Pulsed laser deposition

About: Pulsed laser deposition is a(n) research topic. Over the lifetime, 29264 publication(s) have been published within this topic receiving 496572 citation(s). The topic is also known as: pulsed laser deposition & PLD.

Pulsed laser deposition of thin films

Abstract: Partial table of contents: History and Fundamentals of Pulsed Laser Deposition (J. Cheung). Diagnostics and Characteristics of Laser--Produced Plasmas (D. Geohegan). Particulates Generated by Pulsed Laser Ablation (L.--C. Chen). Angular Distribution of Ablated Material (K. Saenger). Film Nucleation and Film Growth in Pulsed Laser Deposition of Ceramics (J. Horwitz & J. Sprague). Processes Characteristics and Film Properties in Pulsed Laser Plasma Deposition (S. Metev). Commercial Scale--Up of Pulsed Laser Deposition (J. Greer). Pulsed Laser Deposition: Future Trends (T. Venkatesan). Comparison of Vacuum Deposition Techniques (G. Hubler). Pulsed Laser Deposition of High--Temperature Superconducting Thin Films for Active and Passive Device Applications (R. Muenchausen & X. Wu). Pulsed Laser Deposition of Metals (J. Kools). Appendix. References. Index.

Multiferroic BaTiO3-CoFe2O4 Nanostructures.

Abstract: We report on the coupling between ferroelectric and magnetic order parameters in a nanostructured BaTiO3-CoFe2O4 ferroelectromagnet. This facilitates the interconversion of energies stored in electric and magnetic fields and plays an important role in many devices, including transducers, field sensors, etc. Such nanostructures were deposited on single-crystal SrTiO3 (001) substrates by pulsed laser deposition from a single Ba-Ti-Co-Fe-oxide target. The films are epitaxial in-plane as well as out-of-plane with self-assembled hexagonal arrays of CoFe2O4 nanopillars embedded in a BaTiO3 matrix. The CoFe2O4 nanopillars have uniform size and average spacing of 20 to 30 nanometers. Temperature-dependent magnetic measurements illustrate the coupling between the two order parameters, which is manifested as a change in magnetization at the ferroelectric Curie temperature. Thermodynamic analyses show that the magnetoelectric coupling in such a nanostructure can be understood on the basis of the strong elastic interactions between the two phases.

Magnetic and electric properties of transition-metal-doped ZnO films

Abstract: 3d-transition-metal-doped ZnO films (n-type Zn1−xMxO (x=005–025): M=Co, Mn, Cr, Ni) are formed on sapphire substrates using a pulsed-laser deposition technique, and their magnetic and electric properties are examined The Co-doped ZnO films showed the maximum solubility limit Some of the Co-doped ZnO films exhibit ferromagnetic behaviors with the Curie temperature higher than room temperature The magnetic properties of Co-doped ZnO films depend on the concentration of Co ions and carriers

Transparent thin film transistors using ZnO as an active channel layer and their electrical properties

Abstract: Bottom-gate-type thin film transistors using ZnO as an active channel layer (ZnO–TFT) have been constructed. The ZnO layers were deposited using pulsed laser deposition at 450 °C at an oxygen pressure of 3 m Torr, and the material that was formed had a background carrier concentration of less than 5×1016 cm−3. A double layer gate insulator consisting of SiO2 and SiNx was effective in suppressing leakage current and enabling the ZnO–TFT to operate successfully. The Ion/Ioff ratio of ZnO–TFTs fabricated on Si wafers was more than 105 and the optical transmittance of ZnO–TFTs fabricated on glass was more than 80%. These results show that it is possible to fabricate a transparent TFT that can even be operated in the presence of visible light.

MgxZn1−xO as a II–VI widegap semiconductor alloy

Abstract: We propose a widegap II–VI semiconductor alloy, MgxZn1−xO, for the fabrication of heteroepitaxial ultraviolet light emitting devices based on ZnO. The c-axis oriented MgxZn1−xO films were epitaxially grown by pulsed laser deposition on ZnO epitaxial films and sapphire (0001) substrates using ceramic targets. Solid solution films were prepared with Mg content up to x=0.33, achieving a band gap of 3.99 eV at room temperature. MgO impurity phase segregated at x⩾0.36. Lattice constants of MgxZn1−xO films changed slightly (∼1%), increasing in a axis and decreasing in c-axis direction with increasing x. These films showed ultraviolet photoluminescence at energies from 3.36 (x=0) to 3.87 eV (x=0.33) at 4.2 K.