D
Donald R. Hush
Researcher at University of New Mexico
Publications - 10
Citations - 330
Donald R. Hush is an academic researcher from University of New Mexico. The author has contributed to research in topics: Artificial neural network & Feature vector. The author has an hindex of 7, co-authored 10 publications receiving 329 citations.
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Query by image example: The CANDID approach
TL;DR: CANDID (Comparison Algorithm for Navigating Digital Image Databases) as mentioned in this paper was developed to enable content-based retrieval of digital imagery from large databases using a query-by-example methodology.
Proceedings ArticleDOI
Query by image example: the comparison algorithm for navigating digital image databases (CANDID) approach
TL;DR: Two results from the current research are presented: subtracting a `background' signature from every signature in a database in an attempt to improve system performance when using inner-product similarity measures, and visualizing the contribution of individual pixels in the matching process.
Proceedings ArticleDOI
Using scattered light modeling for semiconductor critical dimension metrology and calibration
Richard H. Krukar,Steven L. Prins,D. M. Krukar,Gary A. Peterson,Steve Gaspar,John R. McNeil,S. Sohail H. Naqvi,Donald R. Hush +7 more
TL;DR: In this paper, a coupled wave light scatter model is used to simulate diffraction from a set of test wafers and neural network analysis techniques are then employed to use correlations between the simulated diffraction and the critical dimensions of the modeled structures to produce a capability to measure the critical dimension from scattered light measurements.
Proceedings Article
Statistical modeling of targets and clutter in single-look non-polarimetric SAR imagery
TL;DR: A Maximum Likelihood (ML) estimate of the shape parameter gives an optimal measure of the skewness of the SAR data, which provides a basis for an optimal target detection algorithm.
Proceedings ArticleDOI
Wafer examination and critical dimension estimation using scattered light
Richard H. Krukar,Susan M. Gaspar,S. R. Wilson,Donald R. Hush,S. Sohail H. Naqvi,John R. McNeil +5 more
TL;DR: In this article, the authors applied optical scatter techniques to improve several aspects of microelectronic manufacturing, such as surface planarization over a VLSI structure and line edge roughness of diffraction gratings.