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Showing papers on "Page layout published in 2014"


Journal ArticleDOI
TL;DR: In this article, a mixed-integer programming model for a multi-floor layout design of cellular manufacturing systems (CMSs) in a dynamic environment is presented, which concurrently determines the cell formation (CF) and group layout (GL) as the interrelated decisions involved in the design of a CMS in order to achieve an optimal (or near-optimal) design solution.

85 citations


Journal ArticleDOI
TL;DR: In this article, a new integrated approach is presented for designing cellular manufacturing system and its inter-and intra-cell layouts, where various production factors such as part demands, alternative processing routings, operation sequences, processing times, capacity of machines, etc.

54 citations


Proceedings ArticleDOI
01 Jun 2014
TL;DR: In this paper, the problem of e-beam shot count minimization subject to bounded line end extension constraints is considered and elegant ILP formulations for both approaches are proposed.
Abstract: Due to the resolution limitations of optical lithography equipment, 1D gridded layout design is gaining steam. Self-aligned double patterning (SADP) is a mature technology for printing 1D layouts. However, for 20nm and beyond, SADP using a single trim mask becomes insufficient for printing all 1D layouts. A viable solution is to complement SADP with e-beam lithography. In this paper, in order to increase the throughput of printing a 1D layout, we consider the problem of e-beam shot count minimization subject to bounded line end extension constraints. Two different approaches of utilizing the trim mask and e-beam to print a layout are considered. The first approach is under the assumption that the trim mask and e-beam are used for end cutting. The second is under the assumption that the trim mask and e-beam are used to rid of all unnecessary portions. We propose elegant ILP formulations for both approaches. Experimental results show that both ILP formulations can be solved efficiently. The pros and cons of the two approaches for manufacturing 1D layout are discussed.

41 citations


Patent
19 Feb 2014
TL;DR: In this paper, a page layout self-adaptation method and device is presented, where program codes for adjusting page layout are inserted; based on the inserted program codes, the screen display width of a mobile terminal is obtained; according to the obtained screen displaywidth, the page display width, the display widths of elements which form the page of the webpage are adjusted, meanwhile the display positions of the elements are arranged to be in a floating display mode; the webpage does not need to be designed and modified again.
Abstract: The invention discloses a page layout self-adaptation method and device. Program codes for adjusting page layout are inserted; based on the inserted program codes, the screen display width of a mobile terminal is obtained; according to the obtained screen display width, the page display width of a webpage is adjusted based on the preset proportion; according to the page display width, the display widths of elements which form the page of the webpage are adjusted, meanwhile, the display positions of the elements are arranged to be in a floating display mode; the webpage does not need to be designed and modified again, the page of the webpage can be automatically adaptive to a mobile terminal display screen, the display effect of the original webpage is not affected at all, the man-machine interactivity is improved; in addition, self adaptation can be achieved only by inserting corresponding JS codes, a large amount of manpower is saved, meanwhile, if corresponding visual effect needs to be changed, only corresponding codes need to be changed, cost is low, and later-period maintaining and upgrading are convenient.

32 citations


Patent
Fujiwara Hidehiro1, Kao-Cheng Lin1, Ming-Yi Lee1, Yen-Huei Chen1, Hung-jen Liao1 
10 Jun 2014
TL;DR: A layout design usable for manufacturing a memory cell includes a first and second active area layout pattern associated with forming a first-and second-active areas, an isolation region outside the first-active area, a first polysilicon layout pattern associating with forming the first poly-silicon structure, a second poly-icon layout patterns associated with constructing the second-and third-active-area structures, and a second interconnection layout pattern associate with constructing a second-interconnection structure as mentioned in this paper.
Abstract: A layout design usable for manufacturing a memory cell includes a first and second active area layout pattern associated with forming a first and second active area, an isolation region outside the first and second active area, a first polysilicon layout pattern associated with forming a first polysilicon structure, a second polysilicon layout pattern associated with forming a second polysilicon structure, a first interconnection layout pattern associated with forming a first interconnection structure, and a second interconnection layout pattern associated with forming a second interconnection structure. The first active area does not overlap the second active area. The first polysilicon layout pattern overlaps the first active area layout pattern. The second polysilicon layout pattern overlaps the first active area layout pattern and the second active area layout pattern. The first interconnection layout pattern overlaps the second active area layout pattern. The second interconnection layout pattern overlaps the isolation region.

