F
Ferdinand Schürrer
Researcher at Graz University of Technology
Publications - 71
Citations - 801
Ferdinand Schürrer is an academic researcher from Graz University of Technology. The author has contributed to research in topics: Boltzmann equation & Boltzmann constant. The author has an hindex of 14, co-authored 71 publications receiving 762 citations. Previous affiliations of Ferdinand Schürrer include University of Graz & University of Parma.
Papers
More filters
Journal ArticleDOI
Threshold Voltage Shifts in Organic Thin‐Film Transistors Due to Self‐Assembled Monolayers at the Dielectric Surface
TL;DR: In this paper, the effect of self-assembled monolayers (SAMs) on the transfer characteristics and especially on the threshold voltage of thin-film transistors is investigated by means of two-dimensional drift-diffusion simulations.
Journal ArticleDOI
Wigner model for quantum transport in graphene
Omar Morandi,Ferdinand Schürrer +1 more
TL;DR: In this article, a pseudo-spin phase-space approach based on the Wigner-Weyl formalism is used to describe the ballistic transport of electrons in graphene including quantum effects.
Journal ArticleDOI
A nine-dimensional Lorenz system to study high-dimensional chaos
TL;DR: In this paper, the authors examined the dynamics of three-dimensional cells with square planform in dissipative Rayleigh-Benard convection and obtained a system of nine nonlinear ordinary differential equations from the governing hydrodynamic equations.
Journal ArticleDOI
High-field transport and optical phonon scattering in graphene
TL;DR: In this paper, a kinetic model based on space-dependent Boltzmann transport equations for electrons and optical phonons is established for the coupled dynamics of electrons and phonons in graphene, which is solved by deterministic methods that provide efficiently accurate results by dynamically treating nonequilibrium phenomena.
Journal ArticleDOI
Impact of Materials versus Geometric Parameters on the Contact Resistance in Organic Thin‐Film Transistors
TL;DR: In this article, the relative significance of the contact resistance of thin-film transistors is assessed using drift-diffusion-based simulations on idealized device structures aiming at a characterization of the intrinsic situation in the absence of traps, differences in the film morphology, or metal-atoms diffusing into the organic semiconductor.