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Photomask

About: Photomask is a research topic. Over the lifetime, 7917 publications have been published within this topic receiving 54524 citations. The topic is also known as: photoreticle & reticle.


Papers
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Patent
Ben Eynon1
18 Jan 2002
TL;DR: In this article, a fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties was proposed. But it was not shown how to apply it to the photomask.
Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using a static charge.

32 citations

Patent
26 Feb 1985
TL;DR: In this article, a pattern on a photomask is aligned with a plurality of patterns formed on a wafer in a manner that detects and corrects misalignment, including, inter alia, rotational errors, not only between a photOMask and individual chips formed on the wafer, so that pattern matching is attained with very high accuracy.
Abstract: In an exposure apparatus for manufacturing semiconductor devices, a pattern on a photomask is aligned with a plurality of patterns formed on a wafer in a manner that detects and corrects misalignment, including, inter alia, rotational errors, not only between a photomask and a wafer, but also between a photomask and individual chips formed on the wafer, so that pattern matching is attained with very high accuracy. Apparatus for achieving this result employs different arrangements of alignment marks together with optical systems and positional adjustment devices.

32 citations

Patent
19 May 1983
TL;DR: A photomask with white defects that have been corrected with a film comprising a mixture of silver and tantalum oxide is described in this article. But the film has a good resistance to chemicals.
Abstract: A photomask with white defects that have corrected with a film comprising a mixture of silver and tantalum oxide. The film has a good resistance to chemicals.

32 citations

Patent
05 Oct 1995
TL;DR: In this paper, a photoresist is exposed to light from behind a substrate by using as photomask a wiring electrodes 2 and 4 and a switching element 8 which are individually composed of an opaque member.
Abstract: A photoresist 10 is exposed to light from behind a substrate by using as photomask a wiring electrodes 2 and 4 and a switching element 8 which are individually composed of an opaque member, whereby a passivation layer 9 for the switching element 8 is patterned. By virtue of this method, a photomask becomes unnecessary and jogs of the passivation layer 9 can be formed outside the transparent pixel electrode 7. Therefore, an unsatisfactory orientation of a liquid crystal can be made invisible without enlarging the black matrix of a counter substrate. Furthermore, since a passivation layer can be removed in portions not requiring the passivation layer, image-sticking can be reduced and the quality of displayed picture can be greatly improved. The present invention makes it possible to reduce the number of photomasks used for production of an actively addressing substrate and improve the picture quality of a liquid crystal display.

32 citations

Patent
21 Jul 2003
TL;DR: In this paper, a reaction chamber is formed by a base, side walls and a photomask, which polymerizes one or more regions of the liquid layer to form a polymeric layer.
Abstract: A process and apparatus for making polymeric layers. A layer of liquid (20) including a photopolymerizable precursor is formed between a substrate (17) and a photomask (12). A reaction chamber is formed by a base (15), side walls (16) and photomask (12) polymerizes one or more regions of the liquid layer (20) to form a polymeric layer.

32 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
202322
202281
202150
2020124
2019179
2018195