28 citations


Journal ArticleDOI
TL;DR: In this paper, three different methods are described to solve the problem: multiobjective scatter search (MOSS), non-dominated genetic algorithm (NSGA-II), and the e-constraint method.
Abstract: Two key decisions in designing cellular manufacturing systems are cell formation and layout design problems. In the cell formation problem, machine groups and part families are determined while in the facility layout problem the location of each machine in each cell (intra-cell layout) and the location of each cell (inter-cell layout) are decided. Owing to the fact that there are interactions between two problems, cell formation and layout design problem must be tackled concurrently to design a productive manufacturing system. In this research, two problems are investigated concurrently. Some important and realistic factors such as inter-cell layout, intra-cell layout, operations sequence, part demands, batch size, number of cells, cell size, and variable process routings are incorporated in the problem. The problem is formulated as a mathematical model. Three different methods are described to solve the problem: multi-objective scatter search (MOSS), non-dominated genetic algorithm (NSGA-II), and the e-constraint method. The methods are employed to solve nine problems generated and adopted from the literature. Sensitivity analysis is accomplished on the parameters of the problem to investigate the effects of them on objective function values. The results show that the proposed MOSS algorithm performs better than NSGA-II and produces better solutions in comparison to multi-stage approaches.

24 citations


Proceedings ArticleDOI
19 May 2014
TL;DR: This top-level structural analysis relies on the generation of an article separation grid applied recursively on the document image, allowing analyzing any type of Manhattan page layout, even for complex structures with multiple columns and overlapping entities.
Abstract: We present a complete method for article segmentation in old newspapers, which deals with complex layouts analysis of degraded documents. The designed workflow can process large amounts of documents and generates digital objects in METS/ALTO format in order to facilitate the indexing and the browsing of information in digital libraries. The analysis of the document image is performed by a two stages scheme. Pixels are labeled in a first stage with a Conditional Random Field model in order to intent to label the areas of interest with a low logical level. Then this first logical representation of the document content is analyzed in a second stage to get a higher logical representation including article segmentation and reading order. This top-level structural analysis relies on the generation of an article separation grid applied recursively on the document image, allowing analyzing any type of Manhattan page layout, even for complex structures with multiple columns and overlapping entities. This method which benefits from both a local analysis using a probabilistic model trained using machine learning procedures, and a more global structural analysis using recursive rules, is evaluated on a dataset of daily local press document images covering several time periods and different page layouts, to prove its effectiveness.

24 citations


Proceedings ArticleDOI
14 Dec 2014
TL;DR: A novel learning-based framework to identify tables from scanned document images as a structured labeling problem, which learns the layout of the document and labels its various entities as table header, table trailer, table cell and non-table region is presented.
Abstract: The paper presents a novel learning-based framework to identify tables from scanned document images. The approach is designed as a structured labeling problem, which learns the layout of the document and labels its various entities as table header, table trailer, table cell and non-table region. We develop features which encode the foreground block characteristics and the contextual information. These features are provided to a fixed point model which learns the inter-relationship between the blocks. The fixed point model attains a contraction mapping and provides a unique label to each block. We compare the results with Condition Random Fields(CRFs). Unlike CRFs, the fixed point model captures the context information in terms of the neighbourhood layout more efficiently. Experiments on the images picked from UW-III (University of Washington) dataset, UNLV dataset and our dataset consisting of document images with multicolumn page layout, show the applicability of our algorithm in layout analysis and table detection.

