Resistive Random Access Memories (ReRAMs) fabricated in the back-end-of-line are a promising breakthrough for including permanent retention mechanisms in embedded systems. This low-cost solution opens the way to advanced power management schemes. In this paper, we propose novel design architecture of a non-volatile flip-flop based on Bipolar ReRAMs (Bi-RNVFF). Compared to state-of-the-art Data-Retention flip-flop (with Balloon latch), the proposed design is 25% smaller due to 6T structure compared to the 8T structure of Data-Retention flip-flop. Moreover, being non-volatile, the proposed architecture exhibits a zero leakage compared to a Data-Retention Flip-Flop, which consumes ∼3.2µW in sleep mode (leakage) for a 10K Flip-Flop design implemented in 22nm FDSOI technology. Our simulation results show that Bi-RNVFF is a true alternative for future “Power-on, Power-off” application adding Non-Volatility without significant burdening of the existing architectures.

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Bipolar ReRAM Based non-volatile flip-flops for low-power architectures

The present invention provides a reactive sputtering method and a reactive sputtering apparatus which suppress a film quality change caused by a temperature variation in continuous substrate processing An embodiment of the present invention performs reactive sputtering while adjusting a flow rate of reactive gas according to the temperature of a constituent member facing a sputtering space Specifically, a temperature sensor is provided on a shield and the flow rate is adjusted according to the temperature Thereby, even when a degassing amount of a film adhering to the shield changes, a partial pressure of reactive gas can be set to a predetermined value For a resistance change layer constituting a ReRAM, a perovskite material such as PrCaMn03 (PCMO), LaSrMnO3 (LSMO), and GdBaCoxOy (GBCO), a two-element type transition metal oxide material which has a composition shifted from a stoichiometric one, such as nickel oxide (NiO), vanadium oxide (V2O5), and the like are used

Reactive sputtering method and reactive sputtering apparatus

A nonvolatile memory cell prototype based on the effect of resistive switching in thin Hf x Al1 − x O y oxide films grown by atomic layer deposition (ALD) with a Al depth-graded profile has been developed. This prototype imitates the arrangement of memory cells between the metallization layers of integral circuits. The obtained results are much superior to the parameters of conventional flash memory cells in increasing the reset speed and decreasing the reset voltage.

Nonvolatile memory cells based on the effect of resistive switching in depth-graded ternary Hf x Al1 − x O y oxide films

A resistance change memory device with a high ON/OFF ratio can be provided. A resistance change memory device according to an embodiment includes a first electrode containing a first element, a resistance change layer provided on the first electrode and containing an oxide of the first element, an oxygen conductive layer provided on the resistance change layer, containing a second element and oxygen, having oxygen ion conductivity, and having a relative permittivity higher than a relative permittivity of the resistance change layer, and a second electrode provided on the oxygen conductive layer. The resistance change layer undergoes dielectric breakdown earlier than the oxygen conductive layer when a voltage between the first electrode and the second electrode is continuously increased from zero.

Resistance change memory device

A memory cell of a resistive random access memory and a manufacturing method thereof are provided. The method includes the following steps. A first electrode is formed. A metal oxide layer is formed on the first electrode. An electrode buffer stacked layer is formed on the metal oxide layer and includes a first buffer layer and a second buffer layer, and the first buffer layer is located between the second buffer layer and the metal oxide layer. The second buffer layer reacts with oxygen from the first buffer layer more strongly than the first buffer layer reacts with oxygen from the metal oxide layer. A second electrode layer is formed on the electrode buffer stacked layer.

C. C. Wang

Papers

Low Power and High Speed Bipolar Switching with A Thin Reactive Ti Layer in HfO2 Based RRAM