Topic
Photomask
About: Photomask is a research topic. Over the lifetime, 7917 publications have been published within this topic receiving 54524 citations. The topic is also known as: photoreticle & reticle.
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Papers
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IBM1
TL;DR: In this article, the authors examine and compare several approaches to evaluate mask designs for terminated periodic features, narrow gate lines, and contact holes, and compare the simulations with the actual results obtained when one attempts to use these designs in practice, concluding that there is a vital need for mask simulation, fabrication, inspection, and repair techniques to be developed further before these ''imaginary" masks can be useful in the real world.
Abstract: Use of the phase-shifting mask in lithography allows substantial improvement of the resolution of commercial steppers for periodic circuit patterns, and, in certain cases, features smaller than 200 nm can be fabricated using i-line steppers ((lambda) equals 365 nm). There has therefore been much interest in developing this technology in recent years. In this paper, we examine and compare several approaches to evaluating mask designs for terminated periodic features, narrow gate lines, and contact holes, and compare the simulations with the actual results obtained when one attempts to use these designs in practice. Although we have found atomic force microscopy (AFM) to be a key tool for metrology, we conclude that there is a vital need for mask simulation, fabrication, inspection, and repair techniques to be developed further before these `imaginary' masks can be useful in the real world.
21 citations
Patent•
IBM1
TL;DR: In this paper, a method of manufacturing a photomask for the production of dual depth features on substrates, and the photomasks so manufactured, is described, which is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to the selected wavelengths;
Abstract: A method of manufacturing a photomask for the production of dual depth features on substrates, and the photomask so manufactured, wherein the method of manufacturing the photomask is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to one of the wavelengths; (3) developing the photoresist; (4) etching the exposed masking material and optical filter material; (5) exposing the remaining coated substrate; (6) developing the remaining photoresist; (7) etching the exposed surface; and (8) stripping away the remaining photoresist.
21 citations
Patent•
30 Mar 2009TL;DR: A photomask blank is a phase shift mask having a light-transmitting substrate provided with a phase-shift portion adapted to give a predetermined phase difference to transmitted exposure light as mentioned in this paper.
Abstract: A photomask blank is for manufacturing a phase shift mask having a light-transmitting substrate provided with a phase shift portion adapted to give a predetermined phase difference to transmitted exposure light. The phase shift portion is a dug-down part that is dug down from a surface of the light-transmitting substrate to a digging depth adapted to produce the predetermined phase difference with respect to exposure light transmitted through the light-transmitting substrate at a portion where the phase shift portion is not provided. The photomask blank includes, on the digging-side surface of the light-transmitting substrate, an etching mask film that is made of a material being dry-etchable with a chlorine-based gas, but not dry-etchable with a fluorine-based gas, and serves as an etching mask at least until, when forming the dug-down part by dry etching, the dry etching reaches the digging depth. The photomask blank further includes, on a surface of the etching mask film, a light-shielding film that is made of a material mainly containing tantalum and has a thickness so as to be removable during the dry etching for forming the dug-down part of the light-transmitting substrate.
21 citations
Patent•
07 Sep 1995TL;DR: In this article, a photomask of a liquid crystal display panel is formed by photolithographic exposure of a photosensitive resin layer through micro-lenses, and the apertures thereof are in complete alignment with condensed light through the microlenses.
Abstract: A photomask (5) of a liquid crystal display panel is formed by photolithographic exposure of a photosensitive resin layer through micro-lenses (3), and the apertures thereof are in complete alignment with condensed light through the micro-lenses, so that unnecessary light, such as strayed light, can be effectively masked. The liquid crystal display panel thus formed is provided with an increased effective aperture rate and suitable for a clearer image display.
21 citations
Patent•
10 May 2000
TL;DR: A photomask including a substrate comprised of fluorite (calcium fluoride (CaF 2 )) and protective films comprised of chrome (Cr), chromium oxide (Cro), silicon oxide (SiO 2 or SiO), etc. as discussed by the authors is formed at regions, other than the pattern region where the pattern to be transferred is formed.
Abstract: A photomask including a substrate comprised of fluorite (calcium fluoride (CaF 2 )) and protective films comprised of chrome (Cr), chromium oxide (Cro), silicon oxide (SiO 2 or SiO), etc. and formed at regions, other than the pattern region where the pattern to be transferred is formed, which contact other members when transporting the photomask or using it for exposure.
21 citations