An RF impedance matching network includes a transformation circuit configured to provide a transformed impedance; a first shunt circuit in parallel to the RF input, the first shunt circuit including a first shunt variable capacitance component comprising (a) a plurality of first shunt capacitors coupled in parallel, and (b) a plurality of first shunt switches coupled to the plurality of first shunt capacitors and configured to connect and disconnect each of the plurality of first shunt capacitors to a first virtual ground; and a second shunt variable capacitance component including (a) a plurality of second shunt capacitors coupled in parallel, and (b) a plurality of second shunt switches coupled to the plurality of second shunt capacitors and configured to connect and disconnect each of the plurality of second shunt capacitors to a second virtual ground.

RF impedance matching network

A RF matching network is described, and which includes a 1 st to nth RF generators, and wherein each RF generator has a different frequency, and wherein the frequencies of the 1 st to the nth RF input ports decline in sequence, and wherein between the ith frequency RF input port, and the output port is a ith circuit, which has a high impedance at the output port to all RF generator frequencies other than the ith frequency; and wherein the ith circuit, when connected to a RF generator with the ith frequency, and wherein measuring from the output port to the ith circuit, the ith circuit has a first impedance at the ith frequency; and when measuring from the output port in the opposite direction to the ith circuit, the ith circuit has a second impedance at the ith frequency; and wherein the first impedance is a substantial conjugate match of the second impedance.

RF matching network of a vacuum processing chamber and corresponding configuration methods

Apparatus and methods are provided that are adapted to match the impedance of an electrical load to an impedance of an electrical signal generator. The invention includes providing a plurality of electrical components (204, 222) adapted to collectively match the impedance of the electrical load to the impedance of the electrical signal generator. The electrical components are arranged symmetrically and concentrically about an axis. Additionally, the invention may also include a first connector (202; 202') adapted to electrically couple the electrical signal generator to the electrical components. Additionally, the invention may also include a second connector (228; 228') adapted to electrically couple the load to the electrical components. Numerous other aspects are provided.

Methods and apparatus for symmetrical and/or concentric radio frequency matching networks

An RF impedance matching network includes an RF input; an RF output configured to operably couple to a plasma chamber; a series electronically variable capacitor (“series EVC”), the series EVC electrically coupled in series between the RF input and the RF output; and a shunt electronically variable capacitor (“shunt EVC”), the shunt EVC electrically coupled in parallel between a ground and one of the RF input and the RF output; a control circuit to control the series variable capacitance and the shunt variable capacitance, wherein the control circuit is configured to determine the variable plasma impedance of the plasma chamber, determine a series capacitance value and a shunt capacitance value, and generate a control signal to alter at least one of the series variable capacitance and the shunt variable capacitance; wherein the alteration is caused by at least one of a plurality of switching circuits.

A tuner matching an impedance of a load in the chamber to a characteristic impedance of the microwave power source is provided. The tuner includes: a body having a tubular outer conductor and a tubular inner conductor coaxially provided in the outer conductor, the body forming a part of the microwave transmission path; an annular dielectric slug provided between the outer conductor and the inner conductor, the slug being movable along a longitudinal direction of the inner conductor; and a drive mechanism for moving the slug and including a drive part for applying a driving force; a drive transmission part for transmitting the driving force to the slug; a drive guide part for guiding movement of the slug; and a holding part for holding the slug at the drive transmission part. The drive transmission part, the drive guide part and the holding part are accommodated in the inner conductor.

Tuner and microwave plasma source

In an impedance matching device having at least two stubs serially provided to a main coaxial tube so as to be separated from each other with a predetermined interval in a tube axial direction, each stub is composed of a variable capacity capacitor to be jointed to an inner conductor of the main coaxial tube, an electrically conductive capacitor cover to be jointed to an outer conductor of the main coaxial tube so as to cover a surrounding of the variable capacity capacitor, and a drive motor arranged on an outside of the capacitor cover so as to drive a movable side electrode of the variable capacity capacitor. The movable side electrode of the variable capacity capacitor is driven directly by the drive motor so that the impedance matching device is made to be compact and response of impedance matching to a fluctuation of a load impedance such as a behavior of a plasma load is improved, and the life is lengthened and degrees of freedom of installation is widened.

Eiji Kaneko

Papers

Impedance matching device