Subthreshold conduction

About: Subthreshold conduction is a research topic. Over the lifetime, 6343 publications have been published within this topic receiving 131957 citations. The topic is also known as: Subthreshold leakage.

Evidence of single domain switching in hafnium oxide based FeFETs: Enabler for multi-level FeFET memory cells

Abstract: Recent discovery of ferroelectricity in HfO2 thin films paved the way for demonstration of ultra-scaled 28 nm Ferroelectric FETs (FeFET) as non-volatile memory (NVM) cells [1]. However, such small devices are inevitably sensible to the granularity of the polycrystalline gate oxide film. Here we report for the first time the evidence of single ferroelectric (FE) domain switching in such scaled devices. These properties are sensed in terms of abrupt threshold voltage (VT) shifts leading to stable intermediate VT levels. We emphasize that this feature enables multi-level cell (MLC) FeFETs and gives a new perspective on steep subthreshold devices based on ferroelectric HfO2.

Erratum: Analytic Model for the Surface Potential and Drain Current in Negative Capacitance Field-Effect Transistors

Abstract: In 2008, Salahuddin and Datta proposed that a ferroelectric material operating in the negative capacitance (NC) region could act as a step-up converter of the surface potential in a metal-oxide-semiconductor structure, opening a new route for the realization of transistors with steeper subthreshold characteristics (S <; 60mV/dec). In this paper, a comprehensive physics-based surface potential and a drain current model for the NC field-effect transistor are reported. The model is aimed to evaluate the potentiality of such transistors for low-power switching applications. This paper also sheds light on how operation in the NC region can be experimentally detected.

Subtractive and Divisive Inhibition: Effect of Voltage-Dependent Inhibitory Conductances and Noise

Abstract: The influence of voltage-dependent inhibitory conductances on firing rate versus input current (f-I) curves is studied using simulations from a new compartmental model of a pyramidal cell of the weakly electric fish Apteronotus leptorhynchus. The voltage dependence of shunting-type inhibition enhances the subtractive effect of inhibition on f-I curves previously demonstrated in Holt and Koch (1997) for the voltage-independent case. This increased effectiveness is explained using the behavior of the average subthreshold voltage with input current and, in particular, the nonlinearity of Ohm's law in the subthreshold regime. Our simulations also reveal, for both voltage-dependent and -independent inhibitory conductances, a divisive inhibition regime at low frequencies (f 40 Hz). A simple leaky integrate-and-fire type model that incorporates the voltage dependence supports the results from our full ionic simulations.

Technology challenges for integration near and below 0.1 /spl mu/m

Abstract: Technology challenges for silicon integrated circuits with a design rule of 0.1 /spl mu/m and below are addressed. We begin by reviewing the state-of-the-art CMOS technology at 0.25 /spl mu/m currently in development, covering a logic-oriented processes and dynamic random access memory (DRAM) processes. CMOS transistor structures are compared by introducing a figure of merit. We then examine scaling guidelines for 0.1 /spl mu/m which has started to deviate for optimized performance from the classical theory of constant-field scaling. This highlights the problem of nontrivial subthreshold current associated with the scaled-down CMOS with low threshold voltages. Interconnect issues are then considered to assess the performance of microprocessors in 0.1 /spl mu/m technology. 0.1 /spl mu/m technology will enable a microprocessor which runs at 1000 MHz with 500 million transistors. Challenges below 0.1 /spl mu/m are then addressed. New transistor and circuit possibilities such as silicon on insulator (SOI), dynamic-threshold (DT) MOSFET, and back-gate input MOS (BMOS) are discussed. Two problems below 0.1 /spl mu/m are highlighted. They are threshold voltage control and pattern printing. It is pointed out that the threshold voltage variations due to doping fluctuations is a limiting factor for scaling CMOS transistors for high performance. The problem with lithography below 0.1 /spl mu/m is the low throughput for a single probe. The use of massively parallel scanning probe assemblies working over the entire wafer is suggested to overcome the problem of low throughput.

Study and Analysis of the Effects of SiGe Source and Pocket-Doped Channel on Sensing Performance of Dielectrically Modulated Tunnel FET-Based Biosensors

Abstract: Dielectrically modulated tunnel FET (DMTFET)-based biosensors show higher sensitivity but lower subthreshold current compared with their dielectrically modulated FET counterpart. In this context, the effect of use of silicon–germanium (SiGe) source and n+-pocket-doped channel is investigated with the help of extensive device-level simulations. This paper explores the underlying physics of germanium composition variation in the source region, and doping concentration variation in n+-pocket region, from the perspective of biomolecule conjugation. The effects of source bandgap and tunneling length over the band-to-band tunneling component have been analyzed, and, subsequently, the sensing performance of DMTFETs has been estimated. The results show that SiGe-source DMTFET has significant superiority over n+-pocket DMTFET for attaining higher subthreshold current level while retaining acceptable sensitivity. Such sensitivity-current optimization has been studied for different gate and drain biases, and the suitable biasing range of operation has been indicated. In addition, the relative efficiency of SiGe source and n+-pocket-doped channel has been studied under different biomolecule sample specifications. Finally, the influence of trap-assisted tunneling on DMTFET sensing performance has been analyzed, and the comparative role of SiGe source and n+ pocket has also been indicated in this context.