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Thin-film transistor

About: Thin-film transistor is a research topic. Over the lifetime, 48425 publications have been published within this topic receiving 680879 citations. The topic is also known as: TFT.


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Patent
19 Mar 2003
TL;DR: In this article, a method for fabricating a transistor configuration including at least one trench transistor cell has a gate electrode and a field electrode disposed in a trench below the gate electrode, and the trenches are formed in a semiconductor substrate.
Abstract: A method for fabricating a transistor configuration including at least one trench transistor cell has a gate electrode and a field electrode disposed in a trench below the gate electrode. The trenches are formed in a semiconductor substrate. A drift zone, a channel zone, and a source zone are in each case provided in the semiconductor substrate. According to the invention, the source zone and/or the channel zone are formed at the earliest after the introduction of the trenches into the semiconductor substrate by implantation and diffusion.

140 citations

Patent
24 May 1994
TL;DR: In this article, an active matrix type liquid crystal display whose thin film transistors (TFTs) in the peripheral circuit section are composed of the crystalline silicon film whose crystal is grown in the direction parallel to the flow of carriers and whose TFTs in the picture element section are made of the amorphous silicon film can be obtained.
Abstract: Nickel is introduced to a predetermined region of a peripheral circuit section, other than a picture element section, on an amorphous silicon film to crystallize from that region. After forming gate electrodes and others, sources, drains and channels are formed by doping impurities, and laser is irradiated to improve the crystallization. After that, electrodes/wires are formed. Thereby an active matrix type liquid crystal display whose thin film transistors (TFT) in the peripheral circuit section are composed of the crystalline silicon film whose crystal is grown in the direction parallel to the flow of carriers and whose TFTs in the picture element section are composed of the amorphous silicon film can be obtained.

140 citations

Patent
28 Dec 1999
TL;DR: In this paper, a pixel structure for an active matrix display device implemented in polysilicon includes two transistors, a select transistor and a drive transistor, and the pixel storage capacitance is entirely realized by the gate to source capacitance of the drive transistor.
Abstract: A circuit design technique polysilicon thin-film transistor (TFT) circuitry produces circuits that are relatively less sensitive to threshold variations among the TFT's than circuits designed using conventional techniques. The circuit is designed such that thin-film transistors that are sensitive to threshold variations are made larger than other thin-film transistors in the circuitry to minimize threshold variations among similar transistors implemented in the circuit. In one embodiment, a pixel structure for an active matrix display device implemented in polysilicon includes two transistors, a select transistor and a drive transistor. The drive transistor in the pixel structure is a thin film metal oxide silicon (MOS) transistor that includes a gate to source capacitance sufficient to hold an electrical potential which keeps the transistor in a conducting state for an image field interval. One embodiment of the pixel structure includes only the select transistor and the drive transistor. The pixel storage capacitance is entirely realized by the gate to source capacitance of the drive transistor. Another embodiment of the pixel structure includes a capacitor which is much smaller than the capacitor of a conventional active matrix pixel structure. This capacitor holds the pixel in a non-illuminated state when the drive transistor is turned off. This pixel structure may be used with any display technology that uses an active matrix and stores image data on a capacitance in the pixel, including without limitation, organic light emitting diodes, electroluminescent devices, and inorganic light emitting diodes.

140 citations

Journal ArticleDOI
TL;DR: The field effect mobility of these TFTs ranges from 10−2'cm2/V's for p-4P to 10−1'cm 2/V's for P-6P with on/off current ratio from 105 to 106 as mentioned in this paper.
Abstract: Organic thin film transistors (TFTs) have been fabricated using thermally evaporated films of the oligophenyls p-quaterphenyl (p-4P), p-quinquephenyl (p-5P), and p-sexiphenyl (p-6P). The field-effect mobility of these TFTs ranges from 10−2 cm2/V s for p-4P to 10−1 cm2/V s for p-6P with on/off current ratio from 105 to 106. These values are comparable to those achieved using the more widely studied organic semiconductors alpha-sexithienyl (α-6T) and pentacene. X-ray diffraction reveals a high degree of molecular ordering, believed to be important for obtaining high field-effect mobility in organic TFTs.

140 citations

Journal ArticleDOI
TL;DR: In this paper, high-capacitance bilayer dielectrics based on atomic-layer-deposited HfO2 and spin-cast epoxy are used with networks of single-walled carbon nanotubes (SWNTs) to enable lowvoltage, hysteresis-free, and high-performance thin-film transistors (TFTs) on silicon and flexible plastic substrates.
Abstract: High-capacitance bilayer dielectrics based on atomic-layer-deposited HfO2 and spin-cast epoxy are used with networks of single-walled carbon nanotubes (SWNTs) to enable low-voltage, hysteresis-free, and high-performance thin-film transistors (TFTs) on silicon and flexible plastic substrates. These HfO2–epoxy dielectrics exhibit excellent properties including mechanical flexibility, large capacitance (up to ca. 330 nF cm–2), and low leakage current (ca. 10–8 A cm–2); their low-temperature (ca. 150 °C) deposition makes them compatible with a range of plastic substrates. Analysis and measurements of these dielectrics as gate insulators in SWNT TFTs illustrate several attractive characteristics for this application. Their compatibility with polymers used for charge-transfer doping of SWNTs is also demonstrated through the fabrication of n-channel SWNT TFTs, low-voltage p–n diodes, and complementary logic gates.

140 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
2023341
2022918
2021640
20201,333
20192,015
20182,080