Topic
Nozzle
About: Nozzle is a research topic. Over the lifetime, 158675 publications have been published within this topic receiving 893026 citations. The topic is also known as: spout.
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Patent•
IBM1
TL;DR: In this paper, the micromist ink particles are entrained in the jet and focused to print a narrow width region which is substantially smaller in size than the overall jet diameter and the nozzle opening.
Abstract: A micromist printing arrangement wherein a micromist of ink particles, provided by an ultrasonic nebulizer, is forced through a small nozzle to form an aerosol jet. The micromist ink particles are entrained in the jet and focused to print a narrow width region which is substantially smaller in size than the overall jet diameter and the nozzle opening. Particle size, jet stream velocity and air or other carrier gas viscosity are considered in establishing focusing characteristics of the aerosol jet, which is directed against the paper to wet the same, thereby obtaining dense, well defined print lines. According to a first embodiment, modulation of the aerosol jet is achieved by fluid logic control whereby a vacuum is introduced into the path of the aerosol jet to shunt it from its printing path. In another embodiment, control may be achieved through the use of sonic excitation of turbulence into the aerosol jet. The sonic excitation changes the aerosol jet from laminar flow to turbulent flow, resulting in a reduction of the velocity of the aerosol jet such that the aerosol ink particles do not wet the paper.
92 citations
Patent•
[...]
24 May 1991
TL;DR: In this paper, a self-cleaning filter including a filter housing (2) having at least a raw-liquid inlet (4), a clean-liquid outlet (6), and a filter medium (8) interposed between the raw liquid inlet and the clean liquid outlet, has at least one nozzle (10) which is located in proximity to the filter medium and is connectable to at least two different sources of pressure (HP, LP) one of which pressures is higher than the pressure prevailing in the filter, the other one being lower than the pressures prevailing
Abstract: A self-cleaning filter including a filter housing (2) having at least a raw-liquid inlet (4), a clean-liquid outlet (6), and a filter medium (8) interposed between the raw-liquid inlet and the clean-liquid outlet, has at least one nozzle (10) which is located in proximity to the filter medium (8) and is connectable to at least two different sources of pressure (HP,LP), one of which pressures is higher than the pressure prevailing in the filter, the other one being lower than the pressure prevailing in the filter. There is also provided an arrangement (16,18,20,22) to produce a relative movement between the filter medium (8) and the at least one nozzle (10) to effect coverage of a substantial part of the surface area of the filter medium by the nozzle.
92 citations
01 Jan 1995
TL;DR: The first valveless diffuser fluid pump in silicon is presented in this paper, which consists of a planar double-chamber arrangement fabricated in a silicon wafer anodically bonded to a glass wafer.
Abstract: The first valve-less diffuser fluid pump in silicon is presented. It consists of a planar double-chamber arrangement fabricated in a silicon wafer anodically bonded to a glass wafer. The pump uses fluid-directing diffuser - nozzle elements which have a depth of and a neck width of . The pump chamber diameter is 6 mm. Pump cavities and diffuser - nozzle elements are etched with an isotropic HNA silicon etch. Pumps with three different diffuser lengths are compared reaching a maximum pump capacity of and a maximum pump pressure of 1.7 m at a resonance frequency of 1318 Hz for methanol.
92 citations
TL;DR: In this article, a two-dimensional numerical model simulating the conservation of mass, momentum and energy of air, and water, was developed for predicting the heat and mass transfer in spray-air flow systems.
92 citations
Patent•
30 Aug 1996
TL;DR: In this article, an equipment for cleaning, etching and drying a semiconductor wafer is provided with a process chamber having a closed space of which temperature is capable of being heated and adjusted by a heater.
Abstract: An equipment for cleaning, etching and drying a semiconductor wafer is provided with a process chamber having a closed space of which temperature is capable of being heated and adjusted by a heater; a mesh arranged at the center part in the process chamber and supporting at least one semiconductor wafer to be cleaned; a plurality of spray nozzles arranged in line at the upper part in the process chamber; and a rotary discharge nozzle arranged at the lower part in the process chamber. The spray nozzles spray chemical and ultrapure water with nitrogen gas in mist state, and the rotary discharge nozzle blows out chemical and ultrapure water as jet stream by rotation of a first arm and second arms thereof.
92 citations