Topic
Mask inspection
About: Mask inspection is a research topic. Over the lifetime, 1072 publications have been published within this topic receiving 8696 citations.
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Patent•
21 May 2019
TL;DR: In this article, a metal plate for producing a vapor deposition mask, an inspection method for the metal plate, a production method for metal plate and a vapor-deposition mask, a manufacturing method thereof and a VDM device were described.
Abstract: The invention relates to a metal plate for producing a vapor deposition mask, an inspection method for the metal plate, a production method for the metal plate, a vapor deposition mask, a manufacturing method thereof and a vapor deposition mask device. The metal plate comprises a surface having a longitudinal direction and a width direction orthogonal to the longitudinal direction. The surface reflectance for reflected light emitted from the surface at an angle of 45 DEG +/- 0.2 DEG in at least one plane orthogonal to the surface, is 8%-25% of the reflected light observed when light is causedto be incident on the surface.
Patent•
06 Apr 2021
TL;DR: In this paper, a pattern inspection method, a photomask inspection device, and a manufacturing method for line width measurement in a fine width pattern is presented. But the method is not suitable for the inspection of a large area.
Abstract: The invention provides a pattern inspection method, a photomask inspection device, and a photomask manufacturing method. Even in a fine width pattern, line width measurement can be performed stably and with high precision. The pattern inspection method comprises: a step for irradiating an inspection region with light and acquiring a transmitted light image of the inspection region; a step for obtaining light intensity distribution data of the inspection region on the basis of the acquired transmitted light image; a differential processing step of obtaining a light intensity change curve of a region including a first boundary, which is a boundary portion between a first transmission control unit and a second transmission control unit, and a second boundary, which is a boundary portion between the second transmission control unit and a third transmission control unit, by performing differential processing on a light intensity distribution curve obtained from the light intensity distribution data; a fitting step of fitting the obtained light intensity change curve to a model function; and a step for obtaining the size of the second transmission control unit on the basis of the resultof the fitting.
22 Jan 2001
Abstract: Embedded phase shift masks (ePSM) are critical to patterning the contact layer of integrated circuit devices of 130 nm technology node and beyond. Required ePSM inspection methodologies needed for the successful manufacturing of a defect-free ePSM are discussed in this study. We present an analysis of different inspection schemes for handling inspection system optical signals from tritone ePSM. Programmed defect ePSM plates with 6% shifter material transmission fabricated for 248 nm and 193 nm wafer exposures are characterized by metrology tools and inspected on existing optical mask inspection systems. Capture rates for various defect types are analyzed. The results of inspection sensitivity analysis are also compared with the defect specifications based on a defect printability simulation study. Key challenges ternary ePSM inspection are also discussed. Keywords: embedded phase shift mask, inspection, tritone, ternary. 1. Introduction Embedded phase shift masks (ePSMs) are being used in the semiconductor micro-lithography for high-density patterning of critical device layers, such as the contact layer.
Patent•
28 Nov 2019
TL;DR: In this paper, a photomask inspection device was proposed to detect diffraction patterns of a phase shift part 8b of an 80-mm phase shift mask 80 using a Fourier transformation lens and a first optical sensor.
Abstract: To provide a photomask inspection device capable of detecting a diffraction pattern that is more suitable for measurements.SOLUTION: A photomask inspection device 1 measures pattern characteristics of a phase shift part 8b of a phase shift mask 80. The photomask inspection device 1 includes a holding part 90, an irradiation part 10, a slit mask 24, a Fourier transformation lens 25 and a first optical sensor 27. The holding part 90 holds the phase shift mask 80. The irradiation part 10 irradiates a region including a light-transmitting part 8a and the phase shift part 8b with light. The slit mask 24 has a slit 24a and is disposed at a position where light that has been transmitted through a part in the width direction of the light-transmitting part 8a and through the whole area in the width direction of the phase shift part 8b passes through the slit 24a. The light that has passed through the slit 24a enters the Fourier transformation lens 25. The first optical sensor 27 detects a diffraction pattern of the light from the Fourier transformation lens 25 at a plurality of timings.SELECTED DRAWING: Figure 2
Patent•
15 Apr 2021
TL;DR: In this paper, a focal map is produced from the measured heights on the surface of the photomask. But this map is based on fill factors for the patterned areas.
Abstract: Heights on a surface of a photomask are measured using broadband light interferometry. The heights include heights of patterned areas of the photomask. A focal map is produced from the measured heights on the surface of the photomask. To produce the focal map, the measured heights of the patterned areas are adjusted based on fill factors for the patterned areas. The photomask is inspected for defects, using the focal map.