Photomask

About: Photomask is a research topic. Over the lifetime, 7917 publications have been published within this topic receiving 54524 citations. The topic is also known as: photoreticle & reticle.

Method of fabricating a display device

Abstract: An object of the technology of our invention is to solve a luminance defect viewed as a "seam" or the like and to provide a liquid crystal display device having a screen for equally displaying an image. For example, when an exposing process is performed for one conductor layer or a dielectric layer, a total of four photomasks are used corresponding to four shot areas. A light insulation layer of a photomask used for the exposing process for patterning for example a signal line is formed so that it becomes a projection pattern of the signal line. The photomasks corresponding to adjacent shot areas are formed so that patterns of the light insulation layers of the boundary portion are engaged with each other on the plane.

Photomask blank manufacturing method and photomask manufacturing method

Abstract: A thin film made of a material containing a metal and silicon is formed on a light-transmissive substrate. Then, a treatment is performed to modify a main surface of the thin film in advance so that when exposure light having a wavelength of 200 nm or less is accumulatively irradiated on a thin film pattern of a photomask to be produced by patterning the thin film, the transfer characteristic of the thin film pattern does not change more than a predetermined degree. This treatment is performed by carrying out, for example, a heat treatment in an atmosphere containing oxygen at 450° C. to 900° C.

Method and system for reparing defected photomasks

Abstract: A system and method for repairing a photomask ( 52 ) for use in a photolithography process is disclosed, the photomask ( 52 ), consisting of a substrate layer ( 38 ) and a chrome layer ( 36 ) over the substrate layer ( 38 ), having a defect ( 42 ) in the chrome layer ( 36 ), the method comprising: providing a pulsed laser source ( 1 ) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect ( 42 ) to write a diffractive optical element ( 34 ), thus changing the scattering properties of the substrate at the target location.

Process for preparing a flexographic printing plate

Abstract: A process for preparing a flexographic printing plate comprising providing a photosensitive element comprising a support and at least one photopolymerizable layer, providing a photomask adjacent the photopolymerizable layer opposite the support, exposing the photosensitive element with ultraviolet radiation between 200 and 300 nm through the photomask, exposing the photosensitive element with ultraviolet radiation between 310 and 400 nm through the photomask to photopolymerize areas of the photopolymerizable layer, and treating the exposed photosensitive element to remove unpolymerized areas, thereby forming a relief surface suitable for printing.

Photomask blank and photomask

Abstract: A photomask is fabricated by forming, in a photomask (hard mask) produced by forming a patternized film of a masking material comprising (a) a layer of metallic chromium and (b) a layer of chromium oxides superposed thereon, a film of a translucent and electroconductive material selected from Nb, Ta and V, between the masking film and the transparent substrate At the time of pattern transferring by photolithography, dropping off of parts of the pattern of this photomask does not occur even when it includes isolated island-like parts, and, at the time of inspection by electron-beam exposure, the precision of inspection does not lower This photomask is obtained by patternizing by selective etching the masking film of a photomask blank produced by successively forming, on the transparent substrate, the translucent and electroconductive film and the masking film