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Transistor

About: Transistor is a research topic. Over the lifetime, 138090 publications have been published within this topic receiving 1455233 citations.


Papers
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Journal ArticleDOI
H.K. Gummel1
TL;DR: In this paper, a self-consistent iterative scheme for the numerical calculation of dc potentials and currents in a one-dimensional transistor model is presented, where boundary conditions are applied only at points representing contacts.
Abstract: A self-consistent iterative scheme for the numerical calculation of dc potentials and currents in a one-dimensional transistor model is presented. Boundary conditions are applied only at points representing contacts. Input data are: doping profile, parameters governing excess carrier recombination, parameters describing the dependence of mobility on doping and on electric field, applied emitter and collector voltages, and a trial solution for the electrostatic potential. The major limitation of the present approach results from use of Boltzmann rather than Fermi statistics. Convergence of the iteration scheme is good for low and moderate injection levels.

1,128 citations

Patent
15 May 2003
TL;DR: In this paper, the field effect transistors (FET) have been extended to include a gate insulator layer comprising a substantially transparent material adjacent to the channel layer so as to define a channel layer/gate insulator interface.
Abstract: Enhancement mode, field effect transistors wherein at least a portion of the transistor structure may be substantially transparent. One variant of the transistor includes a channel layer comprising a substantially insulating, substantially transparent, material selected from ZnO, Sn02, or In203. A gate insulator layer comprising a substantially transparent material is located adjacent to the channel layer so as to define a channel layer/gate insulator layer interface. A second variant of the transistor includes a channel layer comprising a substantially transparent material selected from substantially insulating ZnO, Sn02or In2O3, the substantially insulating ZnO, Sn02, or In203 being produced by annealing. Devices that include the transistors and methods for making the transistors are also disclosed.

1,127 citations

Journal ArticleDOI
TL;DR: In this paper, the first solid-state field-effect transistor has been fabricated utilizing a film of an organic macromolecule, polythiophene, as a semiconductor.
Abstract: The first solid‐state field‐effect transistor has been fabricated utilizing a film of an organic macromolecule, polythiophene, as a semiconductor. The device characteristics have been optimized by controlling the doping levels of the polymer. The device is a normally off type and the source (drain) current can be modulated by a factor of 102–103 by varying the gate voltage. The carrier mobility and the transconductance have also been determined to be ∼10−5 cm2/V s and 3 nS, respectively, by means of electrical measurements.

1,125 citations

Patent
23 Mar 2001
TL;DR: In this paper, a thin film transistor with a ZnO film as active layer is presented, which suppresses a leak current of a gate insulating film and obtains good transistor characteristics.
Abstract: (57) Abstract: Provided is a thin film transistor including a ZnO film as a semiconductor active layer, which suppresses a leak current of a gate insulating film and obtains good transistor characteristics. A thin film transistor T1 formed on an insulating substrate 1. On the substrate 1, a gate electrode 2, a gate insulating film 31, an intermediate layer 32, and a semiconductor active layer 4 made of ZnO are sequentially formed. On the semiconductor active layer 4, a source electrode 5 and a drain electrode 6 are formed. ing. The mid layer 32 It is provided to prevent mobile ions (Zn ions) from entering the gate insulating film 32 from the semiconductor active layer (ZnO film) 4 and is made of silicon nitride.

1,124 citations

Journal ArticleDOI
TL;DR: In this paper, the authors fabricated ZnO thin-film transistors by rf magnetron sputtering on Si substrates held near room temperature, and the best devices had field effect mobility of more than 2 cm2/V and an on/off ratio>106.
Abstract: We fabricated ZnO thin-film transistors by rf magnetron sputtering on Si substrates held near room temperature. The best devices had field-effect mobility of more than 2 cm2/V s and an on/off ratio>106. These ZnO films had resistivity ∼105 ohm cm, with high optical transparency (>80% for wavelength >400 nm), and compressive stress <0.5 GPa. The combination of transparency in the visible, excellent transistor characteristics, and low-temperature processing makes ZnO thin-film transistors attractive for flexible electronics on temperature sensitive substrates.

1,115 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20231,850
20224,013
20211,802
20203,677
20194,203
20184,241