PURPOSE:To make the state of a time count easy to understand, by luminously displaying the state of a remaining time or the elapsed time at each prescribed ratio unit of a CR timer to the set time of the timer and by performing flashing only for a prescribed time at the timer starting time CONSTITUTION:When a flip-flop 12 is set and a timer is started in an incremental mode displaying the elapsed time, a divider 6 and a shift register 7 start to count an output pulse of a CR oscillator 5 A light emitting diode LSB performs flashing by a signal of 32Hz from a divider 2 and inform that a counting operation is started during the time from a start of the counting until the coming out of the first output from the divider 6 At each time when an output from the divider 6 comes out, an output of the shift register 7 is switched and a light emitting diode LED is lighted in turn In a decrement mode displaying the remaining time, an MSB on the highest rank of column of the columns of the light emitting diode in the state that the light is turned on becomes the flashing state at first, and then becomes the state that the light is turned off in turn in accordance with the progress of time counting

Integrated circuit for timer

PURPOSE:To effectively remove the chromaticity components and COD components of a secondary treatment liquid of night soil by passing the secondary treatment liquid of night soil through a synthetic adsorbent resin. CONSTITUTION:The secondary treatment liquid formed by the biological treatment of the night soil by activated sludge is adjusted to 3-5pH and is passed through an adsorption column in which the synthetic adsorbent resin such as styrene/divinyl benzene copolymer is packed. The chromaticity components and COD components in the secondary treatment liquid of the night soil are effectively removed by such simple equipment. The above-mentioned synthetic adsorbent resin can be easily regenerated by bringing a 1-5% caustic soda soln. or aq. 5-50% alcohol soln. into contact with the synthetic adsorbent resin layer.

Treatment of night soil

PURPOSE:To inspect the defect of a mask accurately by comparing the mask with the drawing data of a mask pattern by a method wherein a required pattern is formed on a mask by an electron beam drawing and the electron beam is applied to the mask in accordance with a pattern signal identical to or reversal of the drawn pattern and the secondary electron emitted from the mask is detected CONSTITUTION:Glass on which a chrome film is applied is used as a mask blank and a positive-type electron beam resist is used as a resist and a mask pattern, for instance an L-shape mask pattern, is formed by an electron beam drawing The mask thus obtained is put accurately on the position identical to that when the pattern is drawn and an electron beam of a blanking signal is applied to it If a defect exists on the mask, for instance, if a chrome film 11' remains in the L-shape pattern, if the L-shape pattern has a chipped part or if a pin-hole exists in the L-shape pattern, the intensity of the secondary electron is different at that part Therefore, by observing the intensity of the secondary electron emitted from the mask surface, the defect of the mask can be detected

Inspection of mask

PURPOSE:To permit a high accurate pattern inspection in a short time by accommodating a substrate completed pattern formation in an electron beam exposure device and scanning is done wherein the reflection is detected and compared with the pattern data CONSTITUTION:Patterns 9 are depicted by an electron beam exposure device and substrate to be tested 7 which completed such processes as development, etching or the like is again mounted on the stage of the electron beam exposure device Next, the electron beams 13 scan the whole surface of the substrate to be tested 7 by the same way as that done at the time of pattern depiction and by deflecting the electronbeams 13 The above is done under the condition that the electron beams 13 are always irradiated And emission electrons 14 generated when the electron beams 13 are irradiated to the substrate to be tested 7 are detected by a detector 15 and the emission electrons 14 are compared with the pattern data at the time of pattern depiction to detect defects In this way, a high accurate mask inspection by the electron beams are perfomred

Ban Yasutaka

Papers

Inspection of pattern