C
Chen Yonghe
Researcher at Guilin University of Electronic Technology
Publications - 37
Citations - 169
Chen Yonghe is an academic researcher from Guilin University of Electronic Technology. The author has contributed to research in topics: Breakdown voltage & Electric field. The author has an hindex of 5, co-authored 37 publications receiving 110 citations.
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Enhanced up-conversion luminescence and optical thermometry characteristics of Er 3+ /Yb 3+ co-doped transparent phosphate glass-ceramics
TL;DR: In this paper, a novel Er3+/Yb3+ co-doped transparent glass-ceramics (GCs) containing orthorhombic NaZnPO4 nanocrystals (NCs) were successfully prepared for the first time by a conventional melt-quenching and subsequent heating.
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High Temperature Conductive Stability of Indium Tin Oxide Films
TL;DR: In this paper, the changes in the conductive properties of ITO films and its mechanism were investigated at special high-temperature above 1000 °C, where the as-deposited ITO samples were annealed at different temperature-time treatments, and investigated the effects of annealing on the electrical, structure, surface morphology and chemical properties.
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Morphology-dependent high antireflective surfaces via anodic aluminum oxide nanostructures
Haiou Li,Le Cao,Fu Tao,Qi Li,Fabi Zhang,Gongli Xiao,Chen Yonghe,Liu Xingpeng,Wenning Zhao,Zhiqiang Yu,Zhiping Zhou,Sun Tangyou +11 more
TL;DR: In this article, an ultra-thin AAO based bilayer polydimethylsiloxane (PDMS) scheme was introduced to simply replicate and obtain regular triangle-like surface nano-pillar array with a period of 125
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Simple fabrication ZnO/β-Ga2O3 core/shell nanorod arrays and their photoresponse properties
Haiou Li,Li Yue,Gongli Xiao,Gao Xi,Qi Li,Chen Yonghe,Fu Tao,Sun Tangyou,Fabi Zhang,Naisen Yu +9 more
TL;DR: In this paper, a highly sensitive ultraviolet (UV) sensor was fabricated based on vertically aligned β-Ga2O3 decorated ZnO core-shell nanorod arrays (NRs).
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A novel SOI LDMOS with substrate field plate and variable-k dielectric buried layer
TL;DR: In this article, a novel silicon-on-insulator (SOI) lateral double-diffused metal-oxide-semiconductor (LDMOS) structure has been proposed.