Resist

About: Resist is a research topic. Over the lifetime, 40991 publications have been published within this topic receiving 371548 citations.

Resist blur and line edge roughness (Invited Paper)

Abstract: A straightforward analytic model of resist line edge roughness is presented which predicts all the known scaling laws as well as the shape of the experimentally seen frequency content or power spectrum of the roughness. The model implies there are strong basic limitations to achieving, simultaneously, low roughness, low dose and high resolution in any standard chemically amplified resist process. A simple model of how roughness maps to device performance is also presented.

Fabrication of 5–7 nm wide etched lines in silicon using 100 keV electron‐beam lithography and polymethylmethacrylate resist

Abstract: The present limit of around 10 nm for the width of lines fabricated by e‐beam lithography using polymethylmethacrylate (PMMA) resist on silicon substrates has been overcome. 5–7 nm wide etched lines in bulk Si substrates have been produced. A 65 nm thick layer of PMMA was exposed with an 80 kV electron beam of diameter smaller than 5 nm. After exposure the resist was developed in 3:7 cellosolve:methanol with ultrasonic agitation. The pattern in resist was transferred to the Si substrate with reactive ion etching. Lines of width varying between 5 and 7 nm were recorded using an S‐900 scanning electron microscope which has a resolution of 0.7 nm.

Highly Sensitive Biosensing Using Arrays of Plasmonic Au Nanodisks Realized by Nanoimprint Lithography

Abstract: We describe the fabrication of elliptical Au nanodisk arrays as a localized surface plasmon resonance (LSPR) sensing substrate for clinical immunoassay via thermal nanoimprint lithography (NIL) and enhancement in the sensitivity of the detection of the prostate-specific antigen (PSA) using the precipitation of 5-bromo-4-chloro-3-indolyl phosphate p-toluidine/nitro blue tetrazolium (BCIP/NBT), catalyzed by alkaline phosphatase. Au nanodisks were fabricated on glass through an unconventional tilted evaporation, which could preserve the thickness of imprinted resists and create an undercut beneficial to the subsequent lift-off process without any damage to pattern dimension and the glass while removing the residual polymers. To investigate the optically anisotropic property of the LSPR sensors, a probe light with linear polarization parallel to and perpendicular to the long axis of the elliptical nanodisk array was utilized, and their sensitivity to the bulk refractive index (RI) was measured as 327 and 167 ...

Inspection technique of photomask

Abstract: An improved technique for inspecting photomasks employs simulated images of the resist pattern. A simulated image of an original pattern is compared to a simulated image generated from a pattern captured from a photomask manufactured from the original pattern. Alternatively, simulated images generated from captured data from two different instances of the same original pattern formed in a photomask are compared.

Transport Mechanisms of Alkanethiols during Microcontact Printing on Gold

Abstract: Microcontact printing (μCP) with elastomeric stamps is a versatile method to modify the chemistry of surfaces. We explore this patterning process here, examining the origin and character of its limits and demonstrating how best to use μCP and alkanethiols for lithography on gold at submicron scales. We find that, ultimately, this type of lithography is constrained by the need to carry the monolayer-forming reaction to completion, with significant degradation of the accuracy of prints at sub-500-nm scales due to molecular diffusion. Printing monolayers of eicosanethiol on gold proved to be the best practical compromise between self-assembly of the resist and its transport along the stamp and substrate interfaces as well as through the gas phase. Results for this system were particularly sensitive to the geometry of the stamp and how eicosanethiol was placed on, and transferred from, its surface to the gold. Our experiments, and simulations that corroborate them, show the relative importance of the various ...