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Showing papers on "Substrate (electronics) published in 2017"


Journal ArticleDOI
TL;DR: Surprisingly, it is found that C 1s shifts correlate to changes in sample work function ϕSA, such that the sum EBF+ϕSA is constant at 289.50±0.15 eV, irrespective of materials system and air exposure time, indicating vacuum level alignment.
Abstract: The C 1s signal from ubiquitous carbon contamination on samples forming during air exposure, so called adventitious carbon (AdC) layers, is the most common binding energy (BE) reference in X-ray photoelectron spectroscopy studies. We demonstrate here, by using a series of transition-metal nitride films with different AdC coverage, that the BE of the C 1s peak EBF varies by as much as 1.44 eV. This is a factor of 10 more than the typical resolvable difference between two chemical states of the same element, which makes BE referencing against the C 1s peak highly unreliable. Surprisingly, we find that C 1s shifts correlate to changes in sample work function ϕSA , such that the sum EBF+ϕSA is constant at 289.50±0.15 eV, irrespective of materials system and air exposure time, indicating vacuum level alignment. This discovery allows for significantly better accuracy of chemical state determination than offered by the conventional methods. Our findings are not specific to nitrides and likely apply to all systems in which charge transfer at the AdC/substrate interface is negligible.

575 citations


Journal ArticleDOI
TL;DR: In this paper, hybrid perovskite crystals are integrated onto silicon wafers enabling fabrication of an X-ray linear detector array, which may reduce patient dose in medical imaging applications.
Abstract: Hybrid perovskite crystals are integrated onto silicon wafers enabling fabrication of an X-ray linear detector array. High sensitivity may reduce patient dose in medical imaging applications.

500 citations


Journal ArticleDOI
TL;DR: In this paper, field-plated Schottky barrier diodes (FP-SBDs) were fabricated on a Si-doped n−-Ga2O3 drift layer grown by halide vapor phase epitaxy on a Sn-Doped n+-Ga 2O3 (001) substrate.
Abstract: Ga2O3 field-plated Schottky barrier diodes (FP-SBDs) were fabricated on a Si-doped n−-Ga2O3 drift layer grown by halide vapor phase epitaxy on a Sn-doped n+-Ga2O3 (001) substrate. The specific on-resistance of the Ga2O3 FP-SBD was estimated to be 5.1 mΩ·cm2. Successful field-plate engineering resulted in a high breakdown voltage of 1076 V. A larger-than-expected effective barrier height of 1.46 eV, which was extracted from the temperature-dependent current–voltage characteristics, could be caused by the effect of fluorine atoms delivered in a hydrofluoric acid solution process.

386 citations


Journal ArticleDOI
TL;DR: In this paper, a transition-metal-doped molybdenum disulfide (MoS2) nanocomposite was synthesized via a facile single-step hydrothermal route.
Abstract: This paper demonstrates a sulfur dioxide (SO2) gas sensor based on a transition-metal-doped molybdenum disulfide (MoS2) nanocomposite synthesized via a facile single-step hydrothermal route. The Ni-doped, Fe-doped, Co-doped, and pristine MoS2 film sensors were fabricated on a FR4 epoxy substrate with interdigital electrodes. The morphologies, microstructures, and compositions of as-prepared samples were fully examined using X-ray diffraction, energy dispersive spectroscopy, scanning electron microscopy, transmission electron microscope, and X-ray photoelectron spectroscopy. The gas-sensing properties of the four samples were systematically investigated at room temperature, and the Ni-doped MoS2 film sensor was screened out as the optimal SO2 sensor among the four sensors, exhibiting a relatively high response value, quick response/recovery time, and excellent stability toward SO2 gas. Furthermore, in order to explain the experimental results, we used Materials Studio software to construct molecular models of adsorption systems and calculate the geometry, energy, and charge parameters via density functional theory (DFT) based on first principles. The sensing mechanism is also discussed in depth. Through a comprehensive research approach of combining experimentation with DFT simulation, this work suggests that an Ni-doped MoS2 film sensor is able to detect SO2 gas at room temperature.

