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Ebru Apak

Publications -  2
Citations -  18

Ebru Apak is an academic researcher. The author has contributed to research in topics: Metrology & Critical dimension. The author has an hindex of 1, co-authored 2 publications receiving 17 citations.

Papers
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Proceedings ArticleDOI

Optical critical dimension (OCD) measurments for profile monitoring and control: applications for mask inspection and fabrication

Ray Hoobler, +1 more
TL;DR: In this paper, the authors have extended optical critical dimension (OCD) measurements using Normal-Incidence Spectroscopic Ellipsometry (polarized reflectance) for the separation of transverse electric and transverse magnetic modes of light reflected from an anisotropic sample.
Proceedings ArticleDOI

Photomask ADI, AEI, and QA measurements using normal incidence optical CD metrology

Ebru Apak, +4 more
TL;DR: Optical Critical Dimension (OCD) measurements using Normal-Incidence Spectroscopic Polarized Reflectance and Ellipsometry allows for the separation of transverse electric and transverse magnetic modes of light reflected from an anisotropic sample as found in a periodic grating structure as mentioned in this paper.