Fabrication of highly conducting ZnO/Ag/ZnO and AZO/Ag/AZO transparent conducting oxide layers using RF magnetron sputtering at room temperature

Optoelectronic properties of an AZO/Ag multilayer employed as a flexible electrode

Structural and Optical Properties of ZnO:Al Thin Films Produced by Magnetron Sputtering with Different Oxygen Flow: An Experimental and Ab Initio Study

Improvement of the conductivity and transmittance of AZO/Ag/AZO composite film via lattice oxygen ratio regulation

Low-temperature fabrication of high-performance AlN/Ag/AlN thin films for transparent electrode applications

Silver (Ag) incorporated aluminium doped zinc oxide (AZO) based multilayer films were fabricated for transparent conducting electrode applications. AZO and Ag thin film layers were deposited using direct current magnetron sputtering system without breaking the vacuum. By carefully optimizing the thickness of the metal layer, the minimum sheet resistance of 6 Ω/square was achieved with 70% of transmission in the visible wavelength region. The surface morphology of the film was studied with atomic force microscope mapping in 5 µm × 5 µm area of the multilayer structure. The significance of the Ag layer thickness in determining the electrical and optical properties of the multilayer film was investigated.

Balaji P. Bhargav

Papers

Effect of Ag incorporation on the electrical and optical properties of AZO/Ag/AZO multilayer transparent conducting electrode

Binder Free Phosphorous Doped Mos2 Flexible Anode on Carbon Cloth for High-Capacity Li-Ion Battery Applications