284 citations


Journal ArticleDOI
TL;DR: In this article, the authors used a simple and a facile hydrothermal technique to fabricate NO 2 gas sensor using thin films of tungsten oxide (WO 3 ) grown directly on to a soda-lime glass substrate without assistance of any seed layer.
Abstract: Gas sensors based on a chemiresistive metal oxide semiconductor are widely used including nitrogen dioxide (NO 2 ) at a moderate temperature. In this work efforts are taken to fabricate NO 2 gas sensor using thin films of tungsten oxide (WO 3 ) grown directly on to a soda-lime glass substrate without assistance of any seed layer by a simple and a facile hydrothermal technique. As per our knowledge, the deposition of nanostructured WO 3 thin films without assistance of any seed layer on the glass substrate was rarely reported. The WO 3 thin film samples were synthesized at various deposition times ranging from 3 h to 7 h and were characterized by X-ray diffraction, Raman spectroscopy, field emission scanning electron microscopy, transmission electron microscopy, UV–vis spectroscopy and Brunauer-Emmett-Teller techniques. The surface morphological and structural characterization showed the two dimensional (2D) nanoplate-like structure of as synthesized WO 3 thin films with plate thickness ranging from 90 to 150 nm and had an orthorhombic structure, respectively. Moreover, the 2D nanoplates of WO 3 exhibited a gas response ∼10 for 5 ppm for toxic NO 2 gas at relatively low operating temperature. The new synthesis route and sensing behavior of as synthesized WO 3 nanoplates revealed a promising candidate for the fabrication of the cost effective gas sensors.

278 citations


Journal ArticleDOI
TL;DR: Control of biaxial strain in two-dimensional materials based on the growth substrate, enabling more complex low-dimensional electronics, and a dramatic modulation of the band structure.
Abstract: The application of strain to semiconductors allows for controlled modification of their band structure. This principle is employed for the manufacturing of devices ranging from high-performance transistors to solid-state lasers. Traditionally, strain is typically achieved via growth on lattice-mismatched substrates. For two-dimensional (2D) semiconductors, this is not feasible as they typically do not interact epitaxially with the substrate. Here, we demonstrate controlled strain engineering of 2D semiconductors during synthesis by utilizing the thermal coefficient of expansion mismatch between the substrate and semiconductor. Using WSe2 as a model system, we demonstrate stable built-in strains ranging from 1% tensile to 0.2% compressive on substrates with different thermal coefficient of expansion. Consequently, we observe a dramatic modulation of the band structure, manifested by a strain-driven indirect-to-direct bandgap transition and brightening of the dark exciton in bilayer and monolayer WSe2, respectively. The growth method developed here should enable flexibility in design of more sophisticated devices based on 2D materials. Strain engineering is an essential tool for modifying local electronic properties in silicon-based electronics. Here, Ahn et al. demonstrate control of biaxial strain in two-dimensional materials based on the growth substrate, enabling more complex low-dimensional electronics.

236 citations


Journal ArticleDOI
TL;DR: The results show that there is an induction period in the growth of the perovskite during which volatile compounds are formed, catalyzed by the substrate, and the nature of the substrate can introduce gap states and influence the film formation and morphology.
Abstract: We present investigations on the interface formation between the hybrid perovskite MAPbI3 and various substrates, covering a wide range of work functions. The perovskite films are incrementally evaporated in situ while the electronic structure is evaluated using photoelectron spectroscopy. Our results show that there is an induction period in the growth of the perovskite during which volatile compounds are formed, catalyzed by the substrate. The duration of the induction period depends strongly on the nature of the substrate material, and it can take up to 20–30 nm of formal precursor deposition before the surface is passivated and the perovskite film starts forming. The stoichiometry of the 2–3 nm thin passivation layer deviates from the expected perovskite stoichiometry, being rich in decomposition products of the organic cation. During the regular growth of the perovskite, our measurements show a deviation from the commonly assumed flat band condition, i.e., dipole formation and band bending dominate the interface. Overall, the nature of the substrate not only changes the energetic alignment of the perovskite, it can introduce gap states and influence the film formation and morphology. The possible impact on device performance is discussed.

