Showing papers on "Proximity effect (electron beam lithography) published in 1977"
Patent•
06 Oct 1977
TL;DR: In this paper, the proximity effect is removed by bonding two patterns which are exposed within the field and extend to the adjacent fields, so that field-bonded electron beam exposure can be performed.
Abstract: PURPOSE:In bonding two patterns which are exposed within the field and extend to the adjacent fields, the proximity effect is removed, so that field-bonded electron beam exposure can be performed.
3 citations