23 citations


Patent
19 Nov 2014
TL;DR: In this paper, the authors propose a method for rendering a mobile application interface through data, which comprises the following steps S1 to S3, wherein the step S1 is to implant a page template htm1 and a control xm1 in a server, and form a Json data packet of page data and control data through analysis.
Abstract: The invention relates to a method for rendering a mobile application interface through data. The method comprises the following steps S1 to S3, wherein the step S1 is to implant a page template htm1 and a control xm1 in a server, and form a Json data packet of page data and control data through analysis; the step S2 is to send a request to the server by a client end, receive the Json data packet and convert the Json data packet into a page model; the step S3 is to process data of the page model for generating a page event and a page control, and render a page layout at the same time. The beneficial effects are that a mobile web page can be rendered through data; front-end programmers are enabled to implement details without excessively focusing page controls, so that development time is shortened, and the reuse degree of pages between mobile applications is increased.

21 citations


Patent
09 Jun 2014
TL;DR: The Layout Optimizer as discussed by the authors provides various real-time iterative constraint-satisfaction methodologies that use constraint-based frameworks to generate optimized layouts that map or embed virtual objects into environments.
Abstract: A “Layout Optimizer” provides various real-time iterative constraint-satisfaction methodologies that use constraint-based frameworks to generate optimized layouts that map or embed virtual objects into environments. The term environment refers to combinations of environmental characteristics, including, but not limited to, 2D or 3D scene geometry or layout, scene colors, patterns, and/or textures, scene illumination, scene heat sources, fixed or moving people, objects or fluids, etc., any of which may evolve or change over time. A set of parameters are specified or selected for each object. Further, the environmental characteristics are determined automatically or specified by users. Relationships between objects and/or the environment derived from constraints associated with objects and the environment are then used to iteratively determine optimized self-consistent and scene-consistent object layouts. This enables the Layout Optimizer to augment environments with arbitrary content in a structured constraint-based process that adapts to changing scenes or environments.

21 citations


Patent
22 Oct 2014
TL;DR: In this paper, a software project development method and device which is applied to a software development platform is described, which is provided with a function model template capable of establishing function models.
Abstract: The invention discloses a software project development method and device which is applied to a software development platform. The software development platform is provided with a function model template capable of establishing function models. The software project development method includes acquiring configuration files containing header configuration information of target development projects, page layout configuration information, service logic configuration information, data operation area configuration information, page data source relation configuration information, toolbar configuration information and external resource configuration information; establishing the corresponding function models of the configuration files, wherein the function models include header entries, page layout items, service logic items, data operation area items, page data source relation items, toolbar items and external resource items; running the function models and generating the target development projects corresponding to service scenes described in the configuration files.

Journal ArticleDOI
TL;DR: In this paper, the manufacturing plant layout area consists of various activity cells such as design office, manufacturing shops, assembly and inspection departments, administration and security locations etc., the fundamental goal of facility layout problem is to minimize the material flow costs by positioning the cells within a stipulated area.

Journal Article
TL;DR: The primary purpose of this paper is to present the results of an online survey of the effectiveness of the COMPETE Online Decision Entry System (CODES), which was deployed on the Web in Fall 1999.
Abstract: The primary purpose of this paper is to present the results of an online survey of the effectiveness of the COMPETE Online Decision Entry System (CODES), which was deployed on the Web in Fall 1999. A brief ASP-based CODES Evaluation Survey was developed and deployed on the Web to assess whether CODES was convenient and easy to use, whether decision entry and viewing and printing output were simple, and whether the decision entry page layout was easy to follow. In addition, respondents were asked whether they preferred to print one or more pages of results at a time, and whether they encountered any difficulty logging in to CODES. The results of the survey and suggestions for improvement are presented, and future improvements are discussed.