225 citations


Journal ArticleDOI
TL;DR: A technique for depositing and patterning of wafer-scale two-dimensional metal chalcogenide compounds by transforming the native interfacial metal oxide layer of low melting point metal precursors in liquid form is introduced.
Abstract: A variety of deposition methods for two-dimensional crystals have been demonstrated; however, their wafer-scale deposition remains a challenge. Here we introduce a technique for depositing and patterning of wafer-scale two-dimensional metal chalcogenide compounds by transforming the native interfacial metal oxide layer of low melting point metal precursors (group III and IV) in liquid form. In an oxygen-containing atmosphere, these metals establish an atomically thin oxide layer in a self-limiting reaction. The layer increases the wettability of the liquid metal placed on oxygen-terminated substrates, leaving the thin oxide layer behind. In the case of liquid gallium, the oxide skin attaches exclusively to a substrate and is then sulfurized via a relatively low temperature process. By controlling the surface chemistry of the substrate, we produce large area two-dimensional semiconducting GaS of unit cell thickness (∼1.5 nm). The presented deposition and patterning method offers great commercial potential for wafer-scale processes.

207 citations


Journal ArticleDOI
TL;DR: This study reports the first direct measurement of spatially resolved temperature in functioning 2D monolayer MoS2 transistors and reveals unexpected insight into nonuniformities of the MoS1 transistors which do not cause significant self-heating, suggesting that such semiconductors are less sensitive to inhomogeneity than expected.
Abstract: The advancement of nanoscale electronics has been limited by energy dissipation challenges for over a decade. Such limitations could be particularly severe for two-dimensional (2D) semiconductors integrated with flexible substrates or multilayered processors, both being critical thermal bottlenecks. To shed light into fundamental aspects of this problem, here we report the first direct measurement of spatially resolved temperature in functioning 2D monolayer MoS2 transistors. Using Raman thermometry, we simultaneously obtain temperature maps of the device channel and its substrate. This differential measurement reveals the thermal boundary conductance of the MoS2 interface with SiO2 (14 ± 4 MW m–2 K–1) is an order magnitude larger than previously thought, yet near the low end of known solid–solid interfaces. Our study also reveals unexpected insight into nonuniformities of the MoS2 transistors (small bilayer regions) which do not cause significant self-heating, suggesting that such semiconductors are less...

177 citations


Journal ArticleDOI
01 Jan 2017-Carbon
TL;DR: In this paper, a bioinspired approach based on polydopamine interface buffer for the fabrication of 3D macroscopic carbon nanowires/graphene (CNWs/G) sponge composite is presented.

172 citations


Journal ArticleDOI
05 Dec 2017-ACS Nano
TL;DR: The wrinkle-free graphene shows enhanced electrical mobility compared to graphene with wrinkles and the transfer of an ultraflat graphene film onto target substrates from the reusable single-crystal Cu(111)/sapphire growth substrate is demonstrated.
Abstract: Wrinkles are ubiquitous for graphene films grown on various substrates by chemical vapor deposition at high temperature due to the strain induced by thermal mismatch between the graphene and substrates, which greatly degrades the extraordinary properties of graphene. Here we show that the wrinkle formation of graphene grown on Cu substrates is strongly dependent on the crystallographic orientations. Wrinkle-free single-crystal graphene was grown on a wafer-scale twin-boundary-free single-crystal Cu(111) thin film fabricated on sapphire substrate through strain engineering. The wrinkle-free feature of graphene originated from the relatively small thermal expansion of the Cu(111) thin film substrate and the relatively strong interfacial coupling between Cu(111) and graphene, based on the strain analyses as well as molecular dynamics simulations. Moreover, we demonstrated the transfer of an ultraflat graphene film onto target substrates from the reusable single-crystal Cu(111)/sapphire growth substrate. The wrinkle-free graphene shows enhanced electrical mobility compared to graphene with wrinkles.

