Showing papers on "Mask inspection published in 1986"

Lithographic system mask inspection device

Abstract: A device used to test the features of a mask used in a semiconductor lithographic machine. The device includes an array of charge couple devices and an array of pinholes positioned above the charge couple devices. The array of pinholes includes a small pinhole opening for each of the charge couple devices in that array and the size of each opening is dependent upon the resolution of the mask features desired to be inspected. The array of pinholes and the array of charge couple devices are moved in unison in discrete steps, related to the size of the pinhole openings, across an area of the mask related to the center to center spacing of the charge couple devices of the charge couple device array. By reading the data of each of the charge couple devices after each step, a comparison can be made against data previously obtained from a known good mask and a determination can be made whether the mask under test is acceptable or flawed.

Report: Wafer inspection with a laser scanning microscope

Abstract: The decreasing geometries and increasing die sizes of today's VLSI circuits are demanding ever more stringent controls over particle contamination on semiconductor wafers during their processing Consequently, there is a need for objective inspection techniques to monitor defects and contaminants on the surface of semiconductor devices The goals of such an inspection are:

Inspection of Integrated Circuit Photomasks using Optical Data Processing Techniques

Abstract: The application of optical signal processing techniques for the inspection of integrated circuit photomasks, could prove to be a fast and cheap means of photomask inspection. In this paper we discuss two possible optical inspection techniques and their suitability for use as a practical inspection tool.