Methyl isobutyl ketone

About: Methyl isobutyl ketone is a research topic. Over the lifetime, 2071 publications have been published within this topic receiving 26976 citations. The topic is also known as: Hexone & Isobutyl methyl ketone.

Purification of Wet Process Phosphoric Acid by Solvent Extraction with Methyl Isobutyl Ketone: Systematic Study of Impurity Distribution

Abstract: This paper reports a study on the purification behavior of methyl isobutyl ketone (MIBK) for the major impurities of the phosphoric acid wet process (Ca2+, Mg2+ Al3+, Fe3+, SO, and F−). Distribution coefficients of phosphoric acid (PA) and impurities, as well as selectivity of MIBK for PA, have been studied as a function of the PA concentration (wt%) in the organic phase. Our results are compared to those obtained with other solvents (isoamyl alcohol, dibutyl ether, and dipropyl ether) described in the literature. MIBK seems to have the best selectivity for PA against SO, and it shows an intermediate behavior between those of isomyl alcohol and ethers with regard to metallic impurities.

Application of a Coagulated Mixture Prepared from Finely Divided Cation and Anion Exchange Resins to the Enrichment of Copper (II)

Abstract: Mutual coagulation takes place, when a suspension of finely divided cation exchanger is added to that of anion exchanger. The resulting mixed resin is bulky and easily separated from the solution by filtration. A rapid and selective collection of a trace amount of copper(II) ion was carried out by the combined use of mixed resin and 8-quinolinol-5-sulfonic acid (H2qs). The copper(II) collected on the mixed resin in the form of [Cu(qs)2]2− was brought into solution from the resin with ethylenediaminetetraacetate, converted into copper(II)–diethyldithiocarbamate, extracted into methyl isobutyl ketone, and determined by atomic absorption spectrometry. The method was satisfactorily applied to the determination of a trace amount of copper(II) in well water.

Resist developer, formation method for resist pattern, and manufacturing method for mold

Abstract: PROBLEM TO BE SOLVED: To reduce necessary exposure at the time of forming a resist pattern even as a desired resolution is produced for a resist layer having a prescribed composition.SOLUTION: The resist developer used at the time of irradiating a resist layer containing a polymer of α-chloro-acrylic ester and α-methyl styrene with energy beams so as to be exposed and developed includes a solvent A containing fluorocarbon, an alcohol solvent B higher in solubility for the resist layer than the solvent A, and a solvent C made of methyl isobutyl ketone.

Measurement and correlation of the isobaric vapor-liquid equilibrium for mixtures of alcohol+ketone systems at atmospheric pressure

Abstract: Vapor-liquid equilibrium (VLE) for binary mixtures composed of ethanol+methyl isobutyl ketone, 1-butanol+ methyl ethyl ketone, and 1-butanol+methyl propyl ketone systems was measured using a circulation type equilibrium apparatus at atmospheric pressure. The measured data and literature data for alcohol and ketone systems have been correlated by the UNIversal Quasi-Chemical (UNIQUAC) model with two binary interaction parameters and the non-random lattice fluid equation of state with hydrogen bonding equation of state (NLF-HB EoS) using a single binary interaction parameter. For the NLF-HB EoS calculations, the numbers of proton acceptor for ketones were adjusted between 0 and 1. The calculation results with the NLF-HB EoS are better than those with the UNIQUAC model.