Journal ArticleDOI
TL;DR: In this article, the authors analyzed built-in strain and charge doping using Raman and photoluminescence spectroscopy in 2D MoS2 grown by CVD on four unique substrates: SiO2/Si, sapphire, Muscovite mica, and hexagonal boron nitride.
Abstract: Due to its electronic-grade quality and potential for scalability, two-dimensional (2D) MoS2 synthesized by chemical vapor deposition (CVD) has been widely explored for electronic/optoelectronic applications. As 2D MoS2 can be considered a 100% surface, its unique intrinsic properties are inevitably altered by the substrate upon which it is grown. However, systematic studies of substrate-layer interactions in CVD-grown MoS2 are lacking. In this study, we have analyzed built-in strain and charge doping using Raman and photoluminescence spectroscopy in 2D MoS2 grown by CVD on four unique substrates: SiO2/Si, sapphire, Muscovite mica, and hexagonal boron nitride. We observed decreasing strain and charge doping in grown MoS2 as the substrates become less rough and more chemically inert. The possible origin of strain was investigated through atomic force microscopy roughness measurements of the as-grown layer and substrate. Our results provide direction for device optimization through careful selection of the ...

Journal ArticleDOI
TL;DR: In this paper, the semiconductor industry employed Si to fabricate electronic circuits, and GaAs, GaN, and other III-V materials for optoelectronics, with typical substrates consisting of wafers manufactured at high temperature.
Abstract: Modern semiconductor devices have revolutionized wide-ranging technologies such as electronics, lighting, solar energy, and communication [1]. The semiconductor industry employs Si to fabricate electronic circuits, and GaAs, GaN, and other III–V materials for optoelectronics [2], with typical substrates consisting of wafers manufactured at high temperature. Precisely controlled thin films can be deposited on the substrate to achieve additional functionality, for example by chemical vapor deposition (CVD) or molecular beam epitaxy [3].

Journal ArticleDOI
TL;DR: In this paper, nanocrystalline undoped and Sn doped ZnO thin films with different doping concentrations (1, 3, 5, 7 ) have been deposited on glass substrate by low cost spin coating technique.

Journal ArticleDOI
Bogdan Butoi1, A. Groza, Paul Dinca1, Paul Dinca2, Adriana Balan1, V. Barna1 
20 Dec 2017-Polymers
TL;DR: The structural and morphological investigations of polyaniline and poly(o-anisidine) polymers generated in a direct current glow discharge plasma, in the vapors of the monomers, without a buffer gas, using an oblique angle-positioned substrate configuration are investigated.
Abstract: This work is focused on the structural and morphological investigations of polyaniline and poly(o-anisidine) polymers generated in a direct current glow discharge plasma, in the vapors of the monomers, without a buffer gas, using an oblique angle-positioned substrate configuration. By atomic force microscopy and scanning electron microscopy we identified the formation of worm-like interlinked structures on the surface of the polyaniline layers, the layers being compact in the bulk. The poly(o-anisidine) layers are flat with no kind of structures on their surfaces. By Fourier transform infrared spectroscopy we identified the main IR bands characteristic of polyaniline and poly(o-anisidine), confirming that the polyaniline chemical structure is in the emeraldine form. The IR band from 1070 cm-1 was attributed to the emeraldine salt form of polyaniline as an indication of its doping with H⁺. The appearance of the IR band at 1155 cm-1 also indicates the conducting protonated of polyaniline. The X-ray diffraction revealed the formation of crystalline domains embedded in an amorphous matrix within the polyaniline layers. The interchain separation length of 3.59 A is also an indicator of the conductive character of the polymers. The X-ray diffraction pattern of poly(o-anisidine) highlights the semi-crystalline nature of the layers. The electrical conductivities of polyaniline and poly(o-anisidine) layers and their dependence with temperature are also investigated.

Journal ArticleDOI
TL;DR: In this paper, a reproducible direct current (DC) reactive magnetron sputtering technique was used to synthesize CuO polycrystalline thin films for solar cells, which were characterized by using X-ray diffraction, scanning electron microscopy, Xray photoelectron spectroscopy, optical spectroscope, photoluminescence, and Raman spectroscopic techniques.