Patent
12 Sep 2014
TL;DR: In this article, a method of forming a layout design for fabricating an integrated circuit (IC) is disclosed, which includes identifying one or more areas in the layout design occupied by one or many segments of a plurality of gate structure layout patterns.
Abstract: A method of forming a layout design for fabricating an integrated circuit (IC) is disclosed. The method includes identifying one or more areas in the layout design occupied by one or more segments of a plurality of gate structure layout patterns of the layout design; and generating a set of layout patterns overlapping the identified one or more areas. The plurality of gate structure layout patterns has a predetermined pitch smaller than a spatial resolution of a predetermined lithographic technology. A first layout pattern of the set of layout patterns has a width less than twice the predetermined pitch.

Patent
Yen-Sen Wang1, Ting Yu Chen1, Ken-Hsien Hsieh1, Ming-Yi Lin1, Chen-Hung Lu1 
01 Apr 2014
TL;DR: In this paper, the authors propose a method of hierarchical layout design, comprising forming a layout of an integrated circuit (IC) according to a design rule that specifies a minimum design rule distance between a neighboring layout features within the IC.
Abstract: Some embodiments relate to a method of hierarchical layout design, comprising forming a layout of an integrated circuit (IC) according to a design rule that specifies a minimum design rule distance between a neighboring layout features within the IC. Forming the layout comprises forming first and second standard cells having first and second layout features, respectively, that about one-another so that a distance between the first and second layout features is less than the minimum design rule distance. The method further comprises configuring design rule checking (DRC) to ignore this fail. Instead, the layout is modified with an automated layout tool by merging the first and second layout features, or by removing a portion of the first or second layout feature to increase the distance between the first and second layout features to be greater than or equal to the minimum distance.

Patent
08 Jul 2014
TL;DR: In this paper, a first layout design for a semiconductor device is received and a second layout design that includes a revised active region with a revised corner that protrudes outward is fabricated based on the first layout.
Abstract: The present disclosure provides a method of fabricating a semiconductor device. A first layout design for a semiconductor device is received. The first layout design includes a plurality of gate lines and an active region that overlaps with the gate lines. The active region includes at least one angular corner that is disposed adjacent to at least one of the gate lines. The first layout design for the semiconductor device is revised via an optical proximity correction (OPC) process, thereby generating a second layout design that includes a revised active region with a revised corner that protrudes outward. Thereafter, the semiconductor device is fabricated based on the second layout design.

Journal Article
TL;DR: This research paper aims to study and improve the current plant layout and are analysed & designed by using string diagram, and efficiency of the current & proposed plant layout are calculated.
Abstract: Facilities layout is a systematic and functional arrangement of different departments, machines, equipments and services in a manufacturing industry. It is essential to have a well developed plant layout for all the available resources in an optimum manner and get the maximum out of the capacity of the facilities. The efficiency of production depends on how well the various machines, services production facilities and employee’s amenities are located in a plant. This research paper aims to study and improve the current plant layout and are analysed & designed by using string diagram. An Attempt is made to simulate the current and proposed factory layout by using ARENA software. Efficiency of the current & proposed plant layout are calculated.

Patent
26 Mar 2014
TL;DR: In this paper, an automatic layout method and device of flexible cables and related to the technical field of mechanical engineering is presented. But the method is not suitable for large quantities of cables and is not easily realized in the prior art.
Abstract: The invention provides an automatic layout method and device of flexible cables and relates to the technical field of mechanical engineering. By adoption of the automatic layout method and device, the difficulty that the automatic layout design of large quantity of cables is not easily realized in the prior art is solved. The automatic layout method comprises the following steps of: acquiring information of cable bundles; acquiring position information of first ends of the cables and position information of second ends of the cables; acquiring cable paths according to the information of the cable bundles, the position information of the first ends and the position information of the second ends. The automatic layout method and device provided by the invention have the advantages that automatic generation of the flexible cables on a three-dimensional model of a complex product can be realized, and the design efficiency and the quality of the cable layout are effectively improved.

