A method of generating EUV radiation is described, comprising the steps of: transporting a solid medium (33) through a source space (34) connected to a vacuum pump (35), and irradiating a portion (37) of the medium with an intense, pulsed, laser beam (41) focused on said portion of the medium, thus creating a plasma (47) which emits EUV radiation. To increase the intensity of the EUV radiation and improve the possibility to collect particles (51, 52, 53) released from the medium, at least the medium portions (37) to be irradiated have a concave shape. The method can be improved by embedding the medium in a flow of rare gas. Also described are a EUV radiation source unit for realizing the method and the application of the method in the manufacture of devices such as IC devices, and in a lithographic projection apparatus.

Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit

Process and device for the generation of a fog of micrometric and submicrometric droplets, which may find application to the generation of light in the extreme ultraviolet range, particularly for lithography. According to the process and device, a pressurized liquid is injected into a very small diameter nozzle opening up into a vacuum. Light is generated by focusing laser radiation onto the fog.

Production of a dense mist of micrometric droplets in particular for extreme UV lithography

An exposure apparatus that irradiates excitation laser onto a target, and generates from generated plasma a light source for generating illumination light of an extreme ultraviolet region or an X-ray region includes an illumination optical system that uses the illumination light to illuminate a catoptric reticle that forms a pattern to be transferred, the illumination optical system including a first mirror closest to the light source, an ellipsoidal mirror for condensing the illumination light in front of the first mirror in the illumination optical system, and a projection optical system that reduces and projects the pattern reflected on the reticle onto an object to be exposed, wherein light where an optical-axis direction of the excitation laser proceeds beyond a position that generates the plasma by the excitation laser does not interfere with components in the exposure apparatus including the illumination and projection optical systems, and the ellipsoidal mirror.

Exposure apparatus and device fabrication method using the same

A laser-plasma EUV radiation source (50) that generates larger liquid droplets (72) for the plasma target material. The EUV source (50) forces a liquid (58), preferably Xenon, through a nozzle (64), instead of forcing a gas through the nozzle. The geometry of the nozzle (64) and the pressure of the liquid (58) through the nozzle (54) atomizes the liquid (58) to form a dense spray (70) of droplets (72). Because the droplets (72) are formed from a liquid, they are larger in size, and are more conducive to generating EUV radiation. A condenser (60) is used to convert gaseous Xenon (54) to the liquid (58) prior to being forced through the nozzle (64).

Liquid sprays as the target for a laser-plasma extreme ultraviolet light source

A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.

Motorized chamber lid

A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and optionally a diffuser for capturing a substantial portion of the gas so that the gas may be recycled in a closed-loop system. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like. A remotely-controlled XYZ micro-positioning stage facilitates alignment of the nozzle and the diffuser to the radiated energy beam.

Method and apparatus for adjustably supporting a light source for use in photolithography

An emitted energy system is provided. The emitted energy system (10) may include a fluid (34) communicated through a nozzle (22). The fluid (34) communicated through the nozzle (22) may form a fluid plume (40). An input energy (64) may be applied to the fluid (34) in the fluid plume (40). The input energy (64) may excite the fluid (34) in the fluid plume (40) into producing an emitted energy (16). The emitted energy (16) is collected and directed by an output optics (18) to a target (20). In one embodiment, the target (20) is a photolithography system interface (68) for fabricating a semiconductor device (70). A remotely-controlled XYZ micro-positioning stage (620) facilitates alignment of the nozzle (510) and the diffuser (512) to the radiated energy beam.

Bruce D. Abel

Papers

Method and apparatus for adjustably supporting a light source for use in photolithography

Energy emission system for photolithography