Journal ArticleDOI
TL;DR: The authors' CMOS-compatible heater-thermometer nanoplatform paves the way to novel nonplasmonic photothermal applications, extending the temperature range and simplifying the thermoimaging procedure.
Abstract: We propose a novel photothermal approach based on resonant dielectric nanoparticles, which possess imaginary part of permittivity significantly smaller as compared to metal ones. We show both experimentally and theoretically that a spherical silicon nanoparticle with a magnetic quadrupolar Mie resonance converts light to heat up to 4 times more effectively than similar spherical gold nanoparticle at the same heating conditions. We observe photoinduced temperature raise up to 900 K with the silicon nanoparticle on a glass substrate at moderate intensities (<2 mW/μm2) and typical laser wavelength (633 nm). The advantage of using crystalline silicon is the simplicity of local temperature control by means of Raman spectroscopy working in a broad range of temperatures, that is, up to the melting point of silicon (1690 K) with submicrometer spatial resolution. Our CMOS-compatible heater–thermometer nanoplatform paves the way to novel nonplasmonic photothermal applications, extending the temperature range and si...

Journal ArticleDOI
TL;DR: In this paper, the growth of high quality epitaxial beta-gallium oxide (β-Ga2O3) using a compound source by molecular beam epitaxy has been demonstrated on c-plane sapphire (Al2O 3) substrates.
Abstract: The growth of high quality epitaxial beta-gallium oxide (β-Ga2O3) using a compound source by molecular beam epitaxy has been demonstrated on c-plane sapphire (Al2O3) substrates. The compound source provides oxidized gallium molecules in addition to oxygen when heated from an iridium crucible in a high temperature effusion cell enabling a lower heat of formation for the growth of Ga2O3, resulting in a more efficient growth process. This source also enabled the growth of crystalline β-Ga2O3 without the need for additional oxygen. The influence of the substrate temperatures on the crystal structure and quality, chemical bonding, surface morphology, and optical properties has been systematically evaluated by x-ray diffraction, scanning transmission electron microscopy, x-ray photoelectron spectroscopy, atomic force microscopy, spectroscopic ellipsometry, and UV-vis spectroscopy. Under optimized growth conditions, all films exhibited pure 2¯01 oriented β-Ga2O3 thin films with six-fold rotational symmetry when grown on a sapphire substrate. The thin films demonstrated significant absorption in the deep-ultraviolet (UV) region with an optical bandgap around 5.0 eV and a refractive index of 1.9. A deep-UV photodetector fabricated on the high quality β-Ga2O3 thin film exhibits high resistance and small dark current (4.25 nA) with expected photoresponse for 254 nm UV light irradiation suggesting that the material grown using the compound source is a potential candidate for deep-ultraviolet photodetectors.

Journal ArticleDOI
TL;DR: It is proposed that the underlying mechanism of the enhanced electrical conductivity for the current AZO thin film is attributed to the oxygen vacancies deficiency derived from the free competitive growth mode of Zn-O and Al-O bonds in theZn-Al-O interface.
Abstract: Highly conductive and optical transparent Al-doped ZnO (AZO) thin film composed of ZnO with a Zn–Al–O interface was fabricated by thermal atomic layer deposition (ALD) method. The as-prepared AZO thin film exhibits excellent electrical and optical properties with high stability and compatibility with temperature-sensitive flexible photoelectronic devices; film resistivity is as low as 5.7 × 10–4 Ω·cm, the carrier concentration is high up to 2.2 × 1021 cm–3. optical transparency is greater than 80% in a visible range, and the growth temperature is below 150 °C on the PEN substrate. Compared with the conventional AZO film containing by a ZnO–Al2O3 interface, we propose that the underlying mechanism of the enhanced electrical conductivity for the current AZO thin film is attributed to the oxygen vacancies deficiency derived from the free competitive growth mode of Zn–O and Al–O bonds in the Zn–Al–O interface. The flexible transparent transistor based on this AZO electrode exhibits a favorable threshold volta...

