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Tunnel field-effect transistor

About: Tunnel field-effect transistor is a(n) research topic. Over the lifetime, 949 publication(s) have been published within this topic receiving 20803 citation(s). The topic is also known as: TFET.

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Journal ArticleDOI
Adrian M. Ionescu1, Heike Riel2Institutions (2)
17 Nov 2011-Nature
TL;DR: Tunnels based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal–oxide–semiconductor transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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Abstract: Power dissipation is a fundamental problem for nanoelectronic circuits. Scaling the supply voltage reduces the energy needed for switching, but the field-effect transistors (FETs) in today's integrated circuits require at least 60 mV of gate voltage to increase the current by one order of magnitude at room temperature. Tunnel FETs avoid this limit by using quantum-mechanical band-to-band tunnelling, rather than thermal injection, to inject charge carriers into the device channel. Tunnel FETs based on ultrathin semiconducting films or nanowires could achieve a 100-fold power reduction over complementary metal-oxide-semiconductor (CMOS) transistors, so integrating tunnel FETs with CMOS technology could improve low-power integrated circuits.

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2,022 citations


Journal ArticleDOI
Abstract: We have demonstrated a 70-nm n-channel tunneling field-effect transistor (TFET) which has a subthreshold swing (SS) of 52.8 mV/dec at room temperature. It is the first experimental result that shows a sub-60-mV/dec SS in the silicon-based TFETs. Based on simulation results, the gate oxide and silicon-on-insulator layer thicknesses were scaled down to 2 and 70 nm, respectively. However, the ON/ OFF current ratio of the TFET was still lower than that of the MOSFET. In order to increase the on current further, the following approaches can be considered: reduction of effective gate oxide thickness, increase in the steepness of the gradient of the source to channel doping profile, and utilization of a lower bandgap channel material

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1,368 citations


Journal ArticleDOI
Alan Seabaugh1, Qin Zhang1Institutions (1)
25 Oct 2010-
TL;DR: This review introduces and summarizes progress in the development of the tunnel field- effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges.

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Abstract: Steep subthreshold swing transistors based on interband tunneling are examined toward extending the performance of electronics systems. In particular, this review introduces and summarizes progress in the development of the tunnel field-effect transistors (TFETs) including its origin, current experimental and theoretical performance relative to the metal-oxide-semiconductor field-effect transistor (MOSFET), basic current-transport theory, design tradeoffs, and fundamental challenges. The promise of the TFET is in its ability to provide higher drive current than the MOSFET as supply voltages approach 0.1 V.

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1,272 citations


Journal ArticleDOI
Kathy Boucart, Adrian M. Ionescu1Institutions (1)
Abstract: In this paper, we propose and validate a novel design for a double-gate tunnel field-effect transistor (DG tunnel FET), for which the simulations show significant improvements compared with single-gate devices using a gate dielectric. For the first time, DG tunnel FET devices, which are using a high-gate dielectric, are explored using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average subthreshold swing of 57 mV/dec, and a minimum point slope of 11 mV/dec. The 2D nature of tunnel FET current flow is studied, demonstrating that the current is not confined to a channel at the gate-dielectric surface. When varying temperature, tunnel FETs with a high-kappa gate dielectric have a smaller threshold voltage shift than those using SiO2, while the subthreshold slope for fixed values of Vg remains nearly unchanged, in contrast with the traditional MOSFET. Moreover, an Ion/Ioff ratio of more than 2 times 1011 is shown for simulated devices with a gate length (over the intrinsic region) of 50 nm, which indicates that the tunnel FET is a promising candidate to achieve better-than-ITRS low-standby-power switch performance.

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1,061 citations


Journal ArticleDOI
TL;DR: How the structure of the nanotube is the key enabler of this particular one-dimensional tunneling effect is discussed, which is controlled here by the valence and conduction band edges in a bandpass-filter-like arrangement.

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Abstract: A detailed study on the mechanism of band-to-band tunneling in carbon nanotube field-effect transistors (CNFETs) is presented. Through a dual-gated CNFET structure tunneling currents from the valence into the conduction band and vice versa can be enabled or disabled by changing the gate potential. Different from a conventional device where the Fermi distribution ultimately limits the gate voltage range for switching the device on or off, current flow is controlled here by the valence and conduction band edges in a bandpass-filter-like arrangement. We discuss how the structure of the nanotube is the key enabler of this particular one-dimensional tunneling effect.

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801 citations


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Performance
Metrics
No. of papers in the topic in previous years
YearPapers
20221
2021119
2020135
201987
201879
201796

Top Attributes

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Topic's top 5 most impactful authors

Dheeraj Sharma

31 papers, 293 citations

Pravin N. Kondekar

15 papers, 114 citations

Rakhi Narang

14 papers, 247 citations

Kaushal Nigam

12 papers, 75 citations

Anne S. Verhulst

11 papers, 365 citations