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Akira Nakano
Researcher at Alps Electric
Publications - 41
Citations - 489
Akira Nakano is an academic researcher from Alps Electric. The author has contributed to research in topics: Plasma processing & Electrode. The author has an hindex of 13, co-authored 41 publications receiving 489 citations.
Papers
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Patent
Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power
Akira Nakano,Tadahiro Ohmi +1 more
TL;DR: In this paper, an impedance matching circuit is placed between an RF generator and a plasma excitation electrode to detect a magnetic field generated at a slit in a sidewall of the chassis.
Patent
Performance evaluation method for plasma processing apparatus
Akira Nakano,Tadahiro Ohmi +1 more
TL;DR: In this paper, the authors evaluated the performance of a matching circuit for matching the impedance between the plasma processing chamber and the radiofrequency generator in order to evaluate whether the loss capacitance CX1 is less than 26 times the plasma electrode capacitance Ce1 at the later time t 1 after delivery between the excitation electrode and ground potential positions which are grounded.
Patent
Plasma processing apparatus, method for operating the same, designing system of matching circuit, and plasma processing method
TL;DR: In this article, a matching circuit is a product matching circuit that is produced based on a circuit constant of an adjusting matching circuit, which is disposed between the radio frequency generator and the plasma processing chamber for a required plasma treatment.
Patent
Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
TL;DR: In this paper, the average density per unit volume of the RF power supplied from the RF generator is decreased as the power flows from the output terminal of the matching circuit to the electrode.
Patent
Plasma processing apparatus suitable for power supply of higher frequency
Akira Nakano,Tadahiro Ohmi +1 more
TL;DR: In this article, a matching circuit was proposed to match the impedance between the plasma processing chamber and the radiofrequency generator, which matches the impedance of the matching circuit with the ground potential positions which are DC-grounded.