Journal ArticleDOI
TL;DR: In this paper, an original, robust, and highly efficient 3D scaffold is proposed to significantly improve the geometrical surface of a miniaturized 3D microbattery.
Abstract: Nowadays, millimeter scale power sources are key devices for providing autonomy to smart, connected, and miniaturized sensors. However, until now, planar solid state microbatteries do not yet exhibit a sufficient surface energy density. In that context, architectured 3D microbatteries appear therefore to be a good solution to improve the material mass loading while keeping small the footprint area. Beside the design itself of the 3D microbaterry, one important technological barrier to address is the conformal deposition of thin films (lithiated or not) on 3D structures. For that purpose, atomic layer deposition (ALD) technology is a powerful technique that enables conformal coatings of thin film on complex substrate. An original, robust, and highly efficient 3D scaffold is proposed to significantly improve the geometrical surface of miniaturized 3D microbattery. Four functional layers composing the 3D lithium ion microbattery stacking has been successfully deposited on simple and double microtubes 3D templates. In depth synchrotron X-ray nanotomography and high angle annular dark field transmission electron microscope analyses are used to study the interface between each layer. For the first time, using ALD, anatase TiO2 negative electrode is coated on 3D tubes with Li3PO4 lithium phosphate as electrolyte, opening the way to all solid-state 3D microbatteries. The surface capacity is significantly increased by the proposed topology (high area enlargement factor – “thick” 3D layer), from 3.5 μA h cm−2 for a planar layer up to 0.37 mA h cm−2 for a 3D thin film (105 times higher).

Journal ArticleDOI
TL;DR: In this paper, the authors fabricate thermoelectric micro/nanowires by thermally drawing hermetically sealed high-quality inorganic materials in a flexible fiber-like substrate.

Journal ArticleDOI
TL;DR: In this article, a graphene-piezoelectric material heterostructure is proposed for harvesting energy from water flow; it is shown that the introduction of a piezolectric template beneath graphene results in an obvious voltage output up to 0.1 V even with deionized (DI) water.
Abstract: Recently, liquid flow over monolayer graphene has been experimentally demonstrated to generate an induced voltage in the flow direction, and various physical mechanisms have been proposed to explain the electricity-generating process between liquid and graphene. However, there are significant discrepancies in the reported results with non-ionic liquid: the observed voltage responses with deionized (DI) water vary from lab to lab under presumably similar flowing conditions. Here, a graphene-piezoelectric material heterostructure is proposed for harvesting energy from water flow; it is shown that the introduction of a piezoelectric template beneath graphene results in an obvious voltage output up to 0.1 V even with DI water. This potential arises from a continuous charging–discharging process in graphene, which is suggested to be a result of a relatively retarded screening effect of the water for the generated piezoelectric charges than that of the graphene layer, as revealed by first-principles calculations. This work considers a dynamic charge interaction among water, graphene, and the substrate, highlighting the crucial role of the underlying substrate in the electricity-generating process, which will greatly enhance understanding of the flow-induced voltage and push the graphene-water nanogenerator close to practical applications.

Journal ArticleDOI
18 Oct 2017-ACS Nano
TL;DR: A method is reported that allows harvesting monolayer of semiconducting stannous oxide nanosheets (SnO) from the interfacial oxide layer of liquid tin and holds promise for creating atomically thin semiconductors at wafer scale.
Abstract: Atomically thin semiconductors are one of the fastest growing categories in materials science due to their promise to enable high-performance electronic and optical devices. Furthermore, a host of intriguing phenomena have been reported to occur when a semiconductor is confined within two dimensions. However, the synthesis of large area atomically thin materials remains as a significant technological challenge. Here we report a method that allows harvesting monolayer of semiconducting stannous oxide nanosheets (SnO) from the interfacial oxide layer of liquid tin. The method takes advantage of van der Waals forces occurring between the interfacial oxide layer and a suitable substrate that is brought into contact with the molten metal. Due to the liquid state of the metallic precursor, the surface oxide sheet can be delaminated with ease and on a large scale. The SnO monolayer is determined to feature p-type semiconducting behavior with a bandgap of ∼4.2 eV. Field effect transistors based on monolayer SnO are demonstrated. The synthetic technique is facile, scalable and holds promise for creating atomically thin semiconductors at wafer scale.