Patent
24 Dec 2014
TL;DR: In this paper, an electronic document generating and displaying method and apparatus is presented, which includes the steps of obtaining electronic document data packet, wherein the data packet comprises page layout description information, content stream description information and resource description information of an e-document; performing page layout on a display page according to the page layout descriptions; determining the content to be displayed and a display style according to content stream descriptions and the resource descriptions.
Abstract: The invention discloses an electronic document generating and displaying method and apparatus. The method includes the steps of obtaining an electronic document data packet, wherein the data packet comprises page layout description information, content stream description information and resource description information of an electronic document; performing page layout on a display page according to the page layout description information; determining the content to be displayed and a display style according to the content stream description information and the resource description information; performing layout and displaying the content to be displayed in the display page on which the page layout is performed in accordance with the display style. By means of the electronic document generating and displaying method and apparatus, the certainty, flexibility and freedom on the layout and display of the electronic document can be obtained.

Journal ArticleDOI
TL;DR: In this paper, the layout design is an important task when a manufacturing system is constructed, or expanded, and the aim of this research is to study the existing plant layout of manufacturing unit and improve it using systematic layout planning theory (SLP) for better plant area utilization and increased productivity.
Abstract: In the present work, the layout design is an important task when a manufacturing system is constructed, or expanded. The objective of this research is to study the existing plant layout of manufacturing unit and improve it using systematic layout planning theory (SLP) for better plant area utilization and increased productivity In this paper we highlighted some problems faced by one medium scale Auto Ancillary company. The layout of the firm was the main concern regarding the operations conducted and material flow in the assembly line. Company focuses mainly to improve the productivity of plant. We use systematic layout planning (SLP) approach to improve existing layout of the company. The detailed study of the plant layout such as operation process chart, flow of material and activity relationship chart has been investigated. Final layout was selected by installation of new machine with effective utilization of area to improve productivity.

Patent
19 Mar 2014
TL;DR: In this article, a layout design photolithographic technology friendliness detection method is proposed, which comprises the steps of filtering original target graphic data in advance to determine a latent technology hot spot region, converting the graphic data of the latent technology hotspots region into photolithogrithmic target graphics data, then performing simplified optical proximity correction and graphic simulation on the photolithogrammogrammics to preliminarily investigate technology hot spots.
Abstract: The invention discloses a layout design photolithographic technology friendliness detection method which comprises the steps of filtering original target graphic data in advance to determine a latent technology hot spot region, converting the graphic data of the latent technology hot spot region into photolithographic target graphic data, then performing simplified optical proximity correction and graphic simulation on the photolithographic target graphic data to preliminarily investigate technology hot spots, and performing precise and complete optical proximity correction and precise and complete graphic simulation according to a technology hot spot preliminary investigation labeled position and graphic data of necessary surrounding positions to execute final check on the technology hot spots. Therefore, on the premise that the technology hot spots are precisely found, the software calculation time and the software use time are shortened in the whole process, the production cost is reduced, and the production efficiency is improved.

Journal ArticleDOI
TL;DR: In this article, the authors present a research that investigates solutions and algorithms for determining the optimum machine layout served by an autonomous material handling system, like a mobile robot or an automated guided vehicle.
Abstract: This paper presents a research that investigates solutions and algorithms for determining the optimum machine layout served by autonomous material handling system, like mobile robot or automated guided vehicle. Unlike previous works which solved the layout problem by optimizing the distance between facilities, in this paper the machine layout is addressed based on optimizing the travel time of the material handling system. The proposed approach can include boundary kinematic constraints of vehicle while optimizing the objective function such as velocity, acceleration, orientation, and trajectory curvature. The nonlinear constrained model is transformed to unconstrained problem using penalty method. Then, a simulated annealing-based algorithm is used to search for the optimum locations of machines among all possible feasible layouts. The simulation results showed that the proposed approach was efficient enough to use in real factories due to including a vehicle path planner integrated in an overall layout design scheme that involves searching of vehicle control parameters.

