Transistor

About: Transistor is a research topic. Over the lifetime, 138090 publications have been published within this topic receiving 1455233 citations.

Flexible memristive memory array on plastic substrates.

Abstract: The demand for flexible electronic systems such as wearable computers, E-paper, and flexible displays has recently increased due to their advantages over present rigid electronic systems. Flexible memory is an essential part of electronic systems for data processing, storage, and communication and thus a key element to realize such flexible electronic systems. Although several emerging memory technologies, including resistive switching memory, have been proposed, the cell-to-cell interference issue has to be overcome for flexible and high performance nonvolatile memory applications. This paper describes the development of NOR type flexible resistive random access memory (RRAM) with a one transistor–one memristor structure (1T-1M). By integration of a high-performance single crystal silicon transistor with a titanium oxide based memristor, random access to memory cells on flexible substrates was achieved without any electrical interference from adjacent cells. The work presented here can provide a new appr...

Tri-Gate fully-depleted CMOS transistors: fabrication, design and layout

Abstract: Tri-Gate fully-depleted CMOS transistors have been fabricated with various body dimensions. These experimental results and 3-D simulations are used to explore the design space for full depletion, as well as layout issues for the Tri-Gate architecture, down to 30 nm gate lengths. It is found not only that the Tri-Gate body dimensions are flexible and relaxed compared to single-gate or double-gate devices, but that the corner plays a fundamental role in determining the device I-V characteristics. The corner device not only turns on at lower voltages due to the proximity of two adjacent gates, but the DIBL of this part of the device is much smaller than the rest of the transistor. The shape of the subthreshold I-V characteristics and the degree of DIBL control, as well as the early device turn-on are also greatly affected by the degree of body corner rounding. Examination of layout issues shows that the fin-doubling approach from using a spacer printing technique results in an increase in drive current of 1.2 times that of a planar device for a given width, though the shape of the allowed Tri-Gate fins has certain restrictions.

On the possibility of transistor action based on quantum interference phenomena

Abstract: A theoretical study of quantum interference phenomena in a T‐shaped semiconductor structure is presented. Transmission and reflection coefficients are computed by use of a tight‐binding Green function technique. As expected, the results resemble the well‐known solutions for the electromagnetic field in waveguides with the main difference that the penetration of the wave function of the electrons can be controlled by external voltages. We conclude that transistor action based on quantum interference should be observable in such structures, and we present general results for the functional dependences of the transmission coefficient which corresponds to a transconductance.

Application of amorphous silicon field effect transistors in addressable liquid crystal display panels

Abstract: It is shown that thin-film field effect transistors (FETs) made from amorphous (a-) silicon deposited by the glow-discharge technique have considerable potential as switching elements in addressable liquid crystal display panels. The fabrication of the elements and their characteristics with steady and pulsed applied potentials are discussed in some detail. Two important points are stressed: (i) a-Si device arrays can be produced by well-established photolithographic techniques, and (ii) satisfactory operation at applied voltages below 15VV is possible. Small experimental 7×5 transistor panels have been investigated and it is shown that with the present design up to 250-way multiplexing could be achieved. The reproducibility of FET characteristics is good and in tests so far no change has been observed after more than 109 switching operations.

Atomic layer deposition of CMOS gates with variable work functions

Abstract: Structures, systems and methods for transistors having gates with variable work functions formed by atomic layer deposition are provided. One transistor embodiment includes a first source/drain region, a second source/drain region, and a channel region therebetween. A gate is separated from the channel region by a gate insulator. The gate includes a ternary metallic conductor formed by atomic layer deposition.