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Donald R. Hush

Researcher at University of New Mexico

Publications -  10
Citations -  330

Donald R. Hush is an academic researcher from University of New Mexico. The author has contributed to research in topics: Artificial neural network & Feature vector. The author has an hindex of 7, co-authored 10 publications receiving 329 citations.

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Query by image example: The CANDID approach

TL;DR: CANDID (Comparison Algorithm for Navigating Digital Image Databases) as mentioned in this paper was developed to enable content-based retrieval of digital imagery from large databases using a query-by-example methodology.
Proceedings ArticleDOI

Query by image example: the comparison algorithm for navigating digital image databases (CANDID) approach

TL;DR: Two results from the current research are presented: subtracting a `background' signature from every signature in a database in an attempt to improve system performance when using inner-product similarity measures, and visualizing the contribution of individual pixels in the matching process.
Proceedings ArticleDOI

Using scattered light modeling for semiconductor critical dimension metrology and calibration

TL;DR: In this paper, a coupled wave light scatter model is used to simulate diffraction from a set of test wafers and neural network analysis techniques are then employed to use correlations between the simulated diffraction and the critical dimensions of the modeled structures to produce a capability to measure the critical dimension from scattered light measurements.
Proceedings Article

Statistical modeling of targets and clutter in single-look non-polarimetric SAR imagery

TL;DR: A Maximum Likelihood (ML) estimate of the shape parameter gives an optimal measure of the skewness of the SAR data, which provides a basis for an optimal target detection algorithm.
Proceedings ArticleDOI

Wafer examination and critical dimension estimation using scattered light

TL;DR: In this article, the authors applied optical scatter techniques to improve several aspects of microelectronic manufacturing, such as surface planarization over a VLSI structure and line edge roughness of diffraction gratings.