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Sputter deposition

About: Sputter deposition is a research topic. Over the lifetime, 49264 publications have been published within this topic receiving 746832 citations. The topic is also known as: sputter coating.


Papers
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Patent
06 Apr 2007
TL;DR: In this article, the authors proposed a sputtering system that consists of one or more cooled anodes shadowing a gas introduction tube, where both the anodes and the gas introduction tubes span a processing space defined between the sputtering targets and the substrate.
Abstract: The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space defined between one or more sputtering targets and one or more substrates within a sputtering chamber. The gas introduction tubes may have gas outlets that direct the gas introduced away from the one or more substrates. The gas introduction tubes may introduce reactive gas, such as oxygen, into the sputtering chamber for depositing TCO films by reactive sputtering. During a multiple step sputtering process, the gas flows (i.e., the amount of gas and the type of gas), the spacing between the target and the substrate, and the DC power may be changed to achieve a desired result.

23 citations

Journal ArticleDOI
TL;DR: In this paper, the piezoelectric properties of ZnO films grown by RF magnetron sputtering in reactive plasma were analyzed. But the main purpose of this paper was to investigate the structural and morphological properties of the films.

23 citations

Journal ArticleDOI
TL;DR: In this paper, aluminum nitride (AlN) films were reactively deposited on (100) oriented silicon substrates by reactive radio frequency (RF) magnetron sputtering for different incidence angles and distances between substrate and target.

23 citations

Journal ArticleDOI
TL;DR: In this paper, the structural and electrical properties of magnetron sputtered hafnium oxide (HfOx) and HfOxNy thin films were compared by means of Taguchi's orthogonal arrays approach.

23 citations

Journal Article
TL;DR: In this paper, a transparent conducting molybdenum-doped zinc oxide (MZO) films were successfully prepared by radio frequency (RF) magnetron sputtering method on glass substrates under different substrate temperatures.

23 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023770
20221,531
20211,276
20201,596
20191,941
20181,917