Systems, methods and storage mediums are disclosed for processing images and two-dimensional barcodes for two-way verification of document data. In one exemplary embodiment, image data of a document is obtained, processed and rendered into a barcode for incorporation into a reproduction of the document image. The barcode may overlap the document image which allows it to be placed anywhere in the document. Moreover, the barcode may overlap certain portions such that it conceals confidential information while maintaining the integrity of the confidential information within encoded data of the barcode.

Barcode for two-way verification of a document

A method, system, and related computer program products and computer-readable numerical arrays for computer simulation of a photolithographic process is described. In one preferred embodiment, simulation of a photolithographic process is provided in which a computation time for computing each subsequent result for each subsequent combination of process variation values and/or target depths is significantly less than a computation time for computing an initial result for an initial combination of the process variation values and/or target depths. Accordingly, where computation for the initial combination requires a first time interval T, results for (N−1) subsequent combinations can be achieved such that a total time interval for the N results is substantially less than NT. Computation of a process model used for the computer simulation is also described, as well as calibration of the process model to a physical photolithographic processing system.

Photolithographic process simulation including efficient result computation for multiple process variation values

An operation part in a pattern inspection apparatus includes a defect candidate image generator for generating a binary defect candidate image representing a defect candidate area in an inspection image by comparing the inspection image with a reference image, in an inspection image masking part the inspection image is masked with the defect candidate image to obtain a masked inspection image. In a feature value calculation part, an autocorrelation feature value is obtained from the masked inspection image, and outputted to a classifying part. The classifying part comprises a classifier outputting a classification result on the basis of the autocorrelation feature value and a classifier construction part for constructing the classifier by learning. It is thereby possible to easily perform the high accurate classification of defect candidate using the autocorrelation feature value which is hard to characterize as compared with geometric feature value or feature value representing density.

Apparatus and method for inspecting pattern

A color barcode can record much more amount of information than black white barcode. However, the problem of the color barcode is that it is easy to lose integrity or authenticity in printing and copy generation. This invention provides an apparatus and a method to keep the integrity or authenticity of the color barcode. Such is accomplished by the color information portion of the color barcode representing the color information about what colors are used for color tiles of data portion of the color barcode and an apparatus and a method for producing and reproducing such color barcode.

Color barcode producing, reading and/or reproducing method and apparatus

A technique for determining photo-mask defect disposition is described. In this technique, a target mask pattern is used to expand an initial region in a photo-mask that is included in an initial mask-inspection image. In particular, a revised mask-inspection image that includes the initial region and a region surrounding the initial region is generated based on the initial mask-inspection image and the target mask pattern. Then a corresponding simulated mask pattern is calculated in an inverse optical calculation using the revised mask-inspection image and an optical model of the mask-inspection system. This simulated mask pattern is used to simulate a wafer pattern in a photo-lithographic process, and disposition of a possible defect in the initial region is subsequently determined based on the simulated wafer pattern and a target wafer pattern.

Extending the field of view of a mask-inspection image

The invention comprises processes for determining and applying a deblurring filter that reduces inspection system distortion, of mask inspection images, by compensating for the non-uniform frequency response of the inspection system. In particular, an adaptive filter is determined empirically for an inspection system: one or more training images are obtained by the inspection system and the filter is determined from such images. In this way, the filter can adapt to the characteristics of each individual inspection system. An example adaptive filter, known as a Weiner filter, is determined and applied.

Fang-Cheng Chang

Papers

Method and apparatus for deblurring mask images