structures of various materials. The method is based on a combination of scanning probe microscopy and the shadow masking technique, whereby structures are locally deposited through pinhole-like apertures situated in the proximity of a cantilever tip. Predefined excursions of the sample lead to the direct fabrication of arbitrary structures on the surface. Complex patterns such as rings and intersecting lines with linewidths well below 0.1 μm are presented.
118 citations
TL;DR: An optical interference model to create chiral microstructures (spirals) and its realization in photoresist using holographic lithography, based on the interference of six equally-spaced circumpolar linear polarized side beams and a circular polarized central beam is presented.
Abstract: We present an optical interference model to create chiral microstructures (spirals) and its realization in photoresist using holographic lithography. The model is based on the interference of six equally-spaced circumpolar linear polarized side beams and a circular polarized central beam. The pitch and separation of the spirals can be varied by changing the angle between the side beams and the central beam. The realization of the model is carried out using the 325 nm line of a He-Cd laser and spirals of sub-micron size are fabricated in photoresist.
118 citations
Patent•
29 Mar 2004TL;DR: In this paper, a method to produce an electromagnetic radiation suitable for production of microelectronic devices, linearly polarizing at least a portion of the radiation at a pupil plane of a projection system to form linearly polarized radiation, and exposing a substrate using the linearly-polarized radiation at high exposure angle.
Abstract: Lithography using controlled polarization. One aspect generates an electromagnetic radiation suitable for production of microelectronic devices, linearly polarizes at least a portion of the radiation at a pupil plane of a projection system to form linearly polarized radiation, and exposing a substrate using the linearly polarized radiation at a high exposure angle.
117 citations
TL;DR: In this article, the authors survey requirements, present the current results, and explore the potential applications of this method of nanofabrication, including direct deposition and chemical modifications of the surface.
Abstract: Atomic deposition on a surface can be controlled at the nanometre scale by means of optical and magnetic forces. Impingement of atoms on the surface can lead to growth of a structured array (direct deposition) or to chemical modifications of the surface (neutral atom lithography). In this report we survey requirements, present the current results, and explore the potential applications of this method of nanofabrication.
117 citations
TL;DR: Three-dimensional (3D) direct lithography of PNCs with tunable composition and bandgap in glass was reported, and encapsulated P NCs exhibited long-term stability after prolonged heating or organic solvent and ultraviolet light exposure.
Abstract: Material composition engineering and device fabrication of perovskite nanocrystals (PNCs) in solution can introduce organic contamination and entail several synthetic, processing, and stabilization steps. We report three-dimensional (3D) direct lithography of PNCs with tunable composition and bandgap in glass. The halide ion distribution was controlled at the nanoscale with ultrafast laser–induced liquid nanophase separation. The PNCs exhibit notable stability against ultraviolet irradiation, organic solution, and high temperatures (up to 250°C). Printed 3D structures in glass were used for optical storage, micro–light emitting diodes, and holographic displays. The proposed mechanisms of both PNC formation and composition tunability were verified. Description Perovskite nanocrystals under glass Perovskite nanocrystals (PNCs) such as cesium lead triiodide (CsPbI3) can display bright photoemission with narrow linewidths for display applications, but their long-term stability requires passivation and encapsulation steps after synthesis in solution. Sun et al. created three-dimensional arrays of PNCs in doped metal oxide glasses using ultrafast laser pulses that caused local melting and subsequent crystallization. They tuned the bandgap of PNCs and their photoluminescence between 480- and 700-nanometer wavelengths by transforming the composition from CsPb(Cl1-xBrx)3 to CsPbI3. These encapsulated PNCs exhibited long-term stability after prolonged heating or organic solvent and ultraviolet light exposure. —PDS Melting of a doped metal oxide glass with ultrafast laser pulses created perovskite nanocrystal arrays for optoelectronics.
117 citations