Showing papers on "Mask inspection published in 1973"
TL;DR: Results indicate that this technique could have application for integrated circuit and thin film mask inspection provided there are two or more repeated patterns on the mask.
Abstract: Studies have been performed to investigate the application of spatial filtering subtraction to mask inspection. By using a grating at the spatial frequency plane, images can be subtracted to give a display of errors on a black background. Results indicate that this technique could have application for integrated circuit and thin film mask inspection provided there are two or more repeated patterns on the mask.
7 citations