Journal ArticleDOI
TL;DR: In this paper, a β-(Al x Ga 1− x )2O3:Si/Ga 2O3 modulation-doped structure was fabricated by direct β-Ga 1−x 2O 3 epitaxial growth on a (010)-β-Ga2O 3 substrate, which exhibited a confined sheet carrier density of 3 × 1012 cm−2.
Abstract: A β-(Al x Ga1− x )2O3:Si/Ga2O3 modulation-doped structure was fabricated by direct β-(Al x Ga1− x )2O3 epitaxial growth on a (010) β-Ga2O3 substrate. Si on the order of 1018 cm−3 from adsorbed contaminants on the substrate surface was doped into the β-(Al x Ga1− x )2O3 layer. The heterojunction interface exhibited a confined sheet carrier density of ~3 × 1012 cm−2, which is on the same order as that of AlGaAs/GaAs. The successful modulation doping for the β-(Al x Ga1− x )2O3/Ga2O3 heterostructure encourages the development of β-Ga2O3-based heterojunction field-effect transistors.

Journal ArticleDOI
TL;DR: In this paper, a novel substrate of Ca14Ga10−mAlmZn6O35 (CGAZO) was successfully synthesized via a high-temperature solid-state reaction method and co-doped with Dy3+ and Mn4+ to form a new deep red phosphor for plant growth LED lighting.
Abstract: A novel substrate of Ca14Ga10−mAlmZn6O35 (CGAZO) was successfully synthesized via a high-temperature solid-state reaction method and co-doped with Dy3+ and Mn4+ to form a new deep red phosphor (CGAZO:Dy3+,Mn4+) for plant growth LED lighting. This extraordinary phosphor can exhibit strong far-red emission with a maximum peak at 715 nm between 650 and 750 nm, and other four shoulder peaks at 680, 689, 698 and 706 nm, which can be ascribed to 2Eg → 2Ag spin-forbidden transition of Mn4+. X-ray diffraction (XRD) patterns clarified that Ga3+ sites in the host were partly replaced by Al3+ ions. Moreover, an effective energy transfer from Dy3+ to Mn4+ in the CGAZO host had been verified since linear reduction of emission intensities and decay times of the Dy3+ emission of the phosphors CGAZO:Dy3+,Mn4+ with increasing concentration of Mn4+ was observed. Finally, a LED device was fabricated using a 460 nm blue-chip, silicon gel, and the as-obtained far-red emitting CGAZO:Dy3+,Mn4+ phosphors. The results of the tobacco plant cultivation lighting by this LED device indicate that the as-prepared phosphor has a potential application in the agricultural industry.

Journal ArticleDOI
TL;DR: The resistivity of plasma-treated Ti2 CTx film is further decreased to 63 Ω/sq with an improved transmittance of 89% and FOM of 51.3, demonstrating the promise of Ti2CTx for future transparent conductive electrode application.
Abstract: We report a simple and scalable method to fabricate homogeneous transparent conductive thin films (Ti2CTx, one of the MXene) by dip coating of an Al2O3 substrate in a colloidal solution of large-area Ti2CTx thin flakes. Scanning electron microscopy and atomic force microscopy images exhibit the wafer-scale homogeneous Ti2CTx thin film (∼5 nm) covering the whole substrate. The sheet resistance is as low as 70 Ω/sq at 86% transmittance, which corresponds to the high figure of merit (FOM) of 40.7. Furthermore, the thickness of the film is tuned by a SF6+Ar plasma treatment, which etches Ti2CTx film layer by layer and removes the top oxidized layer without affecting the bottom layer of the Ti2CTx flake. The resistivity of plasma-treated Ti2CTx film is further decreased to 63 Ω/sq with an improved transmittance of 89% and FOM of 51.3, demonstrating the promise of Ti2CTx for future transparent conductive electrode application.

