scispace - formally typeset
Search or ask a question
Topic

Static induction transistor

About: Static induction transistor is a research topic. Over the lifetime, 8155 publications have been published within this topic receiving 107058 citations. The topic is also known as: SIT.


Papers
More filters
Patent
Vikram Kowshik1
18 Jan 1995
TL;DR: In this article, a one-transistor, electrically-alterable switch in combination with a pass transistor includes a first MOS transistor having a drain, a gate, and a source.
Abstract: A one-transistor, electrically-alterable switch in combination with a pass transistor includes a first MOS transistor having a drain, a gate, and a source, and a pass transistor having a drain, a source and a floating gate. The floating gate is capacitively coupled to the source of the first MOS transistor through a tunneling dielectric. An erase electrode is capacitively coupled to the floating gate through a coupling dielectric.

39 citations

Patent
11 Feb 2011
TL;DR: In this article, the NPN bipolar transistor and the PNP bipolar transistor are used to protect the high reverse blocking voltage (HRBV) device from high stress operating conditions.
Abstract: Apparatus and methods for electronic circuit protection under high stress operating conditions are provided. In one embodiment, an apparatus includes a substrate (47) having a first p-well (44c), a second p-well (44b) adjacent the first p-well, and an n-type region (46) separating the first and second p- wells. An n-type active area (43b) is over the first p-well and a p-type active area (42b) is over the second p-well. The n-type and p-type active areas are electrically connected to a cathode and anode of a high reverse blocking voltage (HRBV) device (40), respectively. The n-type active area, the first p- well and the n-type region operate as an NPN bipolar transistor (58a) and the second p- well, the n-type region, and the first p-well operate as a PNP bipolar transistor (53a). The NPN bipolar transistor defines a relatively low forward trigger voltage of the HRBV device and the PNP bipolar transistor defines a relatively high reverse breakdown voltage of the HRBV device.

39 citations

Patent
16 May 1997
TL;DR: In this paper, the output MOS transistor (2) and a current-detecting MOS (3) are connected commonly at their drains and gates, and a gate voltage is fed to the gates of these transistors via signal lines (L1, L2).
Abstract: An output MOS transistor (2) and a current-detecting MOS transistor (3) are connected commonly at their drains and gates. A gate voltage is fed to the gates of these transistors via signal lines (L1, L2). When the voltage of an output terminal (10) is increased in response to excessive load current, a current-mirror circuit (100) consisting of first and second transistors (4, 5) pulls in current from the signal line (L2) to reduce the gate voltage. Thus, the output current (I1) of output MOS transistor (2) is limited within a predetermined level. Furthermore, a diode (8), provided in the signal line (L2), produces a voltage drop equivalent to the base-emitter voltage of first transistor (4). By the function of this diode (8), the gate-source voltage of output MOS transistor (2) is equalized with the gate-source voltage of current-detecting MOS transistor (3). As a result, the same operating point can be set for the output transistor (2) and the current-detecting transistor (3).

39 citations

Patent
17 Mar 1980
TL;DR: In this paper, a back-illuminated static induction transistor (SIT) image sensor operating in the electron depletion storing mode, where the n + buried floating region 23 serves as storage region.
Abstract: This invention relates to a semiconductor image sensors and more particularly, to a back-illuminated-type static induction transistor image sensors. FIGS. 4A to 4C show the back illuminated type SIT image sensors operating in the electron depletion storing mode, where the n + buried floating region 23 serves as storage region.

39 citations

Patent
25 Apr 1990
TL;DR: In this paper, a gate electrode film is composed of two or more films having different etching rates, and the gate etching is stopped at the interface of the composite film to form an inverse-T gate electrode structure, and an electric conduction is observed between the component films.
Abstract: Herein disclosed is a semiconductor device of high density. The semiconductor device having a high density and a microstructure is required to have a high breakdown voltage and a high speed even with a low supply voltage. The semiconductor device comprises: a semiconductor body; a gate insulating film formed over the body; and a MOS transistor having a source/drain region formed in the body and a gate electrode film formed over the gate insulating film. The gate electrode film is composed of two or more films having different etching rates. The gate etching is stopped at the interface of the composite film to form an inverse-T gate electrode structure; and in that an electric conduction is observed between the component films. Thus, the overlap between the gate and the drain can be controlled.

39 citations


Network Information
Related Topics (5)
Transistor
138K papers, 1.4M citations
86% related
Substrate (electronics)
116.1K papers, 1.3M citations
82% related
Capacitor
166.6K papers, 1.4M citations
81% related
Silicon
196K papers, 3M citations
80% related
Voltage
296.3K papers, 1.7M citations
79% related
Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20234
20225
20211
20203
20196
20189