A simple method for implementing the steady‐state photoconductance technique for determining the minority‐carrier lifetime of semiconductor materials is presented. Using a contactless instrument, the photoconductance is measured in a quasi‐steady‐state mode during a long, slow varying light pulse. This permits the use of simple electronics and light sources. Despite its simplicity, the technique is capable of determining very low minority carrier lifetimes and is applicable to a wide range of semiconductor materials. In addition, by analyzing this quasi‐steady‐state photoconductance as a function of incident light intensity, implicit current–voltage characteristic curves can be obtained for noncontacted silicon wafers and solar cell precursors in an expedient manner.

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Contactless determination of current–voltage characteristics and minority‐carrier lifetimes in semiconductors from quasi‐steady‐state photoconductance data

This paper describes a new method for minority-carrier lifetime determination using a contactless photoconductance instrument in a quasi-steady-state mode. Compared to the more common transient photoconductance decay approach, the new technique permits the use of simpler electronics and light sources, yet has the capability to measure lifetimes in the nanosecond to millisecond range. In addition, by analyzing the quasi-steady-state photoconductance as a function of incident light intensity, an implicit I/sub SC/-V/sub OV/ curve can be obtained for noncontacted silicon wafers and solar cell precursors.

Quasi-steady-state photoconductance, a new method for solar cell material and device characterization

A salient characteristic of solar cells is their ability to subject photo-generated electrons and holes to pathways of asymmetrical conductivity—‘assisting’ them towards their respective contacts. All commercially available crystalline silicon (c-Si) solar cells achieve this by making use of doping in either near-surface regions or overlying silicon-based films. Despite being commonplace, this approach is hindered by several optoelectronic losses and technological limitations specific to doped silicon. A progressive approach to circumvent these issues involves the replacement of doped-silicon contacts with alternative materials which can also form ‘carrier-selective’ interfaces on c-Si. Here we successfully develop and implement dopant-free electron and hole carrier-selective heterocontacts using alkali metal fluorides and metal oxides, respectively, in combination with passivating intrinsic amorphous silicon interlayers, resulting in power conversion efficiencies approaching 20%. Furthermore, the simplified architectures inherent to this approach allow cell fabrication in only seven low-temperature (≤200 ∘C), lithography-free steps. This is a marked improvement on conventional doped-silicon high-efficiency processes, and highlights potential improvements on both sides of the cost-to-performance ratio for c-Si photovoltaics. The use of doped-silicon contacts in silicon solar cells adds cost and complexity to the fabrication process. These issues can now be circumvented by using dopant-free carrier-selective interfaces on silicon, realized by alkali metal fluorides and metal oxides.

Efficient silicon solar cells with dopant-free asymmetric heterocontacts

http://pv.cecs.anu.edu.au/files/cuevas2004measuring.pdf

Measuring and interpreting the lifetime of silicon wafers

This letter examines the application of transparent MoOx (x < 3) films deposited by thermal evaporation directly onto crystalline silicon (c-Si) to create hole-conducting contacts for silicon solar cells. The carrier-selectivity of MoOx based contacts on both n- and p-type surfaces is evaluated via simultaneous consideration of the contact recombination parameter J0c and the contact resistivity ρc. Contacts made to p-type wafers and p+ diffused regions achieve optimum ρc values of 1 and 0.2 mΩ·cm2, respectively, and both result in a J0c of ∼200 fA/cm2. These values suggest that significant gains can be made over conventional hole contacts to p-type material. Similar MoOx contacts made to n-type silicon result in higher J0c and ρc with optimum values of ∼300 fA/cm2 and 30 mΩ·cm2 but still offer significant advantages over conventional approaches in terms of contact passivation, optical properties, and device fabrication.

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D. E Kane

Papers

Measurement of the emitter saturation current by a contactless photoconductivity decay method.