Patent
21 May 2014
TL;DR: In this article, an implementation method of a Skill program of automatic mirroring of PCB layout design is described. But this method is implemented by modifying partial configuration files of software, and therefore a background database of the Layout design is modified directly.
Abstract: The invention discloses an implementation method of a Skill program of automatic mirroring Layout design. In PCB Layout design, the Skill program is implemented by modifying partial configuration files of software, and therefore a background database of the Layout design is modified directly. According to the implementation method, the Skill program is used, mirroring of parts, wiring, via holes and copper foil can be carried out together, waste of a large amount of work done at the early stage of Layout is avoided, a large amount of working hour waste caused by re-layout and rewiring after part mirroring is avoided, and therefore working efficiency is improved.

Journal Article
TL;DR: In this article, the authors explored the use of appropriate line balancing to facilitate a good layout design and showed how a good Layout can be designed and productivity can be increased by appropriate assembly line balancing.
Abstract: The layout design problem is a strategic issue and has a significant impact on the efficiency of a manufacturing system. Much of the existing layout design literature that uses a surrogate function for flow distance or for simplified objectives may be entrapped into local optimum; and subsequently lead to a poor layout design. The present study explores the use of appropriate line balancing to facilitate a good layout design. Construction of a quality garment requires a great deal of know-how, a lot of coordination and schedule management. Clothing manufacturing consists of a variety of product categories, materials and styling. Dealing with constantly changing styles and consumer demands is so difficult. Furthermore, to adapt automation for the clothing system is also so hard because, beside the complex structure also it is labour intensive. Overall, the important criteria in garment production is whether assembly work will be finished on time for delivery, how machines and employees are being utilized, whether any station in the assembly line is lagging behind the schedule and how the assembly line is doing overall. To achieve this approach, work-time study, assembly line balancing and simulation can be applied to apparel production line to find alternative solutions to increase the efficiency of the sewing line. In this paper we showed how a good layout can be designed and productivity can be increased by appropriate assembly line balancing.

Patent
23 Jul 2014
TL;DR: In this article, a method for automatically adjusting a page layout is presented, which consists of the steps that operations to boxes of a user are captured, and a box to be adjusted is determined; the position relation of the box to adjust and other boxes or grids is judged, and the size or position of the boxes to adjust according to a preset automatic adjusting scheme.
Abstract: The invention provides a method for automatically adjusting a page layout. The method comprises the steps that operations to boxes of a user are captured, and a box to be adjusted is determined; the position relation of the box to be adjusted and other boxes or grids is judged, and the size or position of the box to be adjusted is adjusted according to a preset automatic adjusting scheme. The operations to the boxes of the user comprise the selecting operation to the boxes or the operation for changing the shapes or the positions of the boxes; the operation for changing the shapes or the positions of the boxes comprises dragging operation or the operation for inputting the widths or the heights or the feature coordinates of the boxes to change the shapes or the positions of the boxes. The invention further provides a device for automatically adjusting the page layout. According to the technical scheme, the method and device have the advantages that in the process of adjusting the page layout, particularly the process of fine adjusting, the possible deviation caused by manual operation is automatically adjusted, and the efficiency and the orderliness degree of layout adjustment are fully improved.

Book ChapterDOI
01 Jan 2014
TL;DR: In this paper, a triangular stochastic facility layout model in a cellular manufacturing system (CMS) has been developed to simulate the effects of variability of demand of products on the layout of facilities.
Abstract: Volatility of manufacturing environments decreases the performance of the system by degrading the efficiency and effectiveness of the layout. In this paper, in order to simulate the effects of variability of demand of products on the layout of facilities in a cellular manufacturing system (CMS), a triangular stochastic facility layout model in a CMS has been developed. To validate the model, two solution approaches have been applied; a developed enumeration method, and also Lingo 12.0 optimization software. Solving the model for a case shows that variation in demand of products may lead to a change in the layout of the facilities.

