C
Chung-Hyeon Ryu
Researcher at Hanyang University
Publications - 5
Citations - 205
Chung-Hyeon Ryu is an academic researcher from Hanyang University. The author has contributed to research in topics: Sintering & Copper. The author has an hindex of 5, co-authored 5 publications receiving 151 citations.
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Nondestructive evaluation of hidden multi-delamination in a glass-fiber-reinforced plastic composite using terahertz spectroscopy
TL;DR: In this article, a terahertz time-domain spectroscopy (THz-TDS) imaging system was devised to detect hidden multi-delamination in a glass-fiber-reinforced plastic (GFRP) composite laminates.
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Synthesis and Characterization of Copper Nanoparticles (Cu-Nps) using Rongalite as Reducing Agent and Photonic Sintering of Cu-Nps Ink for Printed Electronics
TL;DR: In this article, the authors used Rongalite as a reducing agent via solution process to reduce copper salt within 10-20 min at low temperature without using any complexing agent.
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Nondestructive evaluation of hidden damages in glass fiber reinforced plastic by using the terahertz spectroscopy
TL;DR: In this article, a terahertz (THz) spectroscopy system was used for the detection and evaluation of hidden damages in a glass fiber reinforced plastic (GFRP).
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The effect of poly (N-vinylpyrrolidone) molecular weight on flash light sintering of copper nanopaste
TL;DR: The effect of poly (N-vinylpyrrolidone) (PVP) molecular weight (MW) on the flash light sintering of copper nanopaste was investigated in this paper.
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Intense pulsed light sintering of Cu nano particles/micro particles-ink assisted with heating and vacuum holding of substrate for warpage free printed electronic circuit
TL;DR: In this article, the intensity pulsed light (IPL) sintering process was investigated with vacuum stretching and heating of the polymer substrate for warpage free printed electronics circuit, which was optimized to obtain high electrical conductivity, high adhesion strength, and little warpage of printed Cu electrodes pattern on the polyimide (PI) substrate.