Topic
Tetrahydrofuran
About: Tetrahydrofuran is a research topic. Over the lifetime, 11778 publications have been published within this topic receiving 158241 citations. The topic is also known as: diethylene oxide & 1,4-epoxybutane.
Papers published on a yearly basis
Papers
More filters
TL;DR: A series of stimuli-responsive films based on metallo-supramolecular polymers have been prepared and studied as discussed by the authors, which are comprised of a 4-oxy-2,6-bis-(1′-methylbenzimidazolyl)pyridine ditopic endcapped poly(tetrahydrofuran) with different ratios of Zn2+ and Eu3+.
Abstract: A series of stimuli-responsive films based on metallo-supramolecular polymers have been prepared and studied. The metallo-supramolecular polymers are comprised of a 4-oxy-2,6-bis-(1′-methylbenzimidazolyl)pyridine ditopic endcapped poly(tetrahydrofuran) with different ratios of Zn2+ and Eu3+. A combination of the optical properties of the Eu3+ complex along with its more labile nature results in the formation of highly stimuli-responsive materials. The films of the Eu3+-containing metallo-supramolecular polymers show a pronounced optical response to an increase in temperature or upon exposure to chemicals such as triethyl phosphate, which was used as a mimic for organophosphate pesticides and nerve gas agents.
117 citations
TL;DR: The results support the picture that in DNA the sugar moiety itself is an active part in the initial molecular processes leading to single strand breaks and demonstrate that THF cannot be used as surrogate to model deoxyribose in DNA with respect to the attack of electrons at subexcitation energies (<3 eV.
Abstract: We study dissociative electron attachment to furan (FN) (C4H4O), tetrahydrofuran (THF) (C4H8O), and fructose (FRU) (C6H12O6) using crossed electron/molecular beams experiments with mass spectrometric detection of the anions. We find that FN and THF are weak electron scavengers and subjected to dissociative electron attachment essentially in the energy range above 5.5eV via core excited resonances. In striking contrast to that, FRU is very sensitive towards low energy electrons generating a variety of fragment ions via a pronounced low energy feature close to 0eV. These reactions are associated with the degradation of the ring structure and demonstrate that THF cannot be used as surrogate to model deoxyribose in DNA with respect to the attack of electrons at subexcitation energies (<3eV). The results support the picture that in DNA the sugar moiety itself is an active part in the initial molecular processes leading to single strand breaks.
117 citations
TL;DR: The equilibrium constants for the fractionation of H 2 18 O and H 2 16 O between liquid and solid phases were determined by slow freezing of ice and by slow formation of the clathrate hydrate of tetrahydrofuran from liquid solution as discussed by the authors.
116 citations
Patent•
02 Feb 1996
TL;DR: In this paper, the problem of obtaining a new oxime sulfonate useful as an acid generating agent for resist capable of providing a resist pattern high in generation efficiency of an acid, excellent in pattern shape, dimensional fidelity, exposure margin, heat resistance etc.
Abstract: PROBLEM TO BE SOLVED: To obtain a new oxime sulfonate useful as an acid generating agent for resist capable of providing a resist pattern high in generation efficiency of an acid, excellent in pattern shape, dimensional fidelity, exposure margin, heat resistance, etc. SOLUTION: This oxime sulfonate compound is shown by formula I [R 1 and R 2 are each a (substituted) hydrocarbon] such as a compound of formula III. The compound of formula II is obtained, for example, by esterifying an oxime group-containing compound with a sulfonic acid chloride group-containing compound in a solvent such as tetrahydrofuran in the presence of a basic catalyst such as pyridine. An acid generating agent comprising the compound of formula I is mixed with a film-forming substance to prepare a photosensitive composition for resist. The amount of the photosensitive composition for resist blended is preferably about 1-30 pts.wt. based on 100 pts.wt. of the film-forming substance. COPYRIGHT: (C)1997,JPO
116 citations
115 citations