Journal ArticleDOI
TL;DR: This research innovates the traditional manual FMCRLD workflow to eliminate costly human errors and boost the less-experienced mould designer's ability and productivity in performing FCMRLD during the CMLD phase.
Abstract: Family Mould Cavity Runner Layout Design (FMCRLD) is the most demanding and critical task in the early Conceptual Mould Layout Design (CMLD) phase. Traditional experience-dependent manual FCMRLD workflow causes long design lead time, non-optimum designs and human errors. However, no previous research can support FMCRLD automation and optimisation. The nature of FMCRLD is non-repetitive and generative. The complexity of FMCRLD optimisation involves solving a complex two-level combinatorial layout design optimisation problem. Inspired by the theory of evolutionary design in nature ''Survival of the Fittest'' and the biological genotype-phenotype mapping process of the generation of form in living systems, this research first proposes an innovative evolutionary FMCRLD approach using Genetic Algorithms (GA) and Mould Layout Design Grammars (MLDG) that can automate and optimise such generative and complex FMCRLD with its explorative and generative design process embodied in a stochastic evolutionary search. Based on this approach, an Intelligent Conceptual Mould Layout Design System (ICMLDS) prototype has been developed. The ICMLDS is a powerful intelligent design system as well as an interactive design-training system that can encourage and accelerate mould designers' design alternative exploration, exploitation and optimisation for better design in less time. This research innovates the traditional manual FMCRLD workflow to eliminate costly human errors and boost the less-experienced mould designer's ability and productivity in performing FCMRLD during the CMLD phase.

Patent
20 Feb 2014
TL;DR: In this article, an online WYSIWYG HTML editor enables users to create page layouts with arbitrary numbers of sections and columns without any specialized knowledge of HTML coding techniques.
Abstract: In one aspect, a page layout editor is configured to automatically modify page layouts of Web pages with sections and columns. An online WYSIWYG HTML editor enables users to create page layouts with arbitrary numbers of sections and columns without specialized knowledge of HTML coding techniques. In an embodiment, a computer-implemented data processing method comprises obtaining source code of an electronic document; automatically modifying the source code by adding a coded hierarchy configured to specify definitions of one or more sections and one or more columns, and initially specifying a single section and a single column in the coded hierarchy; receiving first input indicating selection of a particular page layout control among a plurality of page layout controls in a graphical user interface, the input specifying any of: adding a section; deleting a section; changing to a first number of columns; in response to the first input, automatically modifying the source code by changing the coded hierarchy to specify definitions of a different number of sections or the first number of columns as indicated by the input; causing generating an updated editing view of the electronic document that graphically represents the different number of sections or the first number of columns; wherein the method is performed using one or more computing devices.

Journal ArticleDOI
TL;DR: In this article, a layout optimization method for maintainability of multi-component systems is proposed, where maintainability, layout space and distance requirement are formulated as objective functions and a multi-objective particle swarm optimization algorithm is used to obtain Pareto optimal solutions for the maintainability layout design problem.
Abstract: To improve the maintainability design efficiency and quality, a layout optimization method for maintainability of multi-component systems was proposed. The impact of the component layout design on system maintainability was analyzed, and the layout problem for maintainability was presented. It was formulated as an optimization problem, where maintainability, layout space and distance requirement were formulated as objective functions. A multi-objective particle swarm optimization algorithm, in which the constrained-domination relationship and the update strategy of the global best were simply modified, was then used to obtain Pareto optimal solutions for the maintainability layout design problem. Finally, application in oxygen generation system of a spacecraft was studied in detail to illustrate the effectiveness and usefulness of the proposed method. The results show that the concurrent maintainability design can be carried out during the layout design process by solving the layout optimization problem for maintainability.

Patent
22 Apr 2014
TL;DR: In this paper, a double patterning layout is proposed to define critical paths comprising a first path and a second path on a schematic circuit, and define a double-patterning layout divided into a first mask layout having a first color and two masks having a second color.
Abstract: A double patterning layout design method comprises defining critical paths comprising a first path and a second path on a schematic circuit, and defining a double patterning layout divided into a first mask layout having a first color and a second mask layout having a second color, the double patterning layout corresponding to the schematic circuit. The defining of the double patterning layout comprises anchoring the critical paths on the schematic circuit.