A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray (λ=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2θ (θ is a Bragg angle) range of 28.61 to 29.67°, a peak (second peak) having a peak top in a diffraction angle 2θ range of 33.14 to 34.53°, a peak (third peak) having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and a peak (fourth peak) having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°. A half-width of the first peak is 0.8° or less.

Polishing liquid composition

The invention relates to a mesoporous zeolitic material having a stereoregular arrangement of uniformly-sized mesopores with diameters ranging from 20 to 500 A and walls having a microporous nanocrystalline structure. The mesopore walls have a stereoregular arrangement of uniformly-sized micropores with diameters less than 15 A. The mesoporous zeolite material according to the invention displays both the catalytic properties associated with zeolites containing strong Bronsted acid sites and the large mesopore surface area associated with mesoporous molecular sieves.

Mesoporous zeolitic material with microporous crystalline mesopore walls

To provide a thermosensitive recording material, containing: a support; an under layer; a thermosensitive recording layer; and a protective layer, where the under layer, the thermosensitive recording layer, and the protective layer are provided in this order on at least one surface of the support, wherein the support is synthetic paper, or a synthetic resin film, wherein the under layer contains a binder resin, and hollow particles, wherein an adhesive force of the thermosensitive recording material at ―20°C, as measured by the described measuring method of the adhesive force, is 10.0 N/25 mm or greater.

Thermosensitive recording material

A method and composition of matter relating to mesoporous structures. The inventive method and inventive structures relate to, for example, attrition-resistant heterogeneous catalysts. A preferred embodiment makes use of a liquid-crystal template mechanism to create a silica structure where insoluble nanoparticles (generally submicron particles) are trapped inside. Such a structure provides controlled porosity for transport of reactants to and products from the catalytically active phase, respectively. Catalytically active structures of the present invention are useful for Fischer-Tropsch synthesis where the breakup and attrition of the catalytically active phase ordinarily hinders performance. The method of the present invention is generally applicable to other mesoporous materials and active phase combinations.

Synthesis of attrition-resistant heterogeneous catalysts using templated mesoporous silica

A thermally-sensitive recording medium having a protecting layer formed on a thermally-sensitive recording layer containing a colorless or pale-colored electron-donating leuco dye and electron-accepting color-developing agent. The thermally-sensitive recording layer is formed on a substrate, and the protecting layer contains a resin that contains a carboxyl group, epichlorohydrin resin and modified polyamine/amide resin, and the thermally-sensitive recording medium exhibits sufficient resistant against water such as rain or humidity, and further is excellent in printing run-ability (head debris and sticking) and sensitivity.

Thermally sensitive recording medium

PROBLEM TO BE SOLVED: To provide a production method by which high purity colloidal silica capable of being used for polishing electronic material such as a silicon wafer, compound semiconductor wafer, 7 semiconductor device wafer, magnetic disk substrate, quartz substrate can be produced at a low cost and to provide colloidal silica obtained by this method and containing very small amount of metal impurities. SOLUTION: The production method comprises bringing an aqueous solution of an alkali silicate into contact with a cation exchange resin to prepare an activated aqueous solution of the alkali silicate, then bringing the activated aqueous solution of the alkali silicate into contact with a chelating agent, growing colloidal particles, concentrating the silica by the ultrafiltration and at the same time removing chelated metal impurities.

Method of producing colloidal silica

PURPOSE: To produce a hydrated silicic acid combining high fine pore volume with fine grain size. CONSTITUTION: In the hydrated silicic acid obtained by neutralizing a sodium silicate aq. soln. with mineral acid, the hydrated silicic acid is provided with particle characteristics which is in a range of 250-350ml/100g of oil absorption amount, 4.0-6.0cc/g of total fine pore volume and 200-400a of average fine pore diameter, and whose average grain size is in eigher range of 3.0-15μm by laser method measured value, 2.0-4.0μm by Coulter method measured value or 0.3-3.5μm by centrifugal sedimentation method measured value. This hydrated silicic acid is produced through the first process in which a mineral acid equal to 30-50% of neutralization equivalent is added at <=70 deg.C to the sodium silicate whose silica concn. is 6-10wt.% in terms of SiO2 and the mixture is subjected to wet grinding treatment by strong shearing during aging time, the second process in which total silica is precipitated by adding residual mineral oil and aging at the temp. higher than that of the preceding process and the third process in which the mineral acid is added to adjust a pH of slurry in a range of 5-3.

Hydrated silicic acid and its production

PROBLEM TO BE SOLVED: To obtain a mesoporous metallosilicate provided with a mesopore structure having uniform fine pore diameter distribution, small in Na content and large in specific surface area and to provide the producing method. SOLUTION: This mesoporous metallosilicate is a porous metallosilicate (except aluminosilicate) obtained by firing a composite material basing on an active silica, a metallic salt and a cationic surfactant, has the mesopore structure 10-100Å in average fine pore diameter and >=400m /g in BET specific surface area. A 1st process for preparing the active silica by bringing a sodium silicate aq. solution into contact with the cationic surfactant, a 2nd process for forming the composite material of the silica, the metal salt and the surfactant by adding a water soluble metallic salt (except Al salt) in a step for mixing the active silica with the cationic surfactant to react with each other in an alkaline region and a 3rd process for firing the composite material are performed in the order.

Mesoporous metallosilicate and its production

PROBLEM TO BE SOLVED: To provide a purification method by which an aqueous solution of an alkali silicate capable of being used as a raw material of high purity silica, high purity colloidal silica or high purity silica gel can be purified at a low cost. SOLUTION: The purification method of the aqueous solution of an alkali silicate comprises previously controlling the viscosity of the aqueous solution of the alkali silicate to be 1 to 50 mPa.s and then passing the solution through an ultrafiltration membrane whose fractional molecular weight is =1 nm, can be obtained.

Purification method of alkali silicate solution

PROBLEM TO BE SOLVED: To provide phosphorous-containing mesoporous silica having enhanced various performances in comparison with those of prior mesoporous silica.SOLUTION: The phosphorous-containing mesoporous silica is characterized in that phosphorous is included within the wall structure of the pores and that the phosphorous is directly bonded to the SiOrepeating units that form the wall structure. The optimum atom ratio of silicon to phosphorous (Si/P) is 10 to 100. The mesoporous silica is optimally prepared by mixing and reacting an ionic liquid comprising a quaternary phosphonium salt and a compound serving as the source of silicon, and firing the product obtained thereby in atmosphere.

繁樹山縣

Papers

Method of producing colloidal silica

Hydrated silicic acid and its production

Mesoporous metallosilicate and its production

Purification method of alkali silicate solution

Phosphorous-containing mesoporous silica and preparation method therefor

繁樹 山縣

Papers

Method of producing colloidal silica

Hydrated silicic acid and its production

Mesoporous metallosilicate and its production

Purification method of alkali silicate solution

Phosphorous-containing mesoporous silica and preparation method therefor

繁樹山縣