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登 小檜山

Publications -  19
Citations -  135

登 小檜山 is an academic researcher. The author has contributed to research in topics: Epoxy & Acrylate. The author has an hindex of 8, co-authored 19 publications receiving 135 citations.

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Patent

Photosetting and thermosetting resin composition

TL;DR: In this paper, a carboxylic photosensitive resin was obtained by reacting the reaction product of a polynuclear epoxy compound (a) represented by formula (1) and an unsaturated group-containing monocarboxyly acid (b) with a polybasic acid anhydride (c),
Patent

Curable composition and cured product thereof

TL;DR: In this paper, the curable composition comprises a mixture of a carboxyl-containing photosensitive compound (A-1) obtained by reacting a polybasic acid anhydride with the reaction product of a compound having at least two epoxy groups in the molecule with an unsaturation-containing monocarboxylic acid or a mixture thereof with an epoxy-reactive group.
Patent

Alkali-developable curable composition and cured product thereof

TL;DR: In this article, a carboxyl group-containing epoxy resin with an acid number of 20-150 mgKOH/g and an epoxy equivalent of ≤3,000 g/eq is presented.
Patent

Composition containing carboxylic photosensitive resin

TL;DR: In this paper, a carboxylic photosensitive resin was obtained by reacting a compound having two or more phenolic hydroxyl groups in one molecule with an alkylene oxide (b) or cyclic carbonates.
Patent

Curable composition containing carboxyl-group-containing photosensitive resin

TL;DR: In this article, a carboxyl-group-containing photosensitive resin resin (CGSRS) was proposed to give an excellent cured film satisfactory enough in characteristics such as electric insulation properties required by a resist for printed circuit boards, resistance to PCT (pressure cooker test), adhesiveness, soldering heat resistance, chemical resistance and resistance to electroless gold plating.