Lithography

About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.

Periodic si nanopillar arrays fabricated by colloidal lithography and catalytic etching for broadband and omnidirectional elimination of Fresnel reflection.

Abstract: Periodic Si nanopillar arrays (NPAs) were fabricated by the colloidal lithography combined with catalytic etching. By varying the size of colloidal crystals using oxygen plasma etching, Si NPAs with desirable diameter and fill factor could be obtained. The Fresnel reflection can be eliminated effectively over broadband regions by NPAs; i.e., the wavelength-averaged specular reflectance is decreased to 0.70% at wavelengths of 200−1900 nm. The reflectance is reduced greatly for the incident angles up to 70° for both s- and p-polarized light. These excellent antireflection performances are attributed to light trapping effect and very low effective refractive indices, which can be modified by the fill factor of Si in the NPA layers.

Fabrication of nanostructures using atomic‐force‐microscope‐based lithography

Abstract: We describe a novel technique for fabricating metallic nanostructures on an arbitrary substrate using an atomic force microscope (AFM). An AFM is used to plow a pattern through the top of two resist layers spun onto a substrate. The resist is then developed to create a mask through which material can be deposited. By changing the applied force, the top resist‐layer thickness, or the development time, the linewidth can be varied. Continuous metallic wires ∼500 A×400 A×15 μm have been fabricated on bare substrates and between contact pads.

Laser-lithography on non-planar surfaces.

Abstract: An extensively modified laser-lithography system specially developed for realization of micro-optical profiles on non-planar surfaces is presented. This extended system offers new possibilities of fabricating micro-optical elements without the technology related restriction of surface shape that existed so far. A diffractive lens on a convex spherical substrate is designed and fabricated as an example for hybrid achromatic refractive-diffractive elements to demonstrate the functionality of the system and the wide range of possible new applications.

Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system

Abstract: This article presents an overview of the “Nanolith” parallel electron-beam (e-beam) lithography approach The e-beam writing head consists of an array of microguns independently driven by an active matrix complementary metal–oxide–semiconductor circuit At the heart of each microgun is a field-emission microcathode comprised of an extraction gate and vertical carbon nanotube emitter, whose mutual alignment is critical in order to achieve highly focused electron beams Thus, in this work, a single-mask, self-aligned technique is developed to pattern the extraction gate, insulator, and nanotubes in the microcathode The microcathode examined here (150×150 gates, 2 μm gate diameter, with multiple nanotubes per gate) exhibited a peak current of 105 μA at 48 V when operated with a duty cycle of 05% The self-aligned process was extended to demonstrate the fabrication of single nanotube-based microcathodes with submicron gates

PDL oxide enabled pitch doubling

Abstract: A double patterning (DP) process is introduced with application for advanced technology nodes. This DP technique is enabled by a novel low-temperature pulsed deposition layer (PDL TM ) oxide film which is deposited directly on patterned photoresist. In this article, we will report the results of fabrication of sub-50nm features on a 100nm pitch by the PDL-spacer DP process using 0.85 NA dry ArF lithography. This result represents the potential of the PDL-based DP to significantly enhance the resolution of the patterning process beyond the limits of optical lithography. Components of CD variance for this spacer DP scheme will be discussed.