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Chando Park

Researcher at Qualcomm

Publications -  65
Citations -  2619

Chando Park is an academic researcher from Qualcomm. The author has contributed to research in topics: Tunnel magnetoresistance & Layer (electronics). The author has an hindex of 20, co-authored 65 publications receiving 2393 citations. Previous affiliations of Chando Park include Western Digital.

Papers
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Journal ArticleDOI

Magnetic tunnel junctions

TL;DR: A brief overview of the development of magnetic tunnel junctions, introducing the underlying physics, is given in this paper, where read sensors in hard disk drives and memory elements in magnetoresistive random access memory are discussed.
Journal ArticleDOI

Field-free switching of a perpendicular magnetic tunnel junction through the interplay of spin–orbit and spin-transfer torques

TL;DR: In this article, the authors show that the threshold current density of spin-orbit torque switching can be reduced by increasing the spin-transfer torque current density, and thus an optimal point for low-power perpendicular magnetic tunnel junction switching can also be found by tuning the two current densities.
Patent

Method and system for providing a read sensor having a low magnetostriction free layer

TL;DR: A method and system for providing a magnetic structure in magnetic transducers is described in this paper, where the magnetic structure includes a pinned layer, a non-magnetic spacer layer, and a free layer.
Patent

Magnetic etch-stop layer for magnetoresistive read heads

TL;DR: In this article, a tunneling magnetoresistive read head was constructed over a shield layer, where the magnetic etch-stop layer comprises a nonmagnetic metal and a soft magnetic material with overall property still being magnetically soft.
Patent

Spin tunneling magnetic element promoting free layer crystal growth from a barrier layer interface

TL;DR: A spin tunneling element includes a pinned layer, a barrier layer, and a free layer as mentioned in this paper, which includes a ferromagnetic layer and amorphous material that adjoins the barrier layer at a second interface opposite the first interface.