E
Eric Shero
Researcher at ASM International
Publications - 83
Citations - 7087
Eric Shero is an academic researcher from ASM International. The author has contributed to research in topics: Thin film & Atomic layer deposition. The author has an hindex of 41, co-authored 83 publications receiving 7080 citations. Previous affiliations of Eric Shero include University of Arizona.
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Patent
Surface preparation prior to deposition
TL;DR: In this article, the surface termination of the substrate with a low temperature radical treatment is used to facilitate subsequent deposition without depositing a layer of any appreciable thickness and without significantly affecting the bulk properties of the underlying material.
Patent
Incorporation of nitrogen into high k dielectric film
TL;DR: In this article, a high k dielectric film and methods for forming the same are disclosed and the high k material includes two peaks of impurity concentration, particularly nitrogen, such as at a lower interface and upper interface.
Patent
Process feed management for semiconductor substrate processing
Fred Pettinger,Carl White,Dave Marquardt,Sokol Ibrani,Eric Shero,Todd Dunn,Kyle Fondurulia,Mike Halpin +7 more
TL;DR: In this paper, a gas channel plate for a semiconductor process module is described, which includes a heat exchange surface including a plurality of heat exchange structures separated from one another by intervening gaps.
Patent
Reactor surface passivation through chemical deactivation
Mohith Verghese,Eric Shero +1 more
TL;DR: In this paper, a pre-treatment step can maximize the available reactive sites prior to the treatment step, and purge steps can be greatly shortened and a number of runs can be conducted between cleaning steps to remove built-up deposition on the reactor walls.
Patent
Low temperature gate stack
TL;DR: In this paper, a method for forming dielectric layers on a substrate, such as in an integrated circuit, is described. But the method is not suitable for high-k deposition at less than or equal to about 300°C.