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Photomask

About: Photomask is a research topic. Over the lifetime, 7917 publications have been published within this topic receiving 54524 citations. The topic is also known as: photoreticle & reticle.


Papers
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Patent
Yasuyuki Unno1
14 Aug 1998
TL;DR: A scanning type exposure apparatus as discussed by the authors includes an illumination device for Illuminating a mask, a projection device for projecting a pattern of the mask onto a substrate and a scanning device for scanning, in a scanning direction, the mask and the substrate relative to the illumination device and the projection device, respectively.
Abstract: A scanning type exposure apparatus includes an illumination device for Illuminating a mask, a projection device for projecting a pattern of the mask onto a substrate and a scanning device for scanning, in a scanning direction, the mask and the substrate relative to the illumination device and the projection device, respectively The projection device includes a stop device for setting an effective numerical aperture in the scanning direction to be larger than an effective numerical aperture in a direction perpendicular to the scanning direction Also disclosed are various photomasks, as well as a scanning type exposure apparatus which scans and exposes a substrate by using such photomasks and a device manufacturing method that includes a step of transferring a device pattern onto a substrate by using such photomasks

15 citations

Proceedings ArticleDOI
05 Sep 2001
TL;DR: Mask as mentioned in this paper is a pattern shape analysis tool that can evaluate quantitatively photomask pattern and fabrication process by means of image processing arising from CD-SEM or UV microscope, or inspection machine.
Abstract: We developed a pattern shape analysis tool (MaskEXPRESS) which can evaluate quantitatively photomask pattern and fabrication process by means of image processing arising from CD-SEM or UV microscope, or inspection machine. Although evaluation of complicated mask pattern has been performed qualitatively as yet, MaskEXPRESS makes it possible to evaluate it quantitatively. MaskEXPRESS can also be applied to quantitative evaluation of sensitivity of inspection machine, accuracy of EB writing, and optimization of photomask fabrication process. This paper describes the outline of MaskEXPRESS and its functions. We investigated about the precision criteria of MaskEXPRESS and found out the conditions of image processing for having accuracy equal to repeatability accuracy of measurement SEM. By changing experimentally mask fabrication conditions and analyzing the patterns, the following things became clear. Hole pattern's area increase with keeping analogous shape as etching time increases. Inner serif pattern tends to change in the direction of slant as writing dose increases. The rectangle fidelity of inner and outer serif pattern is improved according to the condition of resist process. We also present the relationship between defect size and aerial image on wafer simulated utilizing MaskEXPRESS.

15 citations

Proceedings ArticleDOI
Sven Martin1, Holger Seitz1, Wolfgang Degel1, Ute Buttgereit1, Thomas Scherübl1 
TL;DR: In this article, a new Aerial Imaging based optical system has been developed by Carl Zeiss SMS which measures wafer level CD already on photomasks under scanner conditions, and the results of the alpha tool show that the new tool has extremely good CD repeatability and stability.
Abstract: With decreasing feature size, the requirements for CD uniformity (CDU) on the wafer have become crucial for achieving the required yield in the wafer fab. This is related to tighter CDU specifications on the photomask. Currently, mask CDU is mainly measured by mask CD SEM tools. However, due to strong OPC and high MEEF mask CDU is not directly related to wafer CDU. A new Aerial Imaging based optical system has been developed by Carl Zeiss SMS which measures wafer level CD already on photomasks under scanner conditions. First results of the alpha tool show that the new tool has extremely good CD repeatability and stability. Furthermore, the effect of the scanner settings on CD uniformity is demonstrated.

15 citations

Patent
13 Nov 2006
TL;DR: In this paper, a method of manufacturing a photomask is described, where a process rule check is performed to the graphic data with the optical proximity correction, and a repair procedure is performed only to the failed pattern, and the pattern is then formed according to the corrected and repaired graphic data.
Abstract: A method of manufacturing a photomask is described. The graphic data of the photomask are provided, and than an optical proximity correction is performed to the graphic data. A process rule check is then performed to the graphic data with the optical proximity correction. When at least one failed pattern not passing the process rule check is found in the graphic data, a repair procedure is performed only to the failed pattern so that the failed pattern can pass the process rule check. The patterns of the photomask are then formed according to the corrected and repaired graphic data.

15 citations

Patent
Feely Wayne Edmund1
16 May 1990
TL;DR: In this article, the microplastic structures are prepared from crosslinkable photosensitive compositions using a specially designed radiation attenuating photomask which permits preselection of the size, length, width and thickness of the desired structure.
Abstract: Thermally stable microplastic structures and methods for their manufacture are provided. The microplastic structures are prepared from crosslinkable photosensitive compositions using a specially designed radiation attenuating photomask which permits preselection of the size, length, width and thickness of the desired structure. The microplastic structures are stable at temperatures in excess of 200° C. and can be used as components in miniature electrical, mechanical, chemical and optical devices, such as smart sensors integral to a silicon chip device.

15 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202322
202281
202150
2020124
2019179
2018195