Showing papers on "Pulsed laser deposition published in 1969"
TL;DR: In this paper, a laser beam capable of energy outputs up to 500 Joule was directed through a glass window into a vacuum system onto fine grain powder of Cr, W, Ti, C, Sb2S3, ZnS, SrTiO3, and BaTiO 3.
Abstract: A laser beam capable of energy outputs up to 500 Joule was directed through a glass window into a vacuum system onto fine grain powder of Cr, W, Ti, C, Sb2S3, ZnS, SrTiO3, and BaTiO3. A neodymium-doped glass laser of 1.06-μ wavelength was mostly used without Q spoiling. Sometimes the beam was focused. Films up to 2000 A were achieved on glass with one laser burst only, which corresponds to deposition rates of up to 106 A/sec. The substrate was positioned between the vapor source and laser so that the laser beam passed through it, and therefore, also served as a shield. Electron micrographs were taken. From electron transmission diffraction patterns it appeared as if BaTiO3 had not been decomposed. In order to evaluate electrical properties of the films, platinum-rhodium films were sputtered or “laser-deposited” onto glass slides to serve as base electrode. Then a barium titanate film was evaporated with a laser. On top of this, an array of thin aluminum dots were evaporated through a mask, so that it was ...
60 citations
TL;DR: It is demonstrated that SiO(2) films prepared by this technique are undecomposed and nonabsorbing in the uv and the future capabilities and the unique advantages of this technique for producing extremely clean films under ultrahigh vacuum conditions are outlined.
Abstract: The paper describes a technique for producing thin films by high vacuum evaporation with a CO2 laser of continuous emission at λ = 10.6 μ. It is shown that at this wavelength many dielectrics are highly absorbing and that several semiconductors become sufficiently absorbing at elevated temperatures to allow their evaporation by intense irradiation. The arrangement used for focusing the laser beam on the evaporant is described. The optical properties of films of SiO, SiO2, MgF2, Al2MgO4, and Te produced by the CO2 laser evaporation technique are discussed. It is demonstrated that SiO2 films prepared by this technique are undecomposed and nonabsorbing in the uv. The future capabilities and the unique advantages of this technique for producing extremely clean films under ultrahigh vacuum conditions are outlined.
39 citations
Patent•
13 Mar 1969TL;DR: In this article, a pickup plate and a straingauged cantilever beam are used within the vacuum chamber to continuously record the coating thickness of an article during a vapor deposition process.
Abstract: Apparatus for accurately determining, continuously, the coating thickness deposited on an article during a vapor deposition process. The apparatus utilizes a unique pickup plate and straingauged cantilever beam positioned within the vacuum chamber to continuously record the coating thickness deposited on the article.
27 citations
Patent•
13 Mar 1969TL;DR: In this article, a MONOCHROMATICLIGHT BEAM in UTI was used for detecting and controlling the displacement of the surface of the MELT, which was used in the process of forming PROTECTIVE COATINGS on METAL SUBSTRates.
Abstract: IN THE PROCESSES FOR FORMING PROTECTIVE COATINGS ON METAL SUBSTRATES, PARTICULARLY THE NICKEL-BASE AND COLBALTBASE SUPERALLOYS, BY MELTING A COATING MATERIAL TO CAUSE VAPORIZATION THEREOF, A MONOCHROMATIC LIGHT BEAM IN UTI- LIZED IN SENSING AND CONTROLLING DISPLACEMENT OF THE SURFACE ELEVATION OF THE MELT.
20 citations
9 citations
Patent•
29 Dec 1969
TL;DR: In this paper, a process for the deposition of a thin polygonal polyhedron was described, in which the author tried to cope with the negative effect of SUFFICIENT ENERGY on the cross-linking in the polygon.
Abstract: DEPOSITION WITH RADIATION OF SUFFICIENT ENERGY TO INDUCE CROSS-LINKING IN THE POLYMER. A PROCESS FOR THE DEPOSITION OF A THIN POLYMER FILM ON A COOLED SUBSTRATE WHICH COMPRISES HEATING A POLYMER IN VACUO IN THE PRESENCE OF THE SUBSTRATE SO AS TO DEPOSITE POLYMERIC MATERIAL THEREON AND SIMULTANEOUSLY IRRADIATING THE POLYMERIC MATERIAL DURING THE ENTIRE PERIOD OF
9 citations
01 May 1969
TL;DR: Energetics in solid film lubricants vacuum deposition methods, showing dependence on interfacial and film characteristics as mentioned in this paper, are discussed in detail in Section 2.2.1.
Abstract: Energetics in solid film lubricants vacuum deposition methods, showing dependence on interfacial and film characteristics
5 citations
5 citations
Patent•
18 Jul 1969TL;DR: In this paper, a thin layer of laser material is deposited on an appropriate substrate with a second layer of a suitable activator material such as silver or copper, for example, deposited thereover.
Abstract: A thin layer of laser material is deposited on an appropriate substrate with a second layer of a suitable activator material such as silver or copper, for example, deposited thereover. The deposition of laser material is accomplished at as high a temperature as possible while maintaining a practicable deposition rate. The combination of layers is then baked at a high temperature in air or an inert atmosphere for several hours and slowly reduced to room temperature. The method transforms the film of laser material into a single crystal or several smaller crystallites capable of desirable laser action. In its preferred embodiment reflective coatings, anti-reflective coatings, and multi-layers may be employed to enhance the laser performance.
4 citations
TL;DR: Feasibility of differential ion pumping concept for reducing pressure during vacuum deposition of thin films has been investigated in this article, where the authors show that the concept can reduce pressure during thin film deposition.
Abstract: Feasibility of differential ion pumping concept for reducing pressure during vacuum deposition of thin films