Noise margin

About: Noise margin is a research topic. Over the lifetime, 1167 publications have been published within this topic receiving 15235 citations.

SRAM design on 65-nm CMOS technology with dynamic sleep transistor for leakage reduction

Abstract: A 70-Mb SRAM is designed and fabricated on a 65-nm CMOS technology. It features a 0.57-/spl mu/m/sup 2/ 6T SRAM cell with large noise margin down to 0.7 V for low-voltage operation. The fully synchronized subarray contains an integrated leakage reduction scheme with dynamically controlled sleep transistor. SRAM virtual ground in standby is controlled by programmable bias transistors to achieve good voltage control with fine granularity under process skew. It also has a built-in programmable defect "screen" circuit for high volume manufacturing. The measurements showed that the SRAM leakage can be reduced by 3-5/spl times/ while maintaining the integrity of stored data.

High-Performance WSe2 Complementary Metal Oxide Semiconductor Technology and Integrated Circuits.

Abstract: Because of their extraordinary structural and electrical properties, two-dimensional materials are currently being pursued for applications such as thin-film transistors and integrated circuit. One of the main challenges that still needs to be overcome for these applications is the fabrication of air-stable transistors with industry-compatible complementary metal oxide semiconductor (CMOS) technology. In this work, we experimentally demonstrate a novel high performance air-stable WSe2 CMOS technology with almost ideal voltage transfer characteristic, full logic swing and high noise margin with different supply voltages. More importantly, the inverter shows large voltage gain (∼38) and small static power (picowatts), paving the way for low power electronic system in 2D materials.

Mixed self-assembled monolayer gate dielectrics for continuous threshold voltage control in organic transistors and circuits.

Abstract: Mixed alkyl/fluoroalkyl phosphonic acid self-assembled monolayers have been prepared as ultra-thin dielectrics in low-voltage organic thin-film transistors and complementary circuits. Mixed monolayers enable continuous threshold-voltage tuning simply by adjusting the molecular mixing ratio Continuous threshold-voltage control makes it possible to place the switching voltage of the circuits at precisely half the supply voltage, producing the maximum noise margin. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Statistical analysis of SRAM cell stability

Abstract: The impact of process variation on SRAM yield has become a serious concern in scaled technologies. In this paper, we propose a methodology to analyze the stability of an SRAM cell in the presence of random fluctuations in the device parameters. We provide a theoretical framework for characterizing the DC noise margin of a memory cell and develop models for estimating the cell failure probabilities during read and write operations. The proposed models are verified against extensive Monte-Carlo simulations and are shown to match well over the entire range of the distributions well beyond the 3-sigma extremes.

Tuning the threshold voltage of carbon nanotube transistors by n-type molecular doping for robust and flexible complementary circuits.

Abstract: Tuning the threshold voltage of a transistor is crucial for realizing robust digital circuits. For silicon transistors, the threshold voltage can be accurately controlled by doping. However, it remains challenging to tune the threshold voltage of single-wall nanotube (SWNT) thin-film transistors. Here, we report a facile method to controllably n-dope SWNTs using 1H-benzoimidazole derivatives processed via either solution coating or vacuum deposition. The threshold voltages of our polythiophene-sorted SWNT thin-film transistors can be tuned accurately and continuously over a wide range. Photoelectron spectroscopy measurements confirmed that the SWNT Fermi level shifted to the conduction band edge with increasing doping concentration. Using this doping approach, we proceeded to fabricate SWNT complementary inverters by inkjet printing of the dopants. We observed an unprecedented noise margin of 28 V at VDD = 80 V (70% of 1/2VDD) and a gain of 85. Additionally, robust SWNT complementary metal−oxide−semiconductor inverter (noise margin 72% of 1/2VDD) and logic gates with rail-to-rail output voltage swing and subnanowatt power consumption were fabricated onto a highly flexible substrate.