Responsivity

About: Responsivity is a research topic. Over the lifetime, 9918 publications have been published within this topic receiving 186118 citations.

High Responsivity and Gate Tunable Graphene‐MoS2 Hybrid Phototransistor

Abstract: A 2D atomic-layer-thickness phototransistor based on a graphene-MoS2 bybrid device is constructed with a photoresponse much larger than that of individual graphene or MoS2 based phototransistors. Strong and selective light absorption in the MoS2 layer creates electric charges that are transferred to graphene layers derived by a build-in electrical field, where they recirculate many times due to the high carrier mobility of graphene. Gate tunable Fermi level in graphene layer allows the responsivity of this hybrid phototransistor to be continuously tuned from 0 to about 10(4) mA/W by the gate voltage. Furthermore, large scale, flexible, and transparent 2D phototransistors with high responsivity are constructed from the CVD-grown graphene and MoS2 flakes. The high responsivity, gate-tunable sensitivity, wavelength selectivity, and compatibility with current circuit technologies of this type device give it great potential for future application in integrated nano-optoelectronic systems.

Gain mechanism in GaN Schottky ultraviolet detectors

Abstract: Schottky barrier GaN ultraviolet detectors, both in vertical and in lateral configuration, as well as in a metal–semiconductor–metal geometry were implemented. All devices exhibit a high gain at both reverse and forward bias. The photoresponse in the forward bias is in the positive current direction. We attribute the gain to trapping of minority carriers at the semiconductor–metal interface. The excellent agreement between the calculated responsivity and the experiment indicates that the model is valid for all device structures under study, and represents a unified description of gain mechanism in GaN Schottky detectors.

On-Chip Integrated, Silicon–Graphene Plasmonic Schottky Photodetector with High Responsivity and Avalanche Photogain

Abstract: We report an on-chip integrated metal graphene–silicon plasmonic Schottky photodetector with 85 mA/W responsivity at 1.55 μm and 7% internal quantum efficiency. This is one order of magnitude higher than metal–silicon Schottky photodetectors operated in the same conditions. At a reverse bias of 3 V, we achieve avalanche multiplication, with 0.37A/W responsivity and avalanche photogain ∼2. This paves the way to graphene integrated silicon photonics.

Broadband Photodetectors Based on GrapheneBi 2 Te 3 Heterostructure

Abstract: Recently, research on graphene based photodetectors has drawn substantial attention due to ultrafast and broadband photoresponse of graphene. However, they usually have low responsivity and low photoconductive gain induced by the gapless nature of graphene, which greatly limit their applications. The synergetic integration of graphene with other two-dimensional (2D) materials to form van der Waals heterostructure is a very promising approach to overcome these shortcomings. Here wereport the growth ofgrapheneBi2Te3heterostructurewhere Bi2Te3is asmall bandgap material from topological insulator family with a similar hexagonal symmetry to graphene. Because of the effective photocarrier generation and transfer at the interface between graphene and Bi2Te3, the device photocurrent can be effectively enhanced without sacrificing the detecting spectral width. Our results show that the grapheneBi2Te3 photodetector has much higher photoresponsivity (35 AW 1 at a wavelength of 532 nm) and higher sensitivity (photoconductive gain up to 83), as compared to the pure monolayer graphene-based devices. More interestingly, the detection wavelength range of our device is further expanded to near-infrared (980 nm) and telecommunication band (1550 nm), which is not observed on the devices based on heterostructures of graphene and transition metal dichalcogenides.

High-Responsivity, High-Detectivity, Ultrafast Topological Insulator Bi2Se3/Silicon Heterostructure Broadband Photodetectors

Abstract: As an exotic state of quantum matter, topological insulators have promising applications in new-generation electronic and optoelectronic devices. The realization of these applications relies critically on the preparation and properties understanding of high-quality topological insulators, which however are mainly fabricated by high-cost methods like molecular beam epitaxy. We here report the successful preparation of high-quality topological insulator Bi2Se3/Si heterostructure having an atomically abrupt interface by van der Waals epitaxy growth of Bi2Se3 films on Si wafer. A simple, low-cost physical vapor deposition (PVD) method was employed to achieve the growth of the Bi2Se3 films. The Bi2Se3/Si heterostructure exhibited excellent diode characteristics with a pronounced photoresponse under light illumination. The built-in potential at the Bi2Se3/Si interface greatly facilitated the separation and transport of photogenerated carriers, enabling the photodetector to have a high light responsivity of 24.2...