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Transistor

About: Transistor is a research topic. Over the lifetime, 138090 publications have been published within this topic receiving 1455233 citations.


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Book
01 Oct 1989
TL;DR: In this paper, a revised version explains the ins and outs of SPICE, plus gives new data on modeling advanced devices such as MESFETs, IBEs, and SCR-thyristors.
Abstract: From the Publisher: With all the clarity and hands-on practicality of the best-selling first edition,this revised version explains the ins and outs of SPICE,plus gives new data on modeling advanced devices such as MESFETs,ISFETs,and thyristors. And because it's the only book that describes the models themselves,it helps readers gain maximum value from SPICE,rather than just telling them how to run the program. This guide is also distinctive in covering both MOS and FET models. Step by step,it takes the reader through the modeling process,providing complete information on a variety of semiconductor devices for designing specific circuit applications. These include: Pn junction and Schottky diodes; bipolar junction transistor (BJT); junction field effect transistor (JFET); metal oxide semiconductor transistor (MOST); metal semiconductor field effect transistor (MESFET); ion sensitive field effect transistor (ISFET); semiconductor controlled rectifier (SCR-thyristor).

869 citations

Journal ArticleDOI
TL;DR: In this paper, a non-volatile memory device with flexible plastic active layers deposited from solution is presented, and the memory device is a ferroelectric field effect transistor (FeFET) made with a Ferroelectric fluoropolymer and a bisalkoxy-substituted poly(pphenylene vinylene) semiconductor material.
Abstract: We demonstrate a rewritable, non-volatile memory device with flexible plastic active layers deposited from solution. The memory device is a ferroelectric field-effect transistor (FeFET) made with a ferroelectric fluoropolymer and a bisalkoxy-substituted poly(p-phenylene vinylene) semiconductor material. The on- and off-state drain currents differ by several orders of magnitude, and have a long retention time, a high programming cycle endurance and short programming time. The remanent semiconductor surface charge density in the on-state has a high value of 18 mC m−2, which explains the large on/off ratio. Application of a moderate gate field raises the surface charge to 26 mC m−2, which is of a magnitude that is very difficult to obtain with conventional FETs because they are limited by dielectric breakdown of the gate insulator. In this way, the present ferroelectric–semiconductor interface extends the attainable field-effect band bending in organic semiconductors.

862 citations

Journal ArticleDOI
TL;DR: The ability to simultaneously achieve high on-off ratio, high current density, and logic integration in the vertically stacked multi-heterostructures can open up a new dimension for future electronics to enable three-dimensional integration.
Abstract: Graphene has attracted considerable interest for future electronics, but the absence of a bandgap limits its direct applicability in transistors and logic devices. Recently, other layered materials such as molybdenum disulphide (MoS(2)) have been investigated to address this challenge. Here, we report the vertical integration of multi-heterostructures of layered materials for the fabrication of a new generation of vertical field-effect transistors (VFETs) with a room temperature on-off ratio > 10(3) and a high current density of up to 5,000 A cm(-2). An n-channel VFET is created by sandwiching few-layer MoS(2) as the semiconducting channel between a monolayer graphene sheet and a metal thin film. This approach offers a general strategy for the vertical integration of p- and n-channel transistors for high-performance logic applications. As an example, we demonstrate a complementary inverter with a larger-than-unity voltage gain by vertically stacking graphene, Bi(2)Sr(2)Co(2)O(8) (p-channel), graphene, MoS(2) (n-channel) and a metal thin film in sequence. The ability to simultaneously achieve a high on-off ratio, a high current density and a logic function in such vertically stacked multi-heterostructures can open up possibilities for three-dimensional integration in future electronics.

860 citations

Journal ArticleDOI
TL;DR: In this paper, a gate injection transistor (GIT) was proposed to increase the electron density in the channel, resulting in a dramatic increase of the drain current owing to the conductivity modulation.
Abstract: We have developed a normally-off GaN-based transistor using conductivity modulation, which we call a gate injection transistor (GIT). This new device principle utilizes hole-injection from the p-AlGaN to the AlGaN/GaN heterojunction, which simultaneously increases the electron density in the channel, resulting in a dramatic increase of the drain current owing to the conductivity modulation. The fabricated GIT exhibits a threshold voltage of 1.0 V with a maximum drain current of 200 mA/mm, in which a forward gate voltage of up to 6 V can be applied. The obtained specific ON-state resistance (RON . A) and the OFF-state breakdown voltage (BV ds) are 2.6 mOmega . cm2 and 800 V, respectively. The developed GIT is advantageous for power switching applications.

855 citations

Journal ArticleDOI
TL;DR: In this article, the transport properties of random networks of single-wall carbon nanotubes fabricated into thin-film transistors were investigated and shown to behave like a p-type semiconductor with a field effect mobility of ∼10 cm2/V and a transistor on-to-off ratio of ∼105.
Abstract: We report on the transport properties of random networks of single-wall carbon nanotubes fabricated into thin-film transistors. At low nanotube densities (∼1 μm−2) the networks are electrically continuous and behave like a p-type semiconductor with a field-effect mobility of ∼10 cm2/V s and a transistor on-to-off ratio ∼105. At higher densities (∼10 μm−2) the field-effect mobility can exceed 100 cm2/V s; however, in this case the network behaves like a narrow band gap semiconductor with a high off-state current. The fact that useful device properties are achieved without precision assembly of the nanotubes suggests the random carbon nanotube networks may be a viable material for thin-film transistor applications.

843 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20231,850
20224,013
20211,802
20203,677
20194,203
20184,241