Journal ArticleDOI
TL;DR: The results highlight the potential of graphene plasmonic leaky-mode hybrid waveguides to realize active ultra-compact devices for optoelectronic applications and achieve a tunability of 0.13 dB μm-1 for fabricated graphene-plasMonic waveguide devices with extremely low insertion loss.
Abstract: Surface plasmon polaritons enable light concentration within subwavelength regions, opening thereby new avenues for miniaturizing the device and strengthening light–matter interactions. Here we realize efficient electro-optic modulation in low-loss plasmonic waveguides with the aid of graphene, and the devices are fully integrated in the silicon-on-insulator platform. By advantageously exploiting low-loss plasmonic slot-waveguide modes, which weakly leak into a substrate while featuring strong fields within the two-layer-graphene covered slots in metals, we successfully achieve a tunability of 0.13 dB μm−1 for our fabricated graphene-plasmonic waveguide devices with extremely low insertion loss, which outperforms previously reported graphene-plasmonic devices. Our results highlight the potential of graphene plasmonic leaky-mode hybrid waveguides to realize active ultra-compact devices for optoelectronic applications.

Journal ArticleDOI
TL;DR: The Si-MoSi 2 functionally graded coating as discussed by the authors was prepared by a liquid phase siliconizing method, and the Si element mainly enriches on the surface with the highest content of about 50% and inhibited the formation of Mo 5 Si 3 and volatile MoO 3 and improved the high temperature oxidation resistance of the coating.

Journal ArticleDOI
TL;DR: An omnidirectional circularly polarized (OCP) antenna operating at 28 GHz is reported and has been found to be a promising candidate for device-to-device (D2D) communications in the next generation (5G) wireless systems.
Abstract: An omnidirectional circularly polarized (OCP) antenna operating at 28 GHz is reported and has been found to be a promising candidate for device-to-device (D2D) communications in the next generation (5G) wireless systems. The OCP radiation is realized by systematically integrating electric and magnetic dipole elements into a compact disc-shaped configuration (9.23 mm $^{3} =0.008~\lambda _{0}^{3}$ at 28 GHz) in such a manner that they are oriented in parallel and radiate with the proper phase difference. The entire antenna structure was printed on a single piece of dielectric substrate using standard PCB manufacturing technologies and, hence, is amenable to mass production. A prototype OCP antenna was fabricated on Rogers 5880 substrate and was tested. The measured results are in good agreement with their simulated values and confirm the reported design concepts. Good OCP radiation patterns were produced with a measured peak realized RHCP gain of 2.2 dBic. The measured OCP overlapped impedance and axial ratio bandwidth was 2.2 GHz, from 26.5 to 28.7 GHz, an 8 % fractional bandwidth, which completely covers the 27.5 to 28.35 GHz band proposed for 5G cellular systems.

Journal ArticleDOI
30 Jun 2017-ACS Nano
TL;DR: It is found that both the saturation magnetization and coercivity of the transferred films can be changed over the bending status and show a high accord with the movement of the curvature bending radius of the polyimide substrate.
Abstract: Epitaxial thin films of CoFe2O4 (CFO) have successfully been transferred from a SrTiO3 substrate onto a flexible polyimide substrate. By bending the flexible polyimide, different levels of uniaxial strain are continuously introduced into the CFO epitaxial thin films. Unlike traditional epitaxial strain induced by substrates, the strain from bending will not suffer from critical thickness limitation, crystalline quality variation, and substrate clamping, and more importantly, it provides a more intrinsic and reliable way to study strain-controlled behaviors in functional oxide systems. It is found that both the saturation magnetization and coercivity of the transferred films can be changed over the bending status and show a high accord with the movement of the curvature bending radius of the polyimide substrate. This reveals that the mechanical strain plays a critical role in tuning the magnetic properties of CFO thin films parallel and perpendicular to the film plane direction.