Methyl isobutyl ketone

About: Methyl isobutyl ketone is a research topic. Over the lifetime, 2071 publications have been published within this topic receiving 26976 citations. The topic is also known as: Hexone & Isobutyl methyl ketone.

Characterization of Curing Emissions from Conversion Varnishes.

Abstract: Three commercially available conversion varnish coating “systems” (stain, sealer, and topcoat) were selected for an initial scoping study The total volatile content of the catalyzed varnishes, as determined by US Environmental Protection Agency (EPA) Method 24, ranged from 64 to 73 weight% Uncombined (free) formaldehyde concentrations, determined by a sodium sulfite titration method, ranged from 015 to 058 weight% of the uncatalyzed varnishes Each sealer and topcoat was also analyzed by gas chromatography (EPA Method 311) The primary volatile organic constituents included methyl ethyl ketone (MEK), isobutanol, n-butanol, methyl isobutyl ketone (MIBK), toluene, ethylbenzene, the xylenes, and 1,2,4-trimethylbenzene

Study of the interaction of polymethylmethacrylate fragments with methyl isobutyl ketone and isopropyl alcohol

Abstract: Exposure of polymethylmethacrylate (PMMA) during electron beam lithography (EBL) produces small polymer fragments that dissolve rapidly during the development process. The resist dissolution behavior varies greatly depending on the nature of the developer (solvent) and therefore influences the selection of the EBL parameters, such as dose (sensitivity). A molecular scale examination of the development process is necessary to elucidate the resist–developer interaction mechanisms. In this work, the authors investigate the interaction of short PMMA chains (containing up to 10 MMA units) with common developer components methyl isobutyl ketone (MIBK) and isopropyl alcohol (IPA). For this purpose, the authors conduct molecular dynamics simulations using the Accelrys Materials Studio package. The simulation results were used to characterize the mixtures in the spirit of the Flory–Huggins theory of polymers and also to extract the diffusivities. The authors found that the behavior of PMMA fragments differed considerably in MIBK as compared with IPA. PMMA fragments containing more than three monomers exhibit stronger attractive interaction with MIBK. For all fragment sizes simulated, the diffusivity of PMMA fragments is 60–160% higher in MIBK as well. Similarly, the authors observed differences in the gyration radii. The authors conclude that the kinetic factor seems to be more significant as compared to affinity factor when accounting for differences in exposure sensitivities due to developer selection.Exposure of polymethylmethacrylate (PMMA) during electron beam lithography (EBL) produces small polymer fragments that dissolve rapidly during the development process. The resist dissolution behavior varies greatly depending on the nature of the developer (solvent) and therefore influences the selection of the EBL parameters, such as dose (sensitivity). A molecular scale examination of the development process is necessary to elucidate the resist–developer interaction mechanisms. In this work, the authors investigate the interaction of short PMMA chains (containing up to 10 MMA units) with common developer components methyl isobutyl ketone (MIBK) and isopropyl alcohol (IPA). For this purpose, the authors conduct molecular dynamics simulations using the Accelrys Materials Studio package. The simulation results were used to characterize the mixtures in the spirit of the Flory–Huggins theory of polymers and also to extract the diffusivities. The authors found that the behavior of PMMA fragments differed consi...