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Moiré pattern

About: Moiré pattern is a research topic. Over the lifetime, 1917 publications have been published within this topic receiving 27176 citations. The topic is also known as: moiré fringes & moire pattern.


Papers
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Journal ArticleDOI
TL;DR: The application of "parallel" moiré deflectometry in measuring the nonlinear refractive index of materials is reported, which allows one to measure the radius of curvature of the light beam by measuring themoiré fringe spacing.
Abstract: In this paper, the application of “parallel” moire deflectometry in measuring the nonlinear refractive index of materials is reported. In “parallel” moire deflectometry the grating vectors are parallel, and the resulting moire fringes are also parallel to the grating lines. Compared to “rotational” moire deflectometry and the Z-scan technique, which cannot easily determine the moire fringe’s angle of rotation and is sensitive to power fluctuations, respectively, “parallel” moire deflectometry is more reliable, which allows one to measure the radius of curvature of the light beam by measuring the moire fringe spacing. The nonlinear refractive index of the sample, including the sense of the change, is obtained from the moire fringe spacing curve. The method is applied for measuring the nonlinear refractive index of ferrofluids.

24 citations

Journal ArticleDOI
TL;DR: An implementation of the phase shifting technique for computer-aided processing of interference fringes obtained by the moire interferometry method for in-plane displacement measurements or in a similar arrangement used for out-of-planes displacement (flatness) determination is presented.
Abstract: Described in this short paper is an implementation of the phase shifting technique for computer-aided processing of interference fringes obtained by the moire interferometry method for in-plane displacement measurements or in a similar arrangement used for out-of-plane displacement (flatness) determination. The polarized light approach was selected because of the common path propagation of the interfering beams. The experimental verification is presented.

24 citations

Journal ArticleDOI
TL;DR: This work deals with the less-studied case of images formed at finite distances from the gratings, using an extended monochromatic light source.
Abstract: The term generalized grating imaging is used to describe the process of image formation of a grating using only another grating as imaging system. The moire and the Lau effects could be regarded as particular cases of such a process. Here we deal with the less-studied case of images formed at finite distances from the gratings, using an extended monochromatic light source. Some experimental results are shown for the images obtained in this last case, and they are compared with theoretical predictions.

24 citations

Patent
Jeffrey L. Trask1
26 Oct 1998
TL;DR: In this article, a halftone image has reduced moire patterns by applying a screen function of the type having a first function exhibiting symmetry about a point and a second function exhibiting symmetry about a line.
Abstract: A system provides a halftone image having reduced moire patterns by applying a screen function of the type having a first function exhibiting symmetry about a point and a second function exhibiting symmetry about a line. In a progression of tone levels, such a screen function creates first dots, then lines, then dots. For example, a screen function may include the sum of a first function of the type (1−cos(pi*(x+y))*cos(pi*(y−x))) and a second function being a piecewise linear function of x, where {x,y} is a coordinate location in a unit cell mapped to a halftone cell mapped to the image pixel grid. In other embodiments, a unit cell is defined on the grid by a vector. The vector has a component along an axis of the grid. The component has a noninteger length. Unit cells of the type so defined implement rational tangent angles not possible with conventional halftone cells.

23 citations

Journal ArticleDOI
TL;DR: In this article, a dual gratings-based alignment method was proposed to measure the relative linear displacement between the mask and the wafer, which can be applied to lithography and other correlated fields, and the analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire fringes with different tilt angles have different influences on the alignment accuracy.

23 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023181
2022321
202126
202048
201946
201844