Topic
Lithography
About: Lithography is a research topic. Over the lifetime, 23507 publications have been published within this topic receiving 348321 citations.
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TL;DR: This review presents several commonly used top-down nanofabrication techniques that have the potential to fabricate nanoparticles, including photolithography, interference lithography, electron beam lithographic, mold-based lithography (nanoimprint lithography and soft lithography), nanostencil lithographers, and nanosphere lithography.
115 citations
TL;DR: In this article, a fully etched grating coupler for interfacing between singlemode fibers and photonic circuits on silicon-on-insulator is demonstrated, which consists of columns of fully etched photonic crystal holes, which are made in the same lithography and etching processes used for making the silicon-ON-INSulator wire waveguide.
Abstract: A grating coupler for interfacing between single-mode fibers and photonic circuits on silicon-on-insulator is demonstrated. It consists of columns of fully etched photonic crystal holes, which are made in the same lithography and etching processes used for making the silicon-on-insulator wire waveguide. The holes have a diameter of around 143 nm, and are defined with electron-beam lithography. A peak coupling efficiency of 42% at 1550 nm and 1 dB bandwidth of 37 nm, as well as a low back reflection, are achieved. The performance of the proposed fully etched grating coupler is comparable to that based on the conventional shallowly etched grating, which needs additional fabrication steps.
114 citations
114 citations
TL;DR: In this article, an x-ray reduction camera which is capable of projecting a 5× demagnified image of a mask onto a resist-coated wafer is presented.
Abstract: Soft x‐ray projection lithography can now be realized with recent developments in x‐ray optics. Using new x‐ray optical components and spherical imaging optics, we have designed an x‐ray reduction camera which is capable of projecting with soft x‐ray radiation, a 5× demagnified image of a mask onto a resist coated wafer. The resolution of this design is ∼100 nm with a depth of focus of ±5.6 μm and a 0.5‐cm‐diam image field. We use x‐ray reflecting masks (patterned x‐ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free. Our design uses a laser produced plasma for the x‐ray source. Better resolution and/or larger areas are possible with improvements in optic figures and source characteristics.
114 citations
TL;DR: In this article, a preshaped photoresist refractive optics by melting (P2ROM) process was used to fabricate 200-μm-diam microlenses with speeds between f/15 and f/5.
Abstract: Refractive microlenses are fabricated by the preshaped photoresist refractive optics by melting (P2ROM) process A polar coordinate HeCd laser beam lithography system (laser writer) is used to directly expose a continuous spheroidal profile into photoresist to fabricate 200-μm-diam microlenses with speeds between f/15 and f/5 Interferometric surlace measurements, used to determine the optical quality of the preshaped microlenses, indicate reduced spherical aberration in slow lenses fabricated by the P